Abstract: A method of cleaning at least one optical component of at least one irradiation device having at least one radiation source in a vacuum chamber. The source generates in particular extreme ultraviolet and/or soft X-ray radiation whose rays are guided via the optical component onto a workpiece to be treated, during which the optical component is at least partly polluted because of an inorganic substance introduced by the radiation source. A least one reaction partner that is substantially translucent or transparent to the rays is introduced via a feeder device in dependence on the prevailing reaction conditions. The reaction partner reacts chemically with the polluting deposits so as to remove them from the optical component.

Abstract: A method of cleaning at least one optical component of at least one irradiation device is described, which device comprises at least one radiation source in a vacuum chamber, which source generates in particular extreme ultraviolet and/or soft X-ray radiation whose rays are guided via the optical component onto a workpiece to be treated, during which said optical component is at least partly polluted because of an inorganic substance introduced by the radiation source. It is proposed that at least one reaction partner (124) that is substantially translucent or transparent to the rays (118) be introduced via a feeder device (126) in dependence on the prevailing reaction conditions, which reaction partner (124) reacts chemically with the polluting deposits (128) so as to remove them from the optical component (110).

Abstract: The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3?) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5?) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).