Patents by Inventor Joseph Tersteeg

Joseph Tersteeg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7386934
    Abstract: Double photolithography is used to produce an under-layer of protective and filtering photoresist over a substrate that will have channels milled with a FIB. Secondary layers are applied with precision on top of the first layer in order to define the precise patterns to be milled and to provide targeting and alignment fiducials.
    Type: Grant
    Filed: January 26, 2006
    Date of Patent: June 17, 2008
    Assignee: Advanced Research Corporation
    Inventors: Matthew P. Dugas, Joseph Tersteeg
  • Publication number: 20060213053
    Abstract: Double photolithography is used to produce an under-layer of protective and filtering photoresist over a substrate that will have channels milled with a FIB. Secondary layers are applied with precision on top of the first layer in order to define the precise patterns to be milled and to provide targeting and alignment fiducials.
    Type: Application
    Filed: January 26, 2006
    Publication date: September 28, 2006
    Inventors: Matthew Dugas, Joseph Tersteeg
  • Publication number: 20030093894
    Abstract: Double photolithography is used to produce an under-layer of protective and filtering photoresist over a substrate that will have channels milled with a FIB. Secondary layers are applied with precision on top of the first layer in order to define the precise patterns to be milled and to provide targeting and alignment fiducials.
    Type: Application
    Filed: November 18, 2002
    Publication date: May 22, 2003
    Inventors: Matthew P. Dugas, Joseph Tersteeg