Patents by Inventor Josephus Jacobus Smits
Josephus Jacobus Smits has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8598550Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: February 3, 2012Date of Patent: December 3, 2013Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
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Patent number: 8289498Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.Type: GrantFiled: June 12, 2009Date of Patent: October 16, 2012Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etiënne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
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Publication number: 20120140196Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: ApplicationFiled: February 3, 2012Publication date: June 7, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
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Patent number: 8134136Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: June 22, 2010Date of Patent: March 13, 2012Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
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Publication number: 20100290015Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: ApplicationFiled: June 22, 2010Publication date: November 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
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Patent number: 7767989Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: September 27, 2006Date of Patent: August 3, 2010Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
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Publication number: 20100002207Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.Type: ApplicationFiled: June 12, 2009Publication date: January 7, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etienne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
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Patent number: 7612353Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.Type: GrantFiled: July 6, 2006Date of Patent: November 3, 2009Assignee: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas, Paul Peter Anna Antonius Brom
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Patent number: 7397056Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.Type: GrantFiled: July 6, 2005Date of Patent: July 8, 2008Assignee: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van De Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas
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Patent number: 7372058Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: September 27, 2005Date of Patent: May 13, 2008Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Lambertus Adrianus Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits
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Patent number: 7116399Abstract: A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.Type: GrantFiled: May 13, 2004Date of Patent: October 3, 2006Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Josephus Box, Antonius Johannes Josephus Van Dijsseldonk, Dominicus Jacobus Petrus Adrianus Franken, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Josephus Jacobus Smits, Marc Wilhelmus Maria Van Der Wijst
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Patent number: 6750949Abstract: A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.Type: GrantFiled: July 12, 2002Date of Patent: June 15, 2004Assignee: AMSL Netherlands B.V.Inventors: Erik Roelof Loopstra, Dominicus Jacobus Petrus Adrianus Franken, Josephus Jacobus Smits, Antonius Johannes Josephus Van Dijsseldonk, Johannes Hubertus Josephina Moors, Albrecht Hof, Günter Maul, Michael Mühlbeyer, Klaus Mehlkopp
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Publication number: 20030058422Abstract: A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.Type: ApplicationFiled: July 12, 2002Publication date: March 27, 2003Inventors: Erik Roelof Loopstra, Dominicus Jacobus Petrus Adrianus Franken, Josephus Jacobus Smits, Antonius Johannes Josephus Van Dijsseldonk, Johannes Hubertus Josephina Moors, Albrecht Hof, Gunter Maul, Michael Muhlbeyer, Klaus Mehlkopp