Patents by Inventor Jozef Cornelis Antonius Roijers

Jozef Cornelis Antonius Roijers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures
    Patent number: 8908152
    Abstract: A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
    Type: Grant
    Filed: November 18, 2009
    Date of Patent: December 9, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Jozef Cornelis Antonius Roijers, Patrick Warnaar, Marc Van Kemenade, Hoite Pieter Theodoor Tolsma
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20100123886
    Abstract: A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
    Type: Application
    Filed: November 18, 2009
    Publication date: May 20, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper BIJNEN, Jozef Cornelis Antonius Roijers, Patrick Warnaar, Marc Van Kemenade, Hoite Pieter Theodoor Tolsma