Abstract: A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a wall that defines a plasma formation region where a chemically-reducing species is formed from a fluid. A portion of the wall is formed of a substance that is substantially inert to the chemically-reducing species. The wall prevents the chemically-reducing species from interacting with an inner surface of the plasma chamber to form a conductive substance. The barrier component also includes an opening in fluid communication with the plasma formation region. The fluid is introduced into the plasma formation region via the opening.

Abstract: An apparatus includes a vacuum chamber, an electrical transformer that surrounds the vacuum chamber to induce an electromagnetic field within the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. The transformer includes a primary winding and a plasma loop coupled to the vacuum chamber to perform as a secondary winding. The ignition circuit is coupled to an ignition core section of the vacuum chamber to ignite the vacuum chamber.

Abstract: The reaction rate of a feed gas flowed into a plasma chamber is controlled. In one embodiment a pulsed power supply repeatedly applies a high power pulse to the plasma chamber to increase the reaction rate of plasma within the chamber, and applies a low power pulse between applications of the high power pulses.

Abstract: An apparatus is described. The apparatus includes a vacuum chamber and an electrical transformer to induce an electromagnetic field within the vacuum chamber. The transformer includes a primary winding, a secondary winding formed by the plasma loop, and a separate secondary winding implemented to measure the voltage along the plasma loop. The apparatus also includes a current transformer to measure the current flow through the plasma loop.

Abstract: In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy having low concentrations of elements that form non-soluble, intermetallic particles to address coating/substrate issues, has swaged-in cooling tubes to reduce thermal stress by improving thermal resistance, and has a plurality of dielectric gaps to decrease ion bombardment.

Abstract: In one aspect of the invention is a method to create a vacuum seal with extended lifetime to form a dielectric break in a vacuum chamber. The method includes the use of an elastic dielectric seal to form a high vacuum seal. It also includes the use of different means to protect the vacuum seal from direct exposure to the plasma and to reactive gases present inside the plasma chamber. Furthermore, it includes the use of elements to ensure a proper compression of the elastic seal, and to avoid its expansion or contraction when the pressures on both sides of the seal are different.

Abstract: A process for the production of liquid sugar by forming a sugar solution of water and natural sugar containing juice, adjusting the pH of a sugar solution to the range of from 1.0 to 2.0 to obtain an inverted juice, filtering the inverted juice, decolorizing the inverted juice to obtain sugar syrup, demineralizing the sugar syrup, evaporating the demineralized sugar syrup, and cooling the sugar syrup to form the liquid sugar.

Abstract: A process for the production of liquid sugar by forming a sugar solution of water and natural sugar containing juice, adjusting the pH of a sugar solution to the range of from 1.0 to 2.0 to obtain an inverted juice, filtering the inverted juice, decolorizing the inverted juice to obtain sugar syrup, demineralizing the sugar syrup, evaporating the demineralized sugar syrup, and cooling the sugar syrup to form the liquid sugar.

Abstract: According to one embodiment, an apparatus is described. An apparatus includes a vacuum chamber, an electrical transformer coupled to the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. The transformer includes a primary winding and a magnetic core. In addition, the transformer includes a secondary winding, to which the circuit used to ignite the vacuum chamber is coupled. The ignition circuit is used to establish a controlled capacitive discharge that is used to ignite the vacuum chamber.

Abstract: According to one embodiment, an apparatus is described. The apparatus includes a vacuum chamber and an electrical transformer to induce an electromagnetic field within the vacuum chamber. The transformer includes a primary winding, a secondary winding formed by the plasma loop, and a separate secondary winding implemented to measure the voltage along the plasma loop. The apparatus also includes a current transformer to measure the current flow through the plasma loop.

Abstract: According to one embodiment, an apparatus is described. The apparatus includes a vacuum chamber, an electrical transformer coupled to the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. The transformer includes a primary winding and a magnetic core. In addition, the transformer includes a secondary winding, to which the circuit used to ignite the vacuum chamber is coupled. The ignition circuit is used to establish a controlled capacitive discharge that is used to ignite the vacuum chamber.

Abstract: In one aspect of the invention is a gas feed for injecting gas into a plasma-processing chamber that reduces the speed at which the gas interacts with the plasma discharge, so enhancing the stability of the plasma and the production of reaction products. In one embodiment, the gas feed comprises a gas speed reducer having apertures along its wall through which gas is distributed into the plasma chamber at a tangent to the chamber walls. In another embodiment, the gas feed comprises a gas speed reducer, which is made up of one or more channels such that, when traveling through the channels, the input and the output holes of the channels can only be connected by a broken line. In yet another embodiment, the gas speed reducer has a plurality of perforated sheaths, such that holes on one perforated sheath are not aligned with holes on another perforated sheath.

Abstract: In one aspect of the invention is a method to create a vacuum seal with extended lifetime to form a dielectric break in a vacuum chamber. The method includes the use of an elastic dielectric seal to form a high vacuum seal. It also includes the use of different means to protect the vacuum seal from direct exposure to the plasma and to reactive gases present inside the plasma chamber. Furthermore, it includes the use of elements to ensure a proper compression of the elastic seal, and to avoid its expansion or contraction when the pressures on both sides of the seal are different.

Abstract: The invention relates to a method for providing a direct estimation of the power delivered to the plasma in a TCP source. According to one embodiment, an apparatus is described. The apparatus includes a vacuum chamber and an electrical transformer to induce an electromagnetic field within the vacuum chamber. The transformer includes a primary winding, a secondary winding formed by the plasma loop, and a separate secondary winding implemented to measure the voltage along the plasma loop. The apparatus also includes a current transformer to measure the current flow through the plasma loop.

Abstract: According to one embodiment, an apparatus is described. The apparatus includes a metal vacuum chamber with two or more dielectric breaks. It also includes a number of excitation transformers located so as to distribute the total induced voltage in the chamber among the dielectric breaks. Distributing the total induced voltage among the breaks results in lower wall damage and, consequently, longer lifetimes for the plasma chambers.

Abstract: Process for the treatment of polluted metal-mechanic industrial waste water and urban water, comprising: treating the polluted water with an acid liquor including ferrous chloride and hydrochloric acid, in order to promote the denaturalization of protein present in metal-mechanic industrial water or urban water and generate a clarifying and purifying flocculus from said polluted water.