Patents by Inventor Juan Tan

Juan Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240158726
    Abstract: This provides a flexible, porous, dissolvable solid sheet article containing a cationic surfactant.
    Type: Application
    Filed: January 23, 2024
    Publication date: May 16, 2024
    Inventors: Dan XU, Hongsing TAN, Juan YANG, Na HOU, Carl David MAC NAMARA, Yongli PAN
  • Publication number: 20240076892
    Abstract: A structural yielding link, particularly for use in an eccentrically braced frame arrangement or in a linked column frame arrangement having a first end having a means for connecting to a face of a first beam and a second end having a means for connecting to a face of a second beam; a first variable cross-section portion and a second variable cross-section portion extending from the first end and from the second end, respectively; and a constant cross-section portion joining the first variable cross-section portion and the second variable cross-section portion.
    Type: Application
    Filed: November 10, 2023
    Publication date: March 7, 2024
    Inventors: Michael Gray, Juan-Carlos De Oliveira, Constantin Christopolous, Tarana Haque, Kyla Tan
  • Patent number: 11912962
    Abstract: This provides a flexible, porous, dissolvable solid sheet article containing a cationic surfactant.
    Type: Grant
    Filed: February 10, 2021
    Date of Patent: February 27, 2024
    Assignee: The Procter & Gamble Company
    Inventors: Dan Xu, Hongsing Tan, Juan Yang, Na Hou, Carl David Mac Namara, Yongli Pan
  • Publication number: 20230324312
    Abstract: A system and method that obtains contact heights of a packaged chip. In particular, the system includes a first light source for emitting direct light, a second light source for emitting structured light, two or more cameras pointed towards the packaged chip for capturing a first set of images of the packaged chip, and a second set of images of the packaged chip, and at least one processor that processes the first set of images and the second set of images captured by the cameras to determine contact heights of the packaged chip. The cameras capture the first set of images when the first light source emits direct light towards the packaged chip, and capture the second set of images when the second light source emits structured light towards the packaged chip.
    Type: Application
    Filed: October 3, 2022
    Publication date: October 12, 2023
    Applicant: Vitrox Technologies Sdn. Bhd.
    Inventors: Heng Juan Tan, Ting Lik Wong, Chee Kit Loh, Kek Keong Kim, Khai Tze Seow, Yi Ting San
  • Publication number: 20050127495
    Abstract: In accordance with the objectives of the invention a new design and method for the implementation thereof is provided in the form of an “oxide ring”. A conventional die is provided with a guard ring or sealing ring, which surrounds and isolates the active surface area of an individual semiconductor die. The “oxide ring” of the invention surrounds the guard ring or sealing ring and forms in this manner a mechanical stress release buffer between the sawing paths of the die and the active surface area of the singulated individual semiconductor die.
    Type: Application
    Filed: December 12, 2003
    Publication date: June 16, 2005
    Inventors: Fan Zhang, Bei Zhang, Wuping Liu, Kho Chok, Liang Hsia, Tae Lee, Juan Tan, Xian Wang
  • Publication number: 20050090095
    Abstract: A method of forming an aligned dual damascene opening, comprising including the following sequential steps. A structure having a metal structure formed thereover is provided. A layer stack is formed over the metal structure. The layer stack comprises, in ascending order: a bottom etch stop layer; a lower dielectric material layer; a middle etch stop layer; a middle dielectric material layer; and an upper dielectric layer. The upper dielectric layer is patterned to form an opening exposing a portion of the underlying middle dielectric material layer. The opening having a width. A patterned mask layer is formed over the patterned upper dielectric layer leaving exposed opposing portions of the patterned upper dielectric layer. The middle dielectric material layer is patterned to form an opening therein using the patterned mask layer and the exposed portions of the upper dielectric layer as masks. The middle dielectric material layer opening exposing a portion of the middle etch stop layer.
    Type: Application
    Filed: October 22, 2003
    Publication date: April 28, 2005
    Inventors: Yeow Lim, Wuping Liu, Tae Lee, Bei Zhang, Juan Tan, Alan Cuthbertson, Chin Neo