Patents by Inventor Juh-Shyong Lee
Juh-Shyong Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200141030Abstract: A method for forming a copolyester material includes preparing a solution of monomers, applying a polymerization to form a copolyester having a low melting point, spinning the copolyester into fiber threads to form a copolyester fiber, weaving or knitting the copolyester fiber with a common fiber to form a composite cloth having a sheet shape, cutting the composite cloth to form a determined shape, applying a hot-press process on the composite cloth under a temperature of about 120° C. to 200° C., to release tackiness of the copolyester, so that the copolyester fiber and the common fiber are bonded tightly and closely, and forming a tough film on a surface of the composite cloth by the copolyester, so that the composite cloth has functions of stiffness and abrasion resistance by the tough film.Type: ApplicationFiled: January 7, 2020Publication date: May 7, 2020Inventors: Juh-Shyong Lee, Yuung-Ching Sheen, Shu-Yu Ho
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Publication number: 20180237955Abstract: A method for forming a copolyester material includes preparing a solution of monomers, applying a polymerization to form a copolyester having a low melting point, spinning the copolyester into fiber threads to form a copolyester fiber, weaving or knitting the copolyester fiber with a common fiber to form a composite fiber having a sheet shape, cutting the composite fiber to form a determined shape, applying a hot-press process on the composite fiber under a temperature of about 120° C. to 200° C., to release tackiness of the copolyester, so that the copolyester fiber and the common fiber are bonded tightly and closely, and forming a tough film on a surface of the composite fiber by the copolyester, so that the composite fiber has functions of stiffness and abrasion resistance by the tough film.Type: ApplicationFiled: February 22, 2017Publication date: August 23, 2018Inventors: Juh-Shyong Lee, Yuung-Ching Sheen, Shu-Yu Ho
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Patent number: 8142591Abstract: The present invention relates to a method for liquid crystal display element without substrates, which comprises applying a release agent to assisting substrates in the process of producing the liquid crystal display so that the assembled liquid crystal display element can be separated from the assisting substrates and the liquid crystal display element is obtained, wherein said release agent comprises (a) 2-20 wt % of compounds selected from the group consisting of silicone, fluorine compounds and mixtures thereof; (b) 0.01-0.6 wt % of release modifier; and (c) a solvent as a complement to 100 wt %.Type: GrantFiled: September 12, 2008Date of Patent: March 27, 2012Assignee: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Juh-Shyong Lee, Wen-Ping Chuang, Yih-Her Chang, Su-Mei Wei
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Publication number: 20090090459Abstract: The present invention relates to a method for liquid crystal display element without substrates, which comprises applying a release agent to assisting substrates in the process of producing the liquid crystal display so that the assembled liquid crystal display element can be separated from the assisting substrates and the liquid crystal display element is obtained, wherein said release agent comprises (a) 2-20 wt % of compounds selected from the group consisting of silicone, fluorine compounds and mixtures thereof; (b) 0.01-0.6 wt % of release modifier; and (c) a solvent as a complement to 100 wt %.Type: ApplicationFiled: September 12, 2008Publication date: April 9, 2009Applicant: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Juh-Shyong Lee, Wen-Ping Chuang, Yih-Her Chang, Su-Mei Wei
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Patent number: 7435516Abstract: The present invention provides a photosensitive material for non-substrate liquid crystal display. This photosensitive material includes photo-initiator selected from the free-radical type or cation type photo-initiator or mixture thereof, photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof, and modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof. The photosensitive material can surround liquid crystal display cell and separate from assisting substrates that a non-substrate liquid crystal cell surrounded by photosensitive material is acquired.Type: GrantFiled: October 18, 2007Date of Patent: October 14, 2008Assignee: Industrial Technology Research InstituteInventors: Yuung Ching Sheen, Juh Shyong Lee, Wen Ping Chuang, Yih Her Chang, Su Mei Wei
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Publication number: 20080044597Abstract: The present invention provides a photosensitive material for non-substrate liquid crystal display. This photosensitive material includes photo-initiator selected from the free-radical type or cation type photo-initiator or mixture thereof, photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof, and modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof. The photosensitive material can surround liquid crystal display cell and separate from assisting substrates that a non-substrate liquid crystal cell surrounded by photosensitive material is acquired.Type: ApplicationFiled: October 18, 2007Publication date: February 21, 2008Applicant: Industrial Technology Research InstituteInventors: Yuung-Ching SHEEN, Juh-Shyong LEE, Wen-Ping CHUANG, Yih-Her CHANG, Su-Mei WEI
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Publication number: 20060222839Abstract: The present invention provides a photosensitive material for non-substrate liquid crystal display. This photosensitive material includes photo-initiator selected from the free-radical type or cation type photo-initiator or mixture thereof, photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof, and modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof. The photosensitive material can surround liquid crystal display cell and separate from assisting substrates that a non-substrate liquid crystal cell surrounded by photosensitive material is acquired.Type: ApplicationFiled: March 15, 2006Publication date: October 5, 2006Applicant: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Juh-Shyong Lee, Wen-Ping Chuang, Yih-Her Chang, Su-Mei Wei
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Publication number: 20050107522Abstract: The present invention relates to a release agent for non-substrate liquid crystal display, comprising (a) 2-20 wt % of compounds selected from the group consisting of silicone, fluorine compounds and mixtures thereof, and (b) 0.5-30 wt % (based on the weight of (a)) of release modifier. The release agent is applied to the assisting substrates in the process of non-substrate liquid crystal display, so the assembled liquid crystal display element can be separated from the assisting substrates and a non-substrate liquid crystal display element is acquired.Type: ApplicationFiled: March 3, 2004Publication date: May 19, 2005Applicant: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Juh-Shyong Lee, Wen-Ping Chuang, Yih-Her Chang, Su-Mei Wei
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Publication number: 20050106496Abstract: The present invention provides a photosensitive material for non-substrate liquid crystal display. This photosensitive material includes photo-initiator selected from the free-radical type or cation type photo-initiator or mixture thereof, photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof, and modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof. The photosensitive material can surround liquid crystal display cell and separate from assisting substrates that a non-substrate liquid crystal cell surrounded by photosensitive material is acquired.Type: ApplicationFiled: March 5, 2004Publication date: May 19, 2005Applicant: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Juh-Shyong Lee, Wen-Ping Chuang, Yih-Her Chang, Su-Mei Wei
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Patent number: 6294603Abstract: The present invention provides a metal salt-containing resin composition, which comprises (a) a hydrophilic polymer which is a polymer or copolymer of an ethylene oxide-containing monomer, and (b) 0.1 to 30% of a metal salt, based on the weight of the hydrophilic polymer. The resin composition of the present invention has long lasting antistatic properties and a lower surface resistivity than the hydrophilic polymer alone.Type: GrantFiled: August 8, 2000Date of Patent: September 25, 2001Assignee: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Pin-Sheng Wang, Mei-Ling Tong, Ya-Hui Lin, Juh-Shyong Lee
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Patent number: 6156915Abstract: A reactive and durable anti-static agent and the method of preparing the anti-static agent comprises: a compound with an amine group and a compound with an epoxide group added into the flask, stirred under the gradual raised temperature, reacted into an anti-static agent with a reactive functional group under proper temperature. The characteristics of the invention is that the reaction of preparing the anti-static agent is very active, and the preparing method is easy. With the reactive functional groups and polymer additives which enable the reaction in polymer, in addition to the endurance and a long lifetime, the surface property of the anti-static agent is improved. Therefore, the anti-static prepared according to the invention is broadly in use of industry.Type: GrantFiled: June 19, 1997Date of Patent: December 5, 2000Assignee: Industrial Technology Research InstituteInventors: Yuung-Ching Sheen, Ling-Yu Cheng, Juh-Shyong Lee, Tsai-Wie Tseng
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Patent number: 5986041Abstract: A polyetheresteramide compound and the method of preparing it comprise: a polyether compound containing a diamino group at the end mixed with a diacid and a diol, and being polymerized and condensed to form a polyetheresteramide compound. This polyetheresteramide is a durable anti-static resin. In addition to the anti-static property, the polyetheresteramide compound has the physical properties of the original polyester. Thus, the polyetheresteramide compound can be added into an anti-static resin and applied in general resin industry, special chemical and spinning industries. The anti-static products, such as the anti-static thin plate, anti-static bag, IC cover tape, anti-static clothes, and dustless clothes, or even broadly applied in electronic communication, semiconductor, and optoelectronic manufactures.Type: GrantFiled: June 19, 1997Date of Patent: November 16, 1999Assignee: Industrial Technology Research InstituteInventors: Ling-Yu Cheng, Yuung-Ching Sheen, Tsai-Wie Tseng, Juh-Shyong Lee
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Patent number: 5668215Abstract: The present invention provides a functional group-containing alkyl acrylate-butadiene-aromatic vinyl compound copolymer which is obtained from the following layers by emulsion graftlinking polymerization: an inner layer comprising polybutadiene or an aromatic vinyl compound-butadiene copolymer; a middle layer comprising an aromatic vinyl compound-an alkyl acrylate copolymer; and an outer layer comprising an alkyl acrylate-a functional group-containing vinyl compound copolymer. The functional group-containing alkyl acrylate-butadiene-aromatic vinyl compound copolymer can be incorporated into a PC/PBT alloy as an impact modifier, thus the impact strength of the modified alloy composition at room temperature and low temperatures can be increased effectively.Type: GrantFiled: September 20, 1996Date of Patent: September 16, 1997Assignee: Industrial Technology Research InstituteInventors: Cheng-Lung Chao, Juh-Shyong Lee, Feng-Chih Chang
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Patent number: 5576394Abstract: The present invention provides a functional group-containing alkyl acrylate-butadiene-aromatic vinyl compound copolymer which is obtained from the following layers by emulsion graftlinking polymerization: an inner layer comprising polybutadiene or an aromatic vinyl compound-butadiene copolymer; a middle layer comprising an aromatic vinyl compound--an alkyl acrylate copolymer; and an outer layer comprising an alkyl acrylate--a functional group-containing vinyl compound copolymer. The functional group-containing alkyl acrylate-butadiene-aromatic vinyl compound copolymer can be incorporated into a PC/PBT alloy as an impact modifier, thus the impact strength of the modified alloy composition at room temperature and low temperatures can be increased effectively.Type: GrantFiled: June 27, 1995Date of Patent: November 19, 1996Assignee: Industrial Technology Research InstituteInventors: Cheng-Lung Chao, Juh-Shyong Lee, Feng-Chih Chang
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Patent number: 5236643Abstract: The invention relates to a process for preparing gas separation membranes or modules. Membrane forming material is cast into a wet membrane which is wound into a spiral module. The spiral module is arranged in a closed circulating apparatus. Exchanging solvents or treating solutions are circulated through the circulating apparatus and the spiral module for an appropriate period of time. The module and circulating apparatus are purged until the membrane is dry, thus producing a gas separation membrane or module.Type: GrantFiled: September 4, 1991Date of Patent: August 17, 1993Assignee: Industrial Technology Research InstituteInventors: Tsai-Wie Tseng, Yih-Her Chang, Juh-Shyong Lee, Shyh-Yeu Wang, Woei-Ling Lin, Ren-Kuen Chang