Patents by Inventor Julia P. Williams

Julia P. Williams has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and article for the production of optical quality surfaces on glass
    Patent number: 6155910
    Abstract: The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing of a glass workpiece comprising a backing and at least one polishing layer. The polishing layer comprises cerium oxide particles dispersed within a binder. The binder provides the attachment means of the at least one polishing layer to the backing. The abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using an RPE procedure defined herein. The present invention is also directed to a method of polishing a glass workpiece using the present abrasive article.
    Type: Grant
    Filed: September 20, 1999
    Date of Patent: December 5, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Craig F. Lamphere, Chong Yong Kim, David A. Kaisaki, Heather K. Kranz, Julia P. Williams
  • Method and article for the production of optical quality surfaces on glass
    Patent number: 5989111
    Abstract: The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing of a glass workpiece comprising a backing and at least one polishing layer. The polishing layer comprises cerium oxide particles dispersed within a binder. The binder provides the attachment means of the at least one polishing layer to the backing. The abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using an RPE procedure defined herein. The present invention is also directed to a method of polishing a glass workpiece using the present abrasive article.
    Type: Grant
    Filed: November 23, 1998
    Date of Patent: November 23, 1999
    Assignee: 3M Innovative Properties Company
    Inventors: Craig F. Lamphere, Chong Yong Kim, David A. Kaisaki, Heather K. Kranz, Julia P. Williams
  • Method of modifying an exposed surface of a semiconductor wafer
    Patent number: 5958794
    Abstract: A method of modifying an exposed surface of a semiconductor wafer that includes the steps of:(a) contacting the surface with a fixed abrasive article having a three-dimensional textured abrasive surface that includes a plurality of abrasive particles and a binder in the form of a pre-determined pattern; and(b) relatively moving the wafer and the fixed abrasive article to modify said surface of the wafer.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: September 28, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Wesley J. Bruxvoort, Scott R. Culler, Kwok-Lun Ho, David A. Kaisaki, Carl R. Kessel, Thomas P. Klun, Heather K. Kranz, Robert P. Messner, Richard J. Webb, Julia P. Williams
  • Method and article for the production of optical quality surfaces on glass
    Patent number: 5876268
    Abstract: The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing of a glass workpiece comprising a backing and at least one polishing layer. The polishing layer comprises cerium oxide particles dispersed within a binder. The binder provides the attachment means of the at least one polishing layer to the backing. The abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using an RPE procedure defined herein. The present invention is also directed to a method of polishing a glass workpiece using the present abrasive article.
    Type: Grant
    Filed: January 3, 1997
    Date of Patent: March 2, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Craig F. Lamphere, Chong Yong Kim, David A. Kaisaki, Heather K. Kranz, Julia P. Williams