Patents by Inventor Juliann Opitz

Juliann Opitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polycyclic polymers containing pendant cyclic anhydride groups
    Patent number: 6525153
    Abstract: Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: February 25, 2003
    Assignees: Sumitomo Bakelite Co., Ltd., International Business Machines Corp.
    Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian, Robert David Allen, Juliann Opitz, Thomas I. Wallow
  • Polycyclic resist compositions with increased etch resistance
    Patent number: 6451499
    Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: September 17, 2002
    Assignees: The B.F. Goodrich Company, International Business Machines Corp.
    Inventors: Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow
  • Norbornene sulfonamide polymers
    Patent number: 6420503
    Abstract: The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or carbon monoxide. Said monomers may be polymerized using single or multicomponent Group VIII catalysts. The norbornene sulfonamides can also form ROMP polymers using known metathesis catalysts. Preferably the ROMP polymers may be hydrogenated to give more stable polymers.
    Type: Grant
    Filed: February 3, 2000
    Date of Patent: July 16, 2002
    Assignees: Sumitomo Bakelite Co. Ltd., International Business Machines Corp.
    Inventors: Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes, Pushkara Rao Varanasi, Thomas I. Wallow, Ratnam Sooriyakumaran, Robert D. Allen, Richard A. DiPietro, Hiroshi Ito, Juliann Opitz
  • Resist composition with radiation sensitive acid generator
    Patent number: 6165673
    Abstract: The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: December 26, 2000
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Richard Anthony DiPietro, Donald Clifford Hofer, Hiroshi Ito, Robert David Allen, Juliann Opitz, Thomas I. Wallow
  • Polycyclic resist compositions with increased etch resistance
    Patent number: 6147177
    Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: November 14, 2000
    Assignees: The B. F. Goodrich Company, International Business Machines Corporation
    Inventors: Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow