Abstract: Machines, devices, and other objects are configured to use authorization tokens to verify object identities without human input. In examples, the object uses a password to validate the object's identity to an authorization server to obtain an access token for use in multiple applications. In another example, the object uses a certificate to validate the object's identity to an authorization server to obtain an access token. In other examples, any other suitable identifying data may be used to validate the object's identity to an authorization server to obtain an access token. The process of using passwords, certificates, or other validation processes to obtain tokens or other authorization mechanisms allows the object to authenticate themselves without human interaction and to use a single identity to access services from multiple service providers that trust a central authorization server.

Abstract: Layer transfer approaches are described to take advantage of large area, thin inorganic foils formed onto a porous release layer. In particular, since the inorganic foils can be formed from ceramics and/or crystalline materials that do not bend a large amount, approaches are described to provide for gradual pulling along an edge to separate the foil from a holding surface along a curved surface designed to not excessively bend the foil such that the foil is not substantially damaged in the transfer process. Apparatuses are described to perform the transfer with a rocking motion or with a rotating cylindrical surface. Furthermore, stabilization of porous release layers can improve the qualities of resulting inorganic foils formed on the release layer. In particular, flame treatments can provide improved release layer properties, and the deposition of an interpenetrating stabilization composition can be deposited using CVD to stabilize a porous layer.

Abstract: Sub-atmospheric pressure chemical vapor deposition is described with a directed reactant flow and a substrate that moves relative to the flow. Thus, using this CVD configuration a relatively high deposition rate can be achieved while obtaining desired levels of coating uniformity. Deposition approaches are described to place one or more inorganic layers onto a release layer, such as a porous, particulate release layer. In some embodiments, the release layer is formed from a dispersion of submicron particles that are coated onto a substrate. The processes described can be effective for the formation of silicon films that can be separated with the use of a release layer into a silicon foil. The silicon foils can be used for the formation of a range of semiconductor based devices, such as display circuits or solar cells.