Patents by Inventor Jun Hatakeyama
Jun Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11965095Abstract: A bio-electrode composition contains (A) an ionic polymer material. The component (A) is a polymer compound containing: a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and a repeating unit-b having a side chain with a radical-polymerizable double bond in a structure selected from the group consisting of (meth)acrylate, vinyl ether, and styrene. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode to enable signal collection immediately after attachment to skin and prevention of residue on the skin after peeling from the skin; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.Type: GrantFiled: March 8, 2021Date of Patent: April 23, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Motoaki Iwabuchi, Osamu Watanabe, Joe Ikeda, Koji Hasegawa
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Publication number: 20240126168Abstract: An onium salt type monomer having the following formula (a1) or (a2).Type: ApplicationFiled: September 12, 2023Publication date: April 18, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masahiro Fukushima, Jun Hatakeyama, Masaki Ohashi
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Publication number: 20240118615Abstract: A resist composition comprising a polymer or polymer-bound photoacid generator is provided, the polymer comprising repeat units derived from a sulfonium or iodonium salt having a urethane, thiourethane or urea bond in a linker between a polymerizable unsaturated bond and a fluorosulfonic acid site. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.Type: ApplicationFiled: August 3, 2023Publication date: April 11, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Tomomi Watanabe
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Publication number: 20240118610Abstract: A resist composition contains an acid generator which is a sulfonium or iodonium salt containing a sulfonic acid anion having a cyclic structure and a fluorosulfonic acid site which are linked by a linker. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.Type: ApplicationFiled: August 14, 2023Publication date: April 11, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Tomomi Watanabe
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Patent number: 11953832Abstract: A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a substituted or unsubstituted salicylic acid exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.Type: GrantFiled: January 7, 2022Date of Patent: April 9, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventor: Jun Hatakeyama
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Publication number: 20240111212Abstract: A resist composition comprising a polymer is provided, the polymer comprising photo-decomposable repeat units derived from a sulfonium salt having a polymerizable unsaturated bond, a sulfonium cation site, and a link therebetween, the link having a urethane bond, thiourethane bond or urea bond. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.Type: ApplicationFiled: August 15, 2023Publication date: April 4, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Tomomi Watanabe
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Patent number: 11926766Abstract: A bio-electrode composition contains (A) a silicone bonded to an ionic polymer and having a structure containing a T unit shown by the following general formula (T1): (R0SiO3/2) (T1), the structure excluding a cage-like structure. In the formula, R0 represents a linking group to the ionic polymer. The ionic polymer is a polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity, biocompatibility, stretchability, and adhesion, soft, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried.Type: GrantFiled: March 31, 2022Date of Patent: March 12, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Osamu Watanabe
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Patent number: 11914294Abstract: A positive resist composition comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by an acid labile group in the form of a tertiary hydrocarbon group containing a nitrogen atom and aromatic group exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.Type: GrantFiled: December 9, 2021Date of Patent: February 27, 2024Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Jun Hatakeyama
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Patent number: 11914291Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.Type: GrantFiled: May 19, 2020Date of Patent: February 27, 2024Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Takayuki Fujiwara
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Patent number: 11911161Abstract: The present invention provides a biological electrode including an electro-conductive base material and a living body contact layer formed on the electro-conductive base material; wherein the living body contact layer includes a resin layer and particles dispersed in the resin layer, the particles being coated with gold, silver, or platinum, and a thickness of the resin layer is equal to or thinner than an average particle size of the particles. The biological electrode of the present invention is superior in electric conductivity and biocompatibility, light in weight, and can be manufactured at low cost.Type: GrantFiled: October 2, 2020Date of Patent: February 27, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Motoaki Iwabuchi
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Patent number: 11896377Abstract: A bio-electrode, excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, and free from large lowering of the electric conductivity even though it is wetted with water or dried, includes an electro-conductive base material and a living body contact layer formed on the electro-conductive base material. The living body contact layer is a cured material of a bio-electrode composition including (A) an ionic material and (C) a metal powder, wherein the component (A) is a polymer compound containing a repeating unit-a having a structure selected from an ammonium salt, a sodium salt, a potassium salt, and a silver salt of any of fluorosulfonic acid, fluorosulfonimide, and fluorosulfonamide.Type: GrantFiled: July 20, 2021Date of Patent: February 13, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa, Motoaki Iwabuchi, Yasuyoshi Kuroda
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Publication number: 20240032838Abstract: The present invention is a bio-electrode composition containing an ionic polymer material as a component (A), where the component (A) includes a polymer having: a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and a repeating unit-b having a nitro group. This provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, is light-weight, can be manufactured at low cost, can control significant reduction in conductivity either when the bio-electrode is soaked in water or dried, and is soft and has excellent stretchability and adhesiveness; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.Type: ApplicationFiled: July 1, 2023Publication date: February 1, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun HATAKEYAMA, Osamu WATANABE, Joe IKEDA
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Publication number: 20240036466Abstract: Provided is a novel onium salt used for a resist composition that has high sensitivity and excellent resolution, improved LWR and CDU, and that can inhibit collapse of a resist pattern for both of positive-type and negative-type resists in lithography: an onium salt represented by the following general formula (1), wherein RALU represents any one of a tertiary ether, tertiary carbonate, or acetal formed together with the adjacent oxygen atom and having a cyclic structure; RF represents any one of a fluorine atom, a fluorine-containing alkyl group having 1 to 6 carbon atoms, and a nitro group; Ra represents a hydrocarbyl group having 1 to 20 carbon atoms; n1 represents an integer of 0 or 1; n2 and n3 represent an integer of 1 or 2; one of RF and one of —O—RALU are bonded to carbon atoms adjacent to each other; n4 represents an integer of 0 to 3; and Z+ represents an onium cation.Type: ApplicationFiled: July 10, 2023Publication date: February 1, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro FUKUSHIMA, Jun HATAKEYAMA, Tomomi WATANABE, Kazuhiro KATAYAMA
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Publication number: 20240027903Abstract: Provided are: a resist material having high sensitivity and improved LWR (line width roughness) and CDU (critical dimension uniformity) for both of positive-type and negative-type resists; and a patterning process using this resist material: a resist material, including, as a quencher: a sulfonium salt of a substituted or unsubstituted hydroxy(trifluoromethoxy)benzoic acid; and/or a sulfonium salt of a substituted or unsubstituted hydroxy(trifluoromethylthio)benzoic acid.Type: ApplicationFiled: July 10, 2023Publication date: January 25, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun HATAKEYAMA, Masahiro FUKUSHIMA
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Publication number: 20240027909Abstract: A positive resist composition comprising a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring exhibits a higher sensitivity and resolution than the prior art and forms a pattern of good profile with low edge roughness or improved CDU after exposure and development.Type: ApplicationFiled: June 28, 2023Publication date: January 25, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventor: Jun Hatakeyama
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Publication number: 20240027902Abstract: A chemically amplified resist composition comprising a quencher and an acid generator is provided. The quencher is a salt compound consisting of a nitrogen-containing cation having a carboxy group whose hydrogen is substituted by a tertiary hydrocarbyl group having an androstane structure and a non-nucleophilic counter anion of weak acid. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.Type: ApplicationFiled: June 22, 2023Publication date: January 25, 2024Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Masahiro Fukushima
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Patent number: 11880136Abstract: A resist composition comprising an ammonium salt and fluorine-containing polymer offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone. The ammonium salt and fluorine-containing polymer comprises repeat units AU having an ammonium salt structure containing a carboxylic acid anion, sulfonamide anion, phenoxide anion or enolate anion of ?-diketone, the anion containing fluorine, but not iodine and bromine, and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group.Type: GrantFiled: July 7, 2021Date of Patent: January 23, 2024Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Jun Hatakeyama
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Patent number: 11860540Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a sulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and improved CDU, and forms a pattern of good profile after exposure and development.Type: GrantFiled: May 5, 2021Date of Patent: January 2, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventor: Jun Hatakeyama
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Publication number: 20230418157Abstract: A chemically amplified resist composition comprising a quencher and an acid generator is provided. The quencher is a nitrogen-containing carboxylic acid compound having a carboxy group whose hydrogen is substituted by a tertiary hydrocarbyl group having an androstane structure. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.Type: ApplicationFiled: June 22, 2023Publication date: December 28, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Masahiro Fukushima
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Publication number: 20230418158Abstract: The present invention is a sulfonium salt represented by the following formula (1), wherein “p” represents an integer of 1 to 3; R11 represents a hydrocarbyl group having 1 to 20 carbon atoms; Rf represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; “q” represents an integer of 1 to 4; RALU represents an acid-labile group; “r” represents an integer of 1 to 4; R12 represents a hydrocarbyl group having 1 to 20 carbon atoms; “s” represents an integer of 0 to 4; “t” represents an integer of 0 to 2; Rf and —O—RALU are bonded to adjacent carbon atoms; and X? represents a non-nucleophilic counterion having no polymerizable group.Type: ApplicationFiled: May 12, 2023Publication date: December 28, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro FUKUSHIMA, Satoshi WATANABE, Jun HATAKEYAMA, Keiichi MASUNAGA, Masaaki KOTAKE, Yuta MATSUZAWA