Abstract: A method which visualizes the distribution of a local electric field formed near a sample 2 is disclosed. A primary electron beam 1 which passes through the local electric field formed near the sample 2 is deflected by the local electric field, secondary electrons which are generated and emitted from a detection element provided downstream of an orbit of the deflected primary electron beam 1 are detected by a secondary electron detector 6, and an image formed based on the detected signal and a scanning electron beam image obtained by scanning the sample 2 are synthesized thus visualizing the distribution of the local electric field in multiple tones. Due to such an operation, it is possible to provide a method for visualizing the distribution of a local electric field in which the distribution of a local electric field can be obtained in multiple tone and in real time by performing image scanning one time using a usual electron beam scanning optical system.

Abstract: There are provided a carbon wire using CNT or a similar carbon filament having a sufficiently low electrical resistance value, and a wire assembly employing that carbon wire. A carbon wire includes an assembly portion and a graphite layer. The assembly portion is configured of a plurality of carbon filaments implemented as carbon nanotubes in contact with one another. The graphite layer is provided at an outer circumference of the assembly portion.

Abstract: An amorphous carbon rod (13) is formed in contact with a catalyst fine particle (11). The fine particle (11) is liquefied by heat treatment, and moved along the amorphous carbon rod (13). The trail of the movement is converted to a carbon nanotube.

Abstract: A metal fine particle is adhere to a predetermined location on a substrate. A resist film containing a metallic compound dispersed therein is formed on a substrate (101). A patterning of the resist film is conducted by a lithography. The substrate (101) having the patterned resist formed thereon is heated within an oxygen atmosphere to adhere a metal fine particle (106) to the surface of the substrate (101), while removing the resin in the patterned resist.

Abstract: A metal fine particle is adhere to a predetermined location on a substrate. A resist film containing a metallic compound dispersed therein is formed on a substrate (101). A patterning of the resist film is conducted by a lithography. The substrate (101) having the patterned resist formed thereon is heated within an oxygen atmosphere to adhere a metal fine particle (106) to the surface of the substrate (101), while removing the resin in the patterned resist.

Abstract: An amorphous carbon rod (13) is formed in contact with a catalyst fine particle (11). The fine particle (11) is liquefied by heat treatment, and moved along the amorphous carbon rod (13). The trail of the movement is converted to a carbon nanotube.

Abstract: The present invention provides a process for producing a nano-graphite structure having a desired two-dimensional or three-dimensional shape, which process possesses enough potential for ultra-fine processing to allow free selection of the size, shape, and position for the construction therefor; typically a process in which the nano-graphite structure 4 is produced by such a way where a nano-structure amorphous carbon structure 2 formed on a substrate 1 in advance in the shape of a desired ultra-fine steric configuration by a beam-excited reaction is equipped with catalyst metal atoms such as iron contained therein, and when subjecting the steric structure to a low-temperature heat treatment, the structure is converted into the graphite structure 3 through a catalytic thermal reaction by means of the catalyst metal atoms involved therein, while the shape of steric configuration thereof holds.

Abstract: A technique of forming an elastic DLC structure having ultra high strength by controlling an amount of focused ion beam current from 0.1 to 10 pA, and a growth rate in the range from 0.6 to 5 ?m/min. and by using hydrocarbon gas such as phenanthrene (C14H10) and pyrene (C16H10), as source gas, in an apparatus having a gas nozzle for locally maintaining a higher partial gas pressure near the substrate and a structure for confining the gas on the substrate. In this manner, the elastic DLC having the ultra high strength can be obtained of which a hardness can be controlled in a relatively broader range.

Abstract: In a magneto-resistance effect device including a plurality of magnetic dots each of which is formed by magnetic material on a substrate and appears a magneto-resistance effect by applying an external magnetic field, the magnetic dots are arranged on the substrate in a two-dimensional array. The two-dimensional array has a plurality of rows along a column direction and a plurality of columns along a row direction. The magnetic dots include at least first magnetic dots and second magnetic dots. The first magnetic dots are arranged on first rows while the second magnetic dots are arranged on second rows. The first magnetic dot is different from the second magnetic dot in shape.

Abstract: The method for forming a fine pattern on a substrate disclosed includes a step of preparing a hologram having a pattern, a step of irradiating material waves (de Broglie waves) such as neutral beams, ion beams and electron beams on the hologram, and a step of imaging the pattern on the substrate with the material waves being interfered by passing through the hologram. The light source has a source that emits a beam having a coherent wave front. Since the fine patterns are formed by utilizing the interference of material waves, the minimum processing precision can be enhanced to the extent of the wavelength of the material wave.

Abstract: A hologram is made up from a one-dimensional or two-dimensional slit array, each slit being formed with an electrode pair or electric wire for generating an electric field or magnetic field within the slit. These electric fields or magnetic fields are each set for each slit so as to confer upon an atomic beam passing through the slits a phase shift corresponding to the target hologram reproduced image, thereby allowing the target hologram image to be easily reproduced by directing the atomic beam perpendicular to the hologram surface.

Abstract: A resist film consisting of 5,11,17,23,29,35-hexachloromethyl-37, 38,39,40,41,42-hexamethoxycalix?6!arene sensitive to a high-energy beam and soluble to a solvent is formed on a substrate etchable by a dry etching, has a selective region thereof exposed to the high-energy beam, with a remaining region unexposed thereto, and developed to define a pattern on the substrate, as the remaining region is removed by the solvent, before the substrate with the pattern is subjected to the dry etching. A nanometric patterning and etching is permitted, with a reduced process time.