Abstract: A power storage device 20 comprises: a plurality of power storage elements C1-C6 that are connected in series; energy transfer circuits 40 provided respectively to the plurality of power storage elements C1-C6; a common bus 50 to which the energy transfer circuits 40 of the plurality of power storage elements C1-C6 are commonly connected; and a control device 70. Each energy transfer circuit 40 includes one or a plurality of switching transformers Tr, each switching transformer having a first winding 41A that is connected to the power storage elements C1-C6 and a secondary winding 41B that is connected to the common bus 50. The control device 70 uses the switching transformers Tr of the energy transfer circuits 40 to transfer energy between the power storage elements via the common bus 50, thereby equalizing the voltages of the power storage elements C1-C6. The common bus 50 is in an electrically floating state.

Abstract: In an inspection apparatus for an assembled battery having a plurality of energy storage devices connected in series, based on a voltage difference between a first energy storage device with the first-lowest voltage and a second energy storage device with the second-lowest voltage during charge or discharge among the plurality of energy storage devices, an abnormality of the first energy storage device is detected.

Abstract: A power storage device 20 comprises: a plurality of power storage elements C1-C6 that are connected in series; energy transfer circuits 40 provided respectively to the plurality of power storage elements C1-C6; a common bus 50 to which the energy transfer circuits 40 of the plurality of power storage elements C1-C6 are commonly connected; and a control device 70. Each energy transfer circuit 40 includes one or a plurality of switching transformers Tr, each switching transformer having a first winding 41A that is connected to the power storage elements C1-C6 and a secondary winding 41B that is connected to the common bus 50. The control device 70 uses the switching transformers Tr of the energy transfer circuits 40 to transfer energy between the power storage elements via the common bus 50, thereby equalizing the voltages of the power storage elements C1-C6. The common bus 50 is in an electrically floating state.

Abstract: A method of forming a minute resist pattern wherein a positive-working photoresist composition containing 3 to 15 parts by weight of a quinone diazide group-containing photosensitizer relative to 100 parts by weight of alkali-soluble novolak resin is developed by an aqueous organic or inorganic alkali solution having a lower alkali concentration than that of the conventional one as the developer. The preferable example of the organic alkali materials in the developer is quaternary ammonium hydroxide, and the preferable example of the inorganic alkali materials in the developer is alkali metal hydroxide. The concentrations of the quaternary ammonium hydroxide and the alkali metal hydroxide in the developing solution are 2.2% by weight or less and 0.4% by weight or less respectively. Using such developing solution, high sensitivity, a high film retention rate, high resolution, low process dependency of dimension accuracy, and a formation of excellent pattern profile can be achieved.

Abstract: A method of forming a minute resist pattern wherein a positive-working photoresist composition containing 3 to 15 parts by weight of a quinone diazide group-containing photosensitizer relative to 100 parts by weight of alkali-soluble novolak resin is developed by an aqueous organic or inorganic alkali solution having a lower alkali concentration than that of the conventional one as the developer. The preferable example of the organic alkali materials in the developer is quaternary ammonium hydroxide, and the preferable example of the inorganic alkali materials in the developer is alkali metal hydroxide. The concentrations of the quaternary ammonium hydroxide and the alkali metal hydroxide in the developing solution are 2.2% by weight or less and 0.4% by weight or less respectively. Using such developing solution, high sensitivity, a high film retention rate, high resolution, low process dependency of dimension accuracy, and a formation of excellent pattern profile can be achieved.

Abstract: A method of forming a minute resist pattern wherein a positive-working photoresist composition containing 3 to 15 parts by weight of a quinone diazide group-containing photosensitizer relative to 100 parts by weight of alkali-soluble novolak resin is developed by an aqueous organic or inorganic alkali solution having a lower alkali concentration than that of the conventional one as the developer. The preferable example of the organic alkali materials in the developer is quaternary ammonium hydroxide, and the preferable example of the inorganic alkali materials in the developer is alkali metal hydroxide. The concentrations of the quaternary ammonium hydroxide and the alkali metal hydroxide in the developing solution are 2.2% by weight or less and 0.4% by weight or less respectively. Using such developing solution, high sensitivity, a high film retention rate, high resolution, low process dependency of dimension accuracy, and a formation of excellent pattern profile can be achieved.

Abstract: A radiation sensitive resin composition containing an alkali soluble resin and a quinonediazide group-containing photosensitizer, in which the photosensitizer comprises a mixture of two or more esters between tetrahydroxybenzophenone and 1,2-naphthoquinonediazidesulfonic acid having different esterification rates. As the photosensitizer, a mixture of photosensitizer A comprising an esterification product from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid having an average esterification rate of X% (50≦X≦100) and photosensitizer B comprising an esterification product from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid having an average esterification rate of Y% (25≦Y≦ (X−10)), with the mixing ratio A:B being 10-90:90-10, is preferred.