Abstract: An illumination optical system which can use light from a light source with high efficiency and can provide an illumination luminous flux with highly uniform illuminance, is disclosed. The illumination optical system illuminates an illumination surface with a generally telecentric illumination luminous flux. In light intensity distribution of illumination light on the illumination surface changing depending on a deviation angle of an incident ray with respect to a normal to the illumination surface, the illumination optical system operates the illumination luminous flux such that a ratio of angle widths at which light intensity reaches half of a peak value in each of two axis directions orthogonal to each other on the illumination surface is an aspect ratio of 2:1.

Abstract: An illumination optical system which can use light from a light source with high efficiency and can provide an illumination luminous flux with highly uniform illuminance, is disclosed. The illumination optical system illuminates an illumination surface with a generally telecentric illumination luminous flux. In light intensity distribution of illumination light on the illumination surface changing depending on a deviation angle of an incident ray with respect to a normal to the illumination surface, the illumination optical system operates the illumination luminous flux such that a ratio of angle widths at which light intensity reaches half of a peak value in each of two axis directions orthogonal to each other on the illumination surface is an aspect ratio of 2:1.

Abstract: An illumination optical system which can use light from a light source with high efficiency and can provide an illumination luminous flux with highly uniform illuminance, is disclosed. The illumination optical system illuminates an illumination surface with a generally telecentric illumination luminous flux. In light intensity distribution of illumination light on the illumination surface changing depending on a deviation angle of an incident ray with respect to a normal to the illumination surface, the illumination optical system operates the illumination luminous flux such that a ratio of angle widths at which light intensity reaches half of a peak value in each of two axis directions orthogonal to each other on the illumination surface is an aspect ratio of 2:1.

Abstract: An optical system is disclosed which is capable of improving of its contrast characteristic and displaying of images which have a brightness according to the brightness of the use environment. The optical system comprises an optical integrator which divides and recombines the illumination luminous flux in a first axis direction and a light intensity distribution converter which converts the light intensity distribution of the illumination luminous flux in a second axis direction. The optical system further comprises a luminous flux limiting unit which has an aperture. The size of the aperture is changeable in the second axis direction and unchangeable in the first axis direction.

Abstract: At least one exemplary embodiment is directed to an image display device which includes: a first TN liquid crystal modulator for modulating the polarization state of first colored light; a second TN liquid crystal modulator for modulating the polarization state of second colored light; a third TN liquid crystal modulator for modulating the polarization state of third colored light; and an optical system for synthesizing the image light emitted from the three liquid crystal modulators; where a first voltage is applied to the first liquid crystal modulator for providing the first colored light with about half-wavelength phase difference; second voltage higher than the first voltage is applied to the second liquid crystal modulator for providing the second colored light with about half-wavelength phase difference; and third voltage higher than the second voltage is applied to the third liquid crystal modulator for providing the third colored light with about half-wavelength phase difference.

Abstract: An illumination optical system is disclosed, which provides a luminous flux with a small incident angle on an illumination surface in one axis direction on a section of the luminous flux. The illumination optical system can suppress a reduction in light amount by a mask provided for a polarization conversion element. The illumination optical system has a light source and an optical integrator. The optical integrator uses a lens array to perform splitting of a luminous flux from the light source. The illumination optical system has the polarization conversion element including a polarization beam splitter array, a plurality of ½ wave plates, and a mask. The light source is a discharge gas exciting arc tube of a DC drive type.

Abstract: An illumination optical system which can use light from a light source with high efficiency and can provide an illumination luminous flux with highly uniform illuminance, is disclosed. The illumination optical system illuminates an illumination surface with a generally telecentric illumination luminous flux. In light intensity distribution of illumination light on the illumination surface changing depending on a deviation angle of an incident ray with respect to a normal to the illumination surface, the illumination optical system operates the illumination luminous flux such that a ratio of angle widths at which light intensity reaches half of a peak value in each of two axis directions orthogonal to each other on the illumination surface is an aspect ratio of 2:1.

Abstract: A projection type image display apparatus includes an electroluminescence element which has a plurality of pixels that can each emit modulated light, a projection optical system which projects the light emitted from each of the pixels in the electroluminescence element onto an object to display an image, and a sensor which detects brightness of ambient light that illuminates the object. A controller controls brightness of the light emitted from the electroluminescence element based on the brightness of the ambient light.

Abstract: An illumination optical system is disclosed, which provides a luminous flux with a small incident angle on an illumination surface in one axis direction on a section of the luminous flux. The illumination optical system can suppress a reduction in light amount by a mask provided for a polarization conversion element. The illumination optical system has a light source and an optical integrator. The optical integrator uses a lens array to perform splitting of a luminous flux from the light source. The illumination optical system has the polarization conversion element including a polarization beam splitter array, a plurality of ½ wave plates, and a mask. The light source is a discharge gas exciting arc tube of a DC drive type.

Abstract: A projection type image display apparatus includes a projection optical system the projects light emitted from an organic EL element onto a target object. The projection optical system has a characteristic non-telecentric toward the EL element with principal rays which pass through the median point of the aperture pupil that captures light diffusively emitted from the EL element converging when seen from the EL element at a pixel position where the object height on the EL element from the optical axis of the projection optical system reaches a maximum.

Abstract: A method for manufacturing an ink discharge port of an ink jet recording head, which is provided with the ink discharge port for discharging an ink liquid droplet for adhesion thereof to a recording medium, a liquid chamber for retaining ink to be supplied to the discharge port, an ink flow path communicating with the discharge port and the liquid chamber, an energy generating element provided for a part of the ink flow path, and an ink supply port for supplying ink from outside to the liquid chamber, includes the step of processing and forming the wall face inside the ink discharge surface of the ink discharge port to a surface condition having irregularities of greater than or equal to 0.3 micrometer and less than or equal to 1 micrometer as the standard deviation value for the surface roughness thereof.

Abstract: A projection type image display apparatus includes an electroluminescence element which has a plurality of pixels that can each emit modulated light, a projection optical system which projects the light emitted from each of the pixels in the electroluminescence element onto an object to display an image, and a sensor which detects brightness of ambient light that illuminates the object. A controller controls brightness of the light emitted from the electroluminescence element based on the brightness of the ambient light.

Abstract: A projection type image display apparatus which suppresses deterioration in luminous efficiency of an organic EL element and reduces flickering of projected images and an amplitude of a power supply capacity is disclosed. The apparatus comprises an electroluminescence (EL) element, a projection optical system, and a controller which generates drive signals to control the emission amount from the EL element. An EL material used for a luminescent layer of the EL element is a phosphorescent material which emits phosphorescence by priority, which is emitted from an excited triplet state. The controller generates drive signals by superimposing an intermittent turning-on signal on emission amount modulating signals to modulate current values to be injected into pixels according to display image signals.

Abstract: The invention provides a laser etching method for optical ablation working by irradiating a work article formed of an inorganic material with a laser light from a laser oscillator capable of emitting in succession light pulses of a large energy density in space and time with a pulse radiation time not exceeding 1 picosecond, wherein, in laser etching of the work article formed of the inorganic material by irradiation thereof with the laser light from the laser oscillator with a predetermined pattern and with a predetermined energy density, there is utilized means for preventing deposition of a work by-product around the etching position.

Abstract: The invention provides a laser etching method for optical ablation working by irradiating a work article formed of an inorganic material with a laser light from a laser oscillator capable of emitting in succession light pulses of a large energy density in space and time with a pulse radiation time not exceeding 1 picosecond, wherein, in laser etching of the work article formed of the inorganic material by irradiation thereof with the laser light from the laser oscillator with a predetermined pattern and with a predetermined energy density, there is utilized means for preventing deposition of a work by-product around the etching position.

Abstract: An image recording apparatus includes at least one recording head, in which a plurality of solid-state recording elements are arranged, for performing image recording by causing each of the plurality of solid-state recording elements to record a pixel, a storage unit for storing correction data for correcting image data in accordance with a recording characteristic of each of the plurality of solid-state recording elements so as to correspond to the corresponding one of the plurality of solid-state recording elements. Each of the plurality of solid-state recording elements is driven in accordance with input image data and the correction data stored in the storage unit.

Abstract: An illumination optical system which can use light from a light source with high efficiency and can provide an illumination luminous flux with highly uniform illuminance, is disclosed. The illumination optical system illuminates an illumination surface with a generally telecentric illumination luminous flux. In light intensity distribution of illumination light on the illumination surface changing depending on a deviation angle of an incident ray with respect to a normal to the illumination surface, the illumination optical system operates the illumination luminous flux such that a ratio of angle widths at which light intensity reaches half of a peak value in each of two axis directions orthogonal to each other on the illumination surface is an aspect ratio of 2:1.

Abstract: An illumination optical system is disclosed, which provides a luminous flux with a small incident angle on an illumination surface in one axis direction on a section of the luminous flux. The illumination optical system can suppress a reduction in light amount by a mask provided for a polarization conversion element. The illumination optical system has a light source and an optical integrator. The optical integrator uses a lens array to perform splitting of a luminous flux from the light source. The illumination optical system has the polarization conversion element including a polarization beam splitter array, a plurality of ½ wave plates, and a mask. The light source is a discharge gas exciting arc tube of a DC drive type.

Abstract: An image can be outputted with a high sharpness without deteriorating a resolution. In order to output an image of a high picture quality while suppressing the occurrence of a moire, an exposure amount is modulated in accordance with pixel density information of the image divided into pixels of a predetermined size by an exposure amount modulating unit in a light scanning unit, thereby expressing an image dark/light state. In this case, in a highlight density region in which a pixel density is equal to or less than ⅓ of the maximum image density, the density data of two adjoining pixels is modulated by one pixel and the other pixel is not recorded. In a density region in which the image density lies within a range from ⅓ to ½ of the maximum image density, a part of the density data of one of the two adjoining pixels is transposed to the other pixel.

Abstract: A laser working method, for conducting laser ablation working on a workpiece by irradiating the workpiece with a laser beam, includes the following steps. In working by projecting a mask pattern with the laser beam, a laser beam of plural pulses having a very high energy density in space and time, emitted from a laser oscillator that can oscillate with a pulse radiation time of 1 picosecond or less, is employed. Scanning illumination is conducted by relative movement of a source of the laser beam and the mask pattern. The relative movement between the source of the laser beam and the mask pattern may be conducted by a reciprocating movement in a direction perpendicular to an optical axis of the laser beam, asynchronously with laser oscillation, and a form of the mask pattern may be formed stepwise and in succession on the workpiece.