Abstract: An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent informing a protecting film and (5) water; and a method for polishing.

Abstract: The invention relates to an abrasive containing a slurry of the following cerium oxide grains as dispersed in water:

Abstract: To polish polishing target surfaces of SiO2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a medium and dispersed therein at least one of i) cerium oxide particles constituted of at least two crystallites and having crystal grain boundaries or having a bulk density of not higher than 6.5 g/cm3 and ii) abrasive grains having pores. Also provided are a method of polishing a target member and a process for producing a semiconductor device which make use of this abrasive.

Abstract: This invention provides a cerium oxide abrasive with which the surfaces of substrates such as SiO2 insulating films can be polished at a high rate without causing scratches. The abrasive of the present invention comprises a slurry comprising cerium oxide particles whose primary particles have a diameter of from 10 nm to 600 nm and a median diameter of from 30 nm to 250 nm and slurry particles have a median diameter of from 150 nm to 600 nm and a maximum diameter of 3,000 nm or smaller, the cerium oxide particles being dispersed in a medium.

Abstract: A material for forming silica-base coated insulation films used to form interlayer insulation films of multi-layer interconnection in VLSIs is provided. A material for forming a silica-base coated insulation film, obtained from (a) an alkoxysilane and/or a partially hydrolyzed product thereof, (b) a fluorine-containing alkoxysilane and/or (e) an alkylalkoxysilane, (c) an alkoxide of a metal other than Si and/or a derivative thereof and (d) an organic solvent. The material for forming silica-base coated insulation films according to the present invention has a storage stability and also enables thick-layer formation. Silica-base insulation films obtained are transparent and uniform films and are those in which no defects such as cracks or pinholes are seen, also having a superior oxygen plasma resistance.

Abstract: A grafted copolymer containing low cis-polybutadiene having a Mooney viscosity of 30 to 40 as a rubber component, and 30% by volume or more of particles of said rubber component becoming non-spherical rubber particles when molded into a molded article, is suitable for use as a low gloss agent which is usable in the fields of internal and external automotive trims, exterior parts of household electric appliances, etc.

Abstract: A grafted copolymer containing low cis-polybutadiene having a Mooney viscosity of 30 to 40 as a rubber component, and 30% by volume or more of particles of said rubber component becoming non-spherical rubber particles when molded into a molded article, is suitable for use as a low gloss agent which is usable in the fields of internal and external automotive trims, exterior parts of household electric appliances, etc.

Abstract: A grafted copolymer containing low cis-polybutadiene having a Mooney viscosity of 30 to 40 as a rubber component, and 30% by volume or more of particles of said rubber component becoming non-spherical rubber particles when molded into a molded article, is suitable for use as a low gloss agent which is usable in the fields of internal and external automotive trims, exterior parts of household electric applicances, etc.

Abstract: A resin composition comprising a copolymer (A) having carbon-carbon unsaturated bonds in its side chains, particularly that obtained by reacting a copolymer of alkyl (meth)arylate (0-50 mole %), hydroxy (meth)acrylate (10-50 mole %) and ethylenic unsaturated monomer (0 to 90 mole %) with an unsaturated carboxylic acid or an anhydride thereof, and a monomer (B) copolymerizable with (A) is suitable for producing a laminate for electrical use.