Patents by Inventor Jun Mihira

Jun Mihira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lamp annealer and method for controlling processing temperature thereof
    Patent number: 6469284
    Abstract: A fluctuation of a transistor characteristic is calculated based on deviation of the value measured for each of specified steps, and total fluctuation of the transistor characteristic is calculated for the previous steps prior to an annealing step. The processing temperature of the annealing step is controlled to cancel the total fluctuation of the transistor characteristic caused by the previous steps to obtain a designed transistor characteristic. The control of the processing temperature is effected for each zone of a wafer.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: October 22, 2002
    Assignee: NEC Corporation
    Inventor: Jun Mihira
  • Ion implantation apparatus for wafers
    Patent number: 6329664
    Abstract: An ion implantation apparatus is provided which does not require dummy wafers and which is capable of reducing the manufacturing cost and increasing the throughput. The ion implantation apparatus is provided with holder arms connected to respective wafer holders on the wafer disc, and those holder arms make it possible to move the wafer holders in the radial direction of the wafer disc. The ion implantation apparatus is also provided with a control unit which controls the scanning position such that wafers are irradiated by the ion beam.
    Type: Grant
    Filed: March 29, 1999
    Date of Patent: December 11, 2001
    Assignee: NEC Corporation
    Inventor: Jun Mihira