Patents by Inventor Jun-Tae Choi

Jun-Tae Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240180027
    Abstract: Disclosed is an organic light emitting device and a composition for forming an organic material layer of the organic light emitting device.
    Type: Application
    Filed: September 27, 2023
    Publication date: May 30, 2024
    Applicant: LT MATERIALS CO., LTD.
    Inventors: Sol LEE, Jun-Tae MO, Dong-Jun KIM, Dae-Hyuk CHOI
  • Patent number: 11970566
    Abstract: Disclosed is a method of manufacturing a polyurethane filter foam having excellent air permeability, elasticity, and restoring force. In the method of manufacturing the polyurethane filter foam, the cell size of the filter foam is made regular by controlling the pressure by adjusting the diameter of the foaming head of a foaming machine, rather than adding a cell opener, cell irregularity caused by poor dispersion of the cell opener is alleviated, and air permeability, porosity, and compression set are excellent.
    Type: Grant
    Filed: September 30, 2022
    Date of Patent: April 30, 2024
    Assignees: HYUNDAI TRANSYS INC., CHIN YANG CO., LTD.
    Inventors: Jae Yong Ko, Seung Keon Woo, Young Tae Cho, Won Sug Choi, Sung Yoon Lee, Jae Kwang Lee, Jun Ho Song
  • Publication number: 20210319981
    Abstract: Exemplary semiconductor processing chambers may include a gasbox. The chambers may include a substrate support. The chambers may include a blocker plate positioned between the gasbox and the substrate support. The blocker plate may define a plurality of apertures through the plate. The chambers may include a faceplate positioned between the blocker plate and the substrate support. The faceplate may be characterized by a first surface facing the blocker plate and a second surface opposite the first surface. The faceplate may be characterized by a central axis. The faceplate may define a plurality of apertures through the faceplate distributed in a number of rings. Each ring of apertures may include a scaled increase in aperture number from a ring radially inward. A radially outermost ring of apertures may be characterized by a number of apertures reduced from the scaled increase in aperture number.
    Type: Application
    Filed: April 9, 2020
    Publication date: October 14, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Arun Thottappayil, Mayur Govind Kulkarni, Junghoon Sun, Jun Tae Choi, Hang Yu
  • Patent number: 10858735
    Abstract: Alignment systems employing actuators provide relative displacement between lid assemblies of process chambers and substrates, and related methods are disclosed. A process chamber includes chamber walls defining a process volume in which a substrate may be placed and the walls support a lid assembly of the process chamber. The lid assembly contains at least one of an energy source and a process gas dispenser. Moreover, an alignment system may include at least one each of a bracket, an interface member, and an actuator. By attaching the bracket to the chamber wall and securing the interface member to the lid assembly, the actuator may communicate with the bracket and the interface member to provide relative displacement between the chamber wall and the lid assembly. In this manner, the lid assembly may be positioned relative to the substrate to improve process uniformity across the substrate within the process chamber.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: December 8, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Danny D. Wang, Jason Michael Lamb, Jun Tae Choi, Rupankar Choudhury, Zhong Qiang Hua, Juan Carlos Rocha-Alvarez
  • Publication number: 20190390334
    Abstract: Alignment systems employing actuators provide relative displacement between lid assemblies of process chambers and substrates, and related methods are disclosed. A process chamber includes chamber walls defining a process volume in which a substrate may be placed and the walls support a lid assembly of the process chamber. The lid assembly contains at least one of an energy source and a process gas dispenser. Moreover, an alignment system may include at least one each of a bracket, an interface member, and an actuator. By attaching the bracket to the chamber wall and securing the interface member to the lid assembly, the actuator may communicate with the bracket and the interface member to provide relative displacement between the chamber wall and the lid assembly. In this manner, the lid assembly may be positioned relative to the substrate to improve process uniformity across the substrate within the process chamber.
    Type: Application
    Filed: September 5, 2019
    Publication date: December 26, 2019
    Inventors: Danny D. WANG, Jason Michael LAMB, Jun Tae CHOI, Rupankar CHOUDHURY, Zhong Qiang HUA, Juan Carlos ROCHA-ALVAREZ
  • Patent number: 10435786
    Abstract: Alignment systems employing actuators provide relative displacement between lid assemblies of process chambers and substrates, and related methods are disclosed. A process chamber includes chamber walls defining a process volume in which a substrate may be placed and the walls support a lid assembly of the process chamber. The lid assembly contains at least one of an energy source and a process gas dispenser. Moreover, an alignment system may include at least one each of a bracket, an interface member, and an actuator. By attaching the bracket to the chamber wall and securing the interface member to the lid assembly, the actuator may communicate with the bracket and the interface member to provide relative displacement between the chamber wall and the lid assembly. In this manner, the lid assembly may be positioned relative to the substrate to improve process uniformity across the substrate within the process chamber.
    Type: Grant
    Filed: October 23, 2014
    Date of Patent: October 8, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Danny D. Wang, Jun Tae Choi, Rupankar Choudhury, Zhong Qiang Hua, Juan Carlos Rocha-Alvarez, Jason Michael Lamb
  • Publication number: 20160068951
    Abstract: Alignment systems employing actuators provide relative displacement between lid assemblies of process chambers and substrates, and related methods are disclosed. A process chamber includes chamber walls defining a process volume in which a substrate may be placed and the walls support a lid assembly of the process chamber. The lid assembly contains at least one of an energy source and a process gas dispenser. Moreover, an alignment system may include at least one each of a bracket, an interface member, and an actuator. By attaching the bracket to the chamber wall and securing the interface member to the lid assembly, the actuator may communicate with the bracket and the interface member to provide relative displacement between the chamber wall and the lid assembly. In this manner, the lid assembly may be positioned relative to the substrate to improve process uniformity across the substrate within the process chamber.
    Type: Application
    Filed: October 23, 2014
    Publication date: March 10, 2016
    Inventors: Danny D. WANG, Jun Tae CHOI, Rupankar CHOUDHURY, Zhong Qiang HUA, Juan Carlos ROCHA-ALVAREZ, Jason Michael LAMB
  • Patent number: 9096739
    Abstract: Provided is a cellulose acetate film used for optical compensation and, in particular, a cellulose acetate film having a low retardation value Rth in the film thickness direction.
    Type: Grant
    Filed: August 29, 2011
    Date of Patent: August 4, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Myoung Lae Kim, Jee Young Ahn, Hyuk Jun Kim, Ki Yup Kim, Sung Ho Son, Yong Gyun Cho, Won Yeob Kim, Jun Tae Choi
  • Publication number: 20150053113
    Abstract: Provided is a cellulose acetate film used for optical compensation and, in particular, a cellulose acetate film having a low retardation value Rth in the film thickness direction.
    Type: Application
    Filed: August 29, 2011
    Publication date: February 26, 2015
    Applicant: SK INNOVATION CO., LTD.
    Inventors: Myoung Lae Kim, Jee Young Ahn, Hyuk Jun Kim, Ki Yup Kim, Sung Ho Son, Yong Gyun Cho, Won Yeob Kim, Jun Tae Choi
  • Patent number: 8883272
    Abstract: Provided are a cellulose acylate film used for optical compensation and additives used therefor and, more particularly, is a cellulose acylate film with mechanical physical properties, in particular, very improved modulus affecting film durability.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: November 11, 2014
    Assignee: SK Innovation Co., Ltd.
    Inventors: Won Seok Jang, Yong Gyun Cho, Won Yeob Kim, Jun Tae Choi, Myoung Lae Kim, Hyuk Jun Kim, Ki Yup Kim, Sung Ho Son
  • Publication number: 20130288485
    Abstract: A method of forming a dielectric layer is described. The method first deposits an initially-flowable layer on a substrate. The initially-flowable layer is then densified by exposing the substrate to a high-density plasma (HDP). Essentially no additional material is deposited on the initially-flowable layer, in embodiments, but the impact of the accelerated ionic species serves to condense the layer and increase the etch tolerance of the processed layer.
    Type: Application
    Filed: March 11, 2013
    Publication date: October 31, 2013
    Applicant: Applied Materials, Inc.
    Inventors: Jingmei Liang, Sukwon Hong, Jun Tae Choi
  • Publication number: 20130234083
    Abstract: Provided are a cellulose acylate film used for optical compensation and additives used therefor and, more particularly, is a cellulose acylate film with mechanical physical properties, in particular, very improved modulus affecting film durability.
    Type: Application
    Filed: November 18, 2011
    Publication date: September 12, 2013
    Applicant: SK INNOVATION CO., LTD.
    Inventors: Won Seok Jang, Yong Gyun Cho, Won Yeob Kim, Jun Tae Choi, Myoung Lae Kim, Hyuk Jun Kim, Ki Yup Kim, Sung Ho Son
  • Publication number: 20120171392
    Abstract: Provided are an optical film for use in flat panel display (FPD) devices, and a method for manufacturing the same. Particularly, there is provided a method for imparting surface roughness to an optical film, which includes forming dented craters having a radius of curvature of 10 nm-100 ?m on the surface of an optical film obtained by a solution casting process and forming a plateau between one crater and another crater. There is also provided an optical film obtained by the same method.
    Type: Application
    Filed: September 2, 2010
    Publication date: July 5, 2012
    Applicant: SK INNOVATION CO., LTD.
    Inventors: Yong Gyun Cho, Chol Ho Lee, Yoo Seock Hwang, Hyuk Jun Kim, Ki Yup Kim, Sung Ho Son, Ki-Beom Kim, Kwang Jin Chung, Jun Tae Choi
  • Patent number: 7390757
    Abstract: The present invention relates to fluorinated silicate glass (FSG) with low dielectric constant and improved gap-fill characteristics. In the present method, a fluorinated silicon source, an optional fluorine source, an optional carbon source, a hydrogen source, and an oxygenator are used as the reactant gases. Inert or carrier gas(es) may also be used. In accordance with the present invention, the reactant gas mixture does not comprise a silane compound having the general formula SixHy, wherein x has a range of 1 to 2, y has a range of 4 to 6. The material deposited is thus referred to herein alternatively as “SixFy-only FSG” or “SixFy-only fluorinated oxide” (“SOFO”).
    Type: Grant
    Filed: November 15, 2005
    Date of Patent: June 24, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Seong-Oh Woo, Jun Tae Choi
  • Patent number: 6441200
    Abstract: Disclosed is a method for preparing DL-&agr;-tocopherol through the condensation of isophytol or phytol derivatives and trimethylhydroquinone (TMHQ) using a catalyst system comprising a divalent metal halogen compound, silica gel and/or silica-alumina, and a Brönsted acid. Isophytol or phytol derivatives are slowly added to trimethylhydroquinone for the condensation thereof at 80 to 135° C. over 30 to 60 min in the presence of the metal halogen and the silica gel and/or silica-alumina. In the presence of the Brönsted acid, the intermediates are converted into the product. The silica gel and/or silica-alumina is washed with a polar solvent for recovery. The catalyst system can remarkably reduce side-reactions upon the condensation of isophytol or phytol derivatives and TMHQ, thus producing DL-&agr;-tocopherol with a high purity at a high yield.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: August 27, 2002
    Assignee: Sk Corporation
    Inventors: Sijoon Lee, Jeong-Soo Kim, Young-Seek Yoon, Myung-Jun Kim, Jun-Tae Choi, Byong-Sung Kwak