Patents by Inventor June-Ing Kil

June-Ing Kil has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist stripper composition and method for stripping photoresist using the same
    Patent number: 6458518
    Abstract: A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: October 1, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-sik Moon, Mi-sook Jeon, Pil-kwon Jun, June-ing Kil, Je-eung Park, Sang-mun Chun
  • Photoresist stripper composition and method for stripping photoresist using the same
    Publication number: 20020127500
    Abstract: A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.
    Type: Application
    Filed: January 15, 2002
    Publication date: September 12, 2002
    Inventors: Sang-Sik Moon, Mi-Sook Jeon, Pil-Kwon Jun, June-Ing Kil, Je-Eung Park, Sang-Mun Chun
  • Photoresist stripper composition and method for stripping photoresist using the same
    Patent number: 6432622
    Abstract: A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: August 13, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-sik Moon, Mi-sook Jeon, Pil-kwon Jun, June-ing Kil, Je-eung Park, Sang-mun Chun
  • Photoresist stripping composition
    Patent number: 6211127
    Abstract: A photoresist stripping composition suitable for both of the single wafer treatment method using an air knife process and a dipping photoresist stripping method. The composition comprises 5-15 weight % of alkanolamine, 35-55 weight % of sulfoxide or sulfone compound and 35-55 weight % of glycolether, and preferably further includes surfactant, and also 1-10 weight % of tetra methyl ammonium hydroxide or 3-15 weight % of benzenediol and 1-15 weight % of alkylsulfonic acid.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: April 3, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-Seock Kim, June-Ing Kil, Dong-Jin Park, Shang-Oa Park, Chun-Duek Lee, Seog-Young Lim, Yang-Sun Kim