Abstract: An active noise control system selects one reference sensor providing a reference signal with the largest coherence to a noise signal, among a plurality of available reference sensors, as a first entry of a reference sensor set. After selecting the first entry, the active noise control system repeats a process in which a sensor capable of providing the largest information quantity to a current reference sensor set among remaining sensors is selected as a new entry of a reference sensor set, until a desired number of sensors is reached or a desired control level is reached. When the reference sensor set is determined, the active noise control system utilizes the entries of the reference sensor set to generates a noise control signal suitable for canceling the noise signal.

Abstract: An electronic device and method are provided guiding image capturing based on property information of an external light source. The electronic device includes a camera, a display, and a processor. The processor is configured to obtain an image using the camera; identify a face included in the image; determine a first brightness value for a first region of the identified face and a second brightness value for a second region of the identified face; determine property information of an external light source for the identified face, based on the first brightness value and the second brightness value; and provide, through the display, guide information corresponding to the property information of the external light source for the identified face.

Abstract: The present invention relates to a composition for suppressing neuraminidase activity comprising a geranylated flavonoid derived from Paulownia tomentosa as an active ingredient. The Paulownia tomentosa extract and the geranylated flavonoid isolated therefrom exhibit an effect in significantly suppressing neuraminidase, which is an enzyme that plays an important role in the occurrence of pathogenic viral and bacterial infections and of the inflammation that accompanies such infection, and thus the Paulownia tomentosa extract or the geranylated flavonoid isolated therefrom can advantageously be used as an active ingredient in a composition for inhibiting neuraminidase activity.

Abstract: An electronic device and method are provided guiding image capturing based on property information of an external light source. The electronic device includes a camera, a display, and a processor. The processor is configured to obtain an image using the camera; identify a face included in the image; determine a first brightness value for a first region of the identified face and a second brightness value for a second region of the identified face; determine property information of an external light source for the identified face, based on the first brightness value and the second brightness value; and provide, through the display, guide information corresponding to the property information of the external light source for the identified face.

Abstract: The present invention relates to a composition for suppressing neuraminidase activity comprising a geranylated flavonoid derived from Paulownia tomentosa as an active ingredient. The Paulownia tomentosa extract and the geranylated flavonoid isolated therefrom exhibit an effect in significantly suppressing neuraminidase, which is an enzyme that plays an important role in the occurrence of pathogenic viral and bacterial infections and of the inflammation that accompanies such infection, and thus the Paulownia tomentosa extract or the geranylated flavonoid isolated therefrom can advantageously be used as an active ingredient in a composition for inhibiting neuraminidase activity.

Abstract: The present invention is directed to a substrate dryer, a substrate treating apparatus including the substrate dryer, and a substrate treating method. The substrate dryer includes a chamber, a process chamber constituting one part of the chamber and provided for supplying supercritical fluid to a substrate to dry the substrate, and a high-pressure chamber constituting the other part of the chamber and provided for boosting the process chamber above a critical pressure. According to the present invention, the substrate drying chamber is boosted fast by the high-pressure chamber to change to a supercritical state and thus a substrate dry treatment is performed using supercritical fluid.

Abstract: In a method of manufacturing a carbon nanotube, a boat configured to receive substrates is positioned outside of a synthesis space where the carbon nanotube is synthesized. The substrates are loaded into the boat. The boat is then transferred to the synthesis space. A process for forming the carbon nanotube is performed on the substrates in the synthesis space to form the carbon nanotube. Thus, the carbon nanotube may be effectively manufactured.

Abstract: A substrate treating apparatus for stripping photoresist on a substrate includes a support part for supporting the substrate, a dry-type treating part for stripping the photoresist on the substrate, and a wet-type treating part for stripping the photoresist on the substrate. While the substrate is supported by the support part, the photoresist on the substrate is primarily stripped by means of the dry-type treating part and secondarily stripped by means of the wet-type treating part. The dry-type treating part includes a plasma supply unit configured to supply plasma onto the substrate and a moving unit configured to vary a relative position of the plasma supply unit and the substrate.

Abstract: A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.

Abstract: An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.

Abstract: Provided is a thin film deposition apparatus. The thin film deposition apparatus includes a substrate support unit configured to support a substrate; and a shower head disposed above the substrate support unit to supply a process gas to the substrate. The shower head includes: an upper plate including a plurality of gas channels forming process gas flow paths and gas injection holes formed in the gas channels, high-frequency power being applied to the upper plate to excite the process gas into plasma; a baffle plate disposed under the upper plate and including a plurality of holes to uniformly distribute the process gas; and an injection plate disposed under the baffle plate to inject the process gas supplied through the baffle plate to a substrate.

Abstract: A spin head includes chucking pins configures to chuck and unchuck a substrate. Contact portions of the chucking pins and the substrate are varied during a process to prevent a treating solution from remaining at the contact portions.

Abstract: A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes.

Abstract: A spin head includes a rotatable plate, first chucking pins and second chucking pins for supporting a edge portion of a substrate loaded on the plate, and a driving unit for selectively driving the first and second chucking pins. The driving unit includes a first magnet connected to the first chucking pin and disposed at a first height, a second magnet connected to the second chucking pin and disposed at a second height, and a driving magnet for driving the first and second magnets. The driving magnet is elevated by means of an elevating member to selectively apply a magnetic force to the first or second magnet and moves in the radius outside direction of the first or second chucking pin due to a magnetic force.

Abstract: Provided are an apparatus and method for synthesizing a conductive composite with enhanced electrical conductivity. The apparatus includes: an injection-molding machine which injection-molds pellets created by mixing carbon nanotubes (CNTs) with polymers; and an electric field generator which applies an electric field to the pellets that are melted while the melted pellets are injection-molded and thus rearranges the CNTs included in a composite into which the melted pellets are injection-molded.

Abstract: An apparatus for synthesizing a carbon nanotube includes a reaction chamber, a cassette, a transferring member, a heater, a gas supply member and a gas exhausting part. The carbon nanotube is synthesized in the reaction chamber. The reaction chamber has a substantially vertical major axis. The cassette holds a plurality of substrates. The transferring member transfers the cassette along a direction substantially in parallel relative to the major axis to load/unload the cassette into/from the reaction chamber. The heater heats the reaction chamber. The gas supply member provides the reaction chamber with a gas for synthesizing the carbon nanotube. The gas exhausting member exhausts a remaining gas from the reaction chamber. Collecting the carbon nanotube may be facilitated and managing the reaction chamber may be effective to enhance a productivity of the carbon nanotube.

Abstract: In a method of manufacturing a carbon nanotube, a boat configured to receive substrates is positioned outside of a synthesis space where the carbon nanotube is synthesized. The substrates are loaded into the boat. The boat is then transferred to the synthesis space. A process for forming the carbon nanotube is performed on the substrates in the synthesis space to form the carbon nanotube. Thus, the carbon nanotube may be effectively manufactured.

Abstract: A substrate treating apparatus includes a substrate support unit with a chuck on which a substrate is loaded; a bottom chamber having an open top and configured to surround the circumference of the chuck; a top chamber configured to open or close the top of the bottom chamber such that the substrate is dried while the top chamber is sealed from the outside; and a direct injection nozzle member installed at the top chamber to inject fluid directly to the substrate while the top of the bottom chamber is closed. According to the substrate treating apparatus, drying efficiency of an entire substrate is enhanced, external contaminants are blocked, and generation of an oxide layer is suppressed.

Abstract: Provided are an apparatus and method for synthesizing a conductive composite with enhanced electrical conductivity. The apparatus includes: an injection-molding machine which injection-molds pellets created by mixing carbon nanotubes (CNTs) with polymers; and an electric field generator which applies an electric field to the pellets that are melted while the melted pellets are injection-molded and thus rearranges the CNTs included in a composite into which the melted pellets are injection-molded.

Abstract: The present invention provides an apparatus and method for cleaning substrates such as semiconductor wafers by sinking the substrates into cleaning fluids such as cleaning chemicals or rinsing liquids and then drying the substrates. The substrate clean and dry apparatus of present invention includes a process chamber comprising a cleaning chamber that carries the cleaning fluid and discharges at bottom the cleaning fluid; and a drying chamber above the cleaning chamber. The process chamber further includes a discharge device for evacuating the gas from the drying chamber, the gas supplied into the drying chamber. The discharge device is located between the cleaning chamber and the drying chamber, and evacuates the gas by force such that the gas is driven down vertically in the drying chamber.