Patents by Inventor Jung-Pin Hsu

Jung-Pin Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9939568
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application of the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D) and a pigment (E). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having the structure represented by formula (1). The aforementioned photosensitive resin composition is advantageously applied for the color filer with better contrast.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: April 10, 2018
    Assignee: Chi Mei Corporation
    Inventors: Jung-Pin Hsu, Bo-Hsuan Lin
  • Patent number: 9897729
    Abstract: The present invention relates to a photosensitive resin composition for color filter and application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The alkali-soluble resin (A) is obtained by copolymerizing a vinyl unsaturated monomer having a carboxylic group (a1), a vinyl unsaturated monomer having a silane group (a2), a vinyl unsaturated monomer having an oxetanyl group (a3) and an other copolymerizable vinyl unsaturated monomer (a4).
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: February 20, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9568763
    Abstract: The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Duan-Chih Wang, Jung-Pin Hsu
  • Patent number: 9568823
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Yu-Ju Wu, Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9529116
    Abstract: A photosensitive resin composition and application of the same are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photo initiator (C), an organic solvent (D), a pigment (E) and a metal chelating agent (F). During a pixel process with an omission of a prebake step, the photosensitive resin composition, which is added with the metal chelating agent (F), can be formed to pixels that is adhered tightly to a substrate.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: December 27, 2016
    Assignee: CHI MEI CORPORATION
    Inventors: Bo-Hsuan Lin, Jung-Pin Hsu, Duan-Chih Wang
  • Patent number: 9519208
    Abstract: A photosensitive resin composition for color filter including an alkai-soluble resin (A-1), an alkai-soluble resin (A-2) having a functional group represented by formula (2), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D), and a pigment (E) is provided, wherein the alkai-soluble resin (A-1) is formed by copolymerizing an ethylenically unsaturated monomer (a-1) having a carboxylic acid group, a compound (a-2) having a cyclicimide group represented by formula (1), and other copolymerizable ethylenically unsaturated monomers (a-3) except for the ethylenically unsaturated monomer (a-1) having the carboxylic acid group and the compound (a-2) having the cyclicimide group represented by formula (1).
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: December 13, 2016
    Assignee: Chi Mei Corporation
    Inventor: Jung-Pin Hsu
  • Publication number: 20160327863
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application of the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D) and a pigment (E). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having the structure represented by formula (1). The aforementioned photosensitive resin composition is advantageously applied for the color filer with better contrast.
    Type: Application
    Filed: May 6, 2016
    Publication date: November 10, 2016
    Inventors: Jung-Pin Hsu, Bo-Hsuan Lin
  • Publication number: 20160077428
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.
    Type: Application
    Filed: September 9, 2015
    Publication date: March 17, 2016
    Inventors: YU-JU WU, BAR-YUAN HSIEH, JUNG-PIN HSU
  • Patent number: 9274419
    Abstract: The present invention relates to a blue photosensitive resin composition for a color filter and an application thereof. The blue photosensitive resin composition includes an organic pigment (A), a dye (B), an alkali-soluble resin (C), a compound having an ethylenically unsaturated group (D), a photo-initiator (E) and a solvent (F). The alkali-soluble resin (C) includes a first alkali-soluble resin (C-1) having a hindered amine structure. The blue photosensitive resin composition of the present invention can improve a voltage holding ratio and a contrast ratio of the color filter.
    Type: Grant
    Filed: March 11, 2015
    Date of Patent: March 1, 2016
    Assignee: CHI MEI CORPORATION
    Inventor: Jung-Pin Hsu
  • Patent number: 9268218
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a compound having an ethylenically unsaturated group (C), a photo initiator (D) and an organic solvent (E). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), and the first alkali-soluble resin (B-1) is copolymerized by a first mixture. The first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: February 23, 2016
    Assignee: CHI MEI CORPORATION
    Inventor: Jung-Pin Hsu
  • Publication number: 20150323863
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a compound having an ethylenically unsaturated group (C), a photo initiator (D) and an organic solvent (E). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), and the first alkali-soluble resin (B-1) is copolymerized by a first mixture. The first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).
    Type: Application
    Filed: July 16, 2015
    Publication date: November 12, 2015
    Inventor: Jung-Pin HSU
  • Publication number: 20150315376
    Abstract: The present invention relates to a photosensitive resin composition for color filter and application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The alkali-soluble resin (A) is obtained by copolymerizing a vinyl unsaturated monomer having a carboxylic group (a1), a vinyl unsaturated monomer having a silane group (a2), a vinyl unsaturated monomer having an oxetanyl group (a3) and an other copolymerizable vinyl unsaturated monomer (a4).
    Type: Application
    Filed: April 16, 2015
    Publication date: November 5, 2015
    Inventors: Bar-Yuan HSIEH, Jung-Pin HSU
  • Patent number: 9164196
    Abstract: The invention relates to a photosensitive resin composition, and it has the advantages of a high development speed and good compatibility. The invention also provides a method for manufacturing a color filter, color filter and liquid crystal display device.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: October 20, 2015
    Assignee: CHI MEI CORPORATION
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu, Bo-Hsuan Lin
  • Publication number: 20150285973
    Abstract: A photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a compound (A) containing an ethylenically unsaturated group, an alkali-soluble resin (B), a photoinitiator (C), a pigment (D), and an organic solvent (E). The compound (A) containing an ethylenically unsaturated group includes a first compound (A-1) containing an ethylenically unsaturated group. The first compound (A-1) containing an ethylenically unsaturated group has two or more groups represented by formula (1) and does not have an aromatic skeleton. The photosensitive resin composition has the advantages of high precision pattern linearity and good alkali solution resistance.
    Type: Application
    Filed: March 26, 2015
    Publication date: October 8, 2015
    Inventors: Wei-Kai Ho, Jung-Pin Hsu
  • Publication number: 20150268554
    Abstract: The present invention relates to a blue photosensitive resin composition for a color filter and an application thereof. The blue photosensitive resin composition includes an organic pigment (A), a dye (B), an alkali-soluble resin (C), a compound having an ethylenically unsaturated group (D), a photo-initiator (E) and a solvent (F). The alkali-soluble resin (C) includes a first alkali-soluble resin (C-1) having a hindered amine structure. The blue photosensitive resin composition of the present invention can improve a voltage holding ratio and a contrast ratio of the color filter.
    Type: Application
    Filed: March 11, 2015
    Publication date: September 24, 2015
    Inventor: Jung-Pin HSU
  • Patent number: 9134564
    Abstract: A color liquid crystal display device includes a liquid crystal display element and a backlight unit. The liquid crystal display element includes a color filter having a red filter segment, a green filter segment, and a blue filter segment. The blue filter segment is prepared from a blue photosensitive resin composition. The blue photosensitive resin composition includes a pigment combination, an alkali-soluble resin, a compound having an ethylenic group, and a photoinitiator. The pigment combination includes a copper phthalocyanine-based blue pigment. The color filter has a z value ranging from 0.3 to 0.5 in a chromaticity diagram of a XYZ color system. The backlight unit is coupled to the liquid crystal display element and has a color temperature ranging from 8,000 K to 20,000 K.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: September 15, 2015
    Assignee: CHI MEI CORPORATION
    Inventors: Bo-Hsuan Lin, Jung-Pin Hsu, Chung-En Cheng
  • Patent number: 9086532
    Abstract: The invention relates to a blue photosensitive resin composition that has the advantages of good developing-resistance, good ageing stability of sensitivity and good contrast. The invention also provides a method for manufacturing a color filter, a color filter and a liquid crystal display device.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: July 21, 2015
    Assignee: CHI MEI CORPORATION
    Inventor: Jung-Pin Hsu
  • Patent number: 9081142
    Abstract: The invention relates to a blue photosensitive resin composition, and it has the advantage of good developing-resistance, good ageing stability of sensitivity and good contrast. The invention also provides a method for producing a color filter, a color filter and a liquid crystal display device.
    Type: Grant
    Filed: May 19, 2014
    Date of Patent: July 14, 2015
    Assignee: CHI MEI CORPORATION
    Inventors: Jung-Pin Hsu, Duan-Chih Wang
  • Patent number: 9075305
    Abstract: The invention relates to a photosensitive resin composition, and a color filter produced thereby has the advantages of no bubble display and little color difference before and after development. The invention also provides a method for manufacturing a color filter, color filter and liquid crystal display device.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: July 7, 2015
    Assignee: CHI MEI CORPORATION
    Inventor: Jung-Pin Hsu
  • Patent number: 9067813
    Abstract: A forming mold made from a polyporous refractory material is provided for forming a glass piece. The forming mold includes an outer surface and a plurality of forming structures provided on the outer surface. Each of the forming structures includes a forming surface matching with a shape of the glass piece. The forming mold is structured and arranged to be pumped down from the outer surface to generated an absorption force on molten glass material provided at the at least one forming surface for sucking the molten glass material on the forming structure to form the glass piece.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: June 30, 2015
    Assignee: G-TECH Optoelectronics Corporation
    Inventors: Chih-Ming Chung, Jung-Pin Hsu, Tai-Hua Lee, Chao-Hsien Lee