Patents by Inventor Junichi Hidaka

Junichi Hidaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CVD system and CVD process
    Patent number: 6190457
    Abstract: Provided are a CVD system and a CVD process which can grow excellent compound semiconductor thin films of two or more components having least defects and which enjoy high source gas utilization efficiency and increased productivity. According to the CVD system and the CVD process, at least two kinds of source gases are introduced parallel to the surface of a substrate 11 placed in a reactor 10 to grow a compound semiconductor thin film of two or more components on the surface of the substrate 11.
    Type: Grant
    Filed: November 21, 1997
    Date of Patent: February 20, 2001
    Assignee: Nippon Sanso Corporation
    Inventors: Takayuki Arai, Junichi Hidaka, Koh Matsumoto, Nakao Akutsu, Kazuhiro Aoyama, Yoshiaki Inaishi, Ichitaro Waki