Abstract: A semiconductor processing apparatus according to the present embodiment is provided with a stage capable of placing a semiconductor substrate thereon and of rotating the semiconductor substrate. A plurality of holders are provided on the stage, to hold an edge of the semiconductor substrate. A plurality of sensors are provided to the plurality of holders, respectively, to detect the edge of the semiconductor substrate. An elevator mechanism is capable of changing heights of the holders. A controller controls the elevator mechanism to change the heights of the holders so that the plurality of sensors detect the edge of the semiconductor substrate.

Abstract: A semiconductor processing apparatus according to the present embodiment is provided with a stage capable of placing a semiconductor substrate thereon and of rotating the semiconductor substrate. A plurality of holders are provided on the stage, to hold an edge of the semiconductor substrate. A plurality of sensors are provided to the plurality of holders, respectively, to detect the edge of the semiconductor substrate. An elevator mechanism is capable of changing heights of the holders. A controller controls the elevator mechanism to change the heights of the holders so that the plurality of sensors detect the edge of the semiconductor substrate.

Abstract: A substrate processing method according to an embodiment is a substrate processing method for drying a substrate. The substrate processing method includes supplying a solution in which a sublimation material is dissolved in a first solvent to a surface of a cleaned substrate. The substrate processing method includes eliminating at least a portion of association states of the sublimation material. The substrate processing method includes precipitating the sublimation material on the surface of the substrate. The substrate processing method includes removing the precipitated sublimation material by sublimation.

Abstract: A method of manufacturing a semiconductor device including attaching, by a liquid treatment, a first liquid to a surface of a semiconductor substrate having a fine pattern formed therein; substituting the first liquid attached to the surface of the semiconductor substrate with a solution, the solution comprising a sublimate dissolved in a second liquid; vaporizing the second liquid and precipitating the sublimate to the surface of the semiconductor substrate to forma solid precipitate comprising the sublimate; and removing the precipitate by sublimation. For example, the sublimate may be a material having at least two carboxyl groups bonded to cyclohexane or a material formed of two carboxyl groups bonded to benzene with the bonding sites of the two carboxyl groups being adjacent to one another.

Abstract: The substrate treatment apparatus includes a first nozzle, a second nozzle, a detector, and a controller. The first nozzle supplies an organic sublimable material-containing liquid capable of displacing a rinsing liquid, to a surface of a substrate treated with the rinsing liquid. The second nozzle supplies vapor of a solvent in which the organic sublimable material is capable of dissolving, to the surface of the substrate. The detector detects a first physical amount of the vapor on the surface of the substrate. The controller controls a second physical amount of the vapor according to the first physical amount.

Abstract: To provide a hydrogen-containing water product which maintains the oxidation-reduction potential at a low value even when a certain period of time elapses after manufacture. A hydrogen-containing water product for beverage including: a packaging container with a straw having a sealing cap attached to an opening; hydrogen-containing water filled in the container under pressure; and a gas atmosphere that is generated in a space above the hydrogen-containing water in the container by a heat treatment conducted after the filling under pressure and is present even when at least 90 days elapse after generation, wherein the hydrogen-containing water has an oxidation-reduction potential of {[?59×(pH value of hydrogen-containing water in hydrogen-containing water product for beverage after elapse of 90 days)]?170} mV or less when being stored at normal temperature for at least 90 days after manufacture.

Abstract: A method of manufacturing a semiconductor device including attaching, by a liquid treatment, a first liquid to a surface of a semiconductor substrate having a fine pattern formed therein; substituting the first liquid attached to the surface of the semiconductor substrate with a solution, the solution comprising a sublimate dissolved in a second liquid; vaporizing the second liquid and precipitating the sublimate to the surface of the semiconductor substrate to forma solid precipitate comprising the sublimate; and removing the precipitate by sublimation. For example, the sublimate may be a material having at least two carboxyl groups bonded to cyclohexane or a material formed of two carboxyl groups bonded to benzene with the bonding sites of the two carboxyl groups being adjacent to one another.

Abstract: A method of manufacturing a semiconductor device including attaching, by a liquid treatment, a first liquid to a surface of a semiconductor substrate having a fine pattern formed therein; substituting the first liquid attached to the surface of the semiconductor substrate with a solution, the solution comprising a sublimate dissolved in a second liquid; vaporizing the second liquid and precipitating the sublimate to the surface of the semiconductor substrate to form a solid precipitate comprising the sublimate; and removing the precipitate by sublimation. For example, the sublimate may be a material having at least two carboxyl groups bonded to cyclohexane or a material formed of two carboxyl groups bonded to benzene with the bonding sites of the two carboxyl groups being adjacent to one another.

Abstract: A substrate processing method according to an embodiment is a substrate processing method for drying a substrate. The substrate processing method includes supplying a solution in which a sublimation material is dissolved in a first solvent to a surface of a cleaned substrate. The substrate processing method includes eliminating at least a portion of association states of the sublimation material. The substrate processing method includes precipitating the sublimation material on the surface of the substrate. The substrate processing method includes removing the precipitated sublimation material by sublimation.

Abstract: There are provided a method and apparatus for manufacturing hydrogen-containing drinking water that can fill a packaging container with hydrogen-containing water while suppressing the change of the dissolved hydrogen concentration of the hydrogen-containing water to a low level. A method of continuously manufacturing hydrogen-containing drinking water includes (A) a deaeration step, (B) a hydrogen dissolving step, (C) a filling step, and (D) a sealing step. Pressure is applied to water flow channels corresponding to hydrogen-containing water, which is to be injected to a packaging container in the filling step, from purified water that is to be supplied to the deaeration step.

Abstract: A substrate treatment apparatus includes a processing chamber configured to be capable of storing a substrate; a substrate holder disposed in the processing chamber and configured to be capable of holding the substrate; a sublimation removing unit configured to remove, by sublimation, a sublimating material filled between structures formed on a surface of a substrate held by the substrate holder, and a sublimation status detecting unit configured to detect a progress or an end point of sublimation removal of the sublimating material.

Abstract: A process for continuously producing hydrogen-containing water for drinking includes (a) filtering and purifying water as a raw material; (b) degassing the purified water supplied to a degasser; (c) dissolving hydrogen gas in the degassed water supplied to a hydrogen dissolution device; (d) sterilizing the hydrogen-dissolved water supplied to a sterilizer; (e) filling the hydrogen-containing water supplied to a filling device in a sealed container and transferring the filled water product to a heat sterilizer; and (f) heat-sterilizing the water product supplied to the heat sterilizer, wherein part of the hydrogen-containing water obtained in step (d) is returned to the degasser in step (b) and the water is circulated through steps (b) to (d).

Abstract: A hydrogen-containing drink containing a functional ingredient such as tea and hydrogen water, which maintains a high dissolved hydrogen concentration. A hydrogen-containing drink wherein at least one functional ingredient selected from the group consisting of teas; fruits, vegetables, and plants; sugars and sweeteners; polyphenols; vitamins and coenzymes; amino acids and proteins; oxidoreductases; citric acids; and yeast extracts and polydextroses is blended in hydrogen water, the hydrogen-containing drink being prepared by: degassing water as a raw material, dissolving hydrogen gas in the degassed water through a gas-permeable hollow fiber membrane so as to produce hydrogen water, and dissolving or mixing the functional ingredient in the produced hydrogen water, or dissolving or mixing the functional ingredient in water as a raw material, degassing the obtained solution or mixture, and dissolving hydrogen gas in the degassed solution or mixture through a gas-permeable hollow fiber membrane.

Abstract: The substrate treatment apparatus includes a first nozzle, a second nozzle, a detector, and a controller. The first nozzle supplies an organic sublimable material-containing liquid capable of displacing a rinsing liquid, to a surface of a substrate treated with the rinsing liquid. The second nozzle supplies vapor of a solvent in which the organic sublimable material is capable of dissolving, to the surface of the substrate. The detector detects a first physical amount of the vapor on the surface of the substrate. The controller controls a second physical amount of the vapor according to the first physical amount.

Abstract: A substrate treatment apparatus includes a processing chamber configured to be capable of storing a substrate; a substrate holder disposed in the processing chamber and configured to be capable of holding the substrate; a sublimation removing unit configured to remove, by sublimation, a sublimating material filled between structures formed on a surface of a substrate held by the substrate holder, and a sublimation status detecting unit configured to detect a progress or an end point of sublimation removal of the sublimating material.

Abstract: A method of manufacturing a semiconductor device including attaching, by a liquid treatment, a first liquid to a surface of a semiconductor substrate having a fine pattern formed therein; substituting the first liquid attached to the surface of the semiconductor substrate with a solution, the solution comprising a sublimate dissolved in a second liquid; vaporizing the second liquid and precipitating the sublimate to the surface of the semiconductor substrate to form a solid precipitate comprising the sublimate; and removing the precipitate by sublimation. For example, the sublimate may be a material having at least two carboxyl groups bonded to cyclohexane or a material formed of two carboxyl groups bonded to benzene with the bonding sites of the two carboxyl groups being adjacent to one another.

Abstract: A method of processing a substrate is disclosed. The method uses a substrate processing apparatus including a processing tank that retains a processing liquid and that accommodates a workpiece substrate, a recirculation system recirculating the processing liquid into the processing tank by supplying the processing liquid heated by a recirculation system heater from a lower portion of the processing tank and collecting the processing liquid from an upper portion of the processing tank, a plurality of heaters distributed on an upper portion and a lower portion of the processing tank to heat the processing liquid. The method includes setting a first temperature setpoint to a heater located on the upper portion of the processing tank, and setting a second temperature setpoint lower than the first temperature setpoint to a heater located on the lower portion of the processing tank.

Abstract: There is provided a process for producing hydrogen-containing water for drinking, by which the dissolved hydrogen concentration of the obtained hydrogen water can be more efficiently increased.

Abstract: A multi lumen catheter including an inner tube having a front tip, an outer tube, a tube or lumen for inserting a guide wire, a blood extraction lumen and a blood return lumen which are formed in the outer tube and inner tube, respectively, or both in the outer tube, wherein the inner tube is inserted in the outer tube, and allowed to slide relative thereto, and the front tip is jointed to the front end of the outer tube to shut off communication of the lumens with the exterior. A multi-lumen catheter with balloon includes a balloon provided on a tabular body at a front end thereof, a blood return port and a blood extraction port provided in the tubular body on opposite sides of the balloon, and an outer cylinder slidable on the tubular body to close the blood extraction and blood return ports and the balloon.

Abstract: It is determined whether the communication network to which a self terminal is currently connected is a subscribed-to first communication network or a second communication network at a roaming destination. When a communication signal for push delivery transmitted from the content delivery apparatus is received before downloading of the content data, if the communication network to which the self terminal is connected is the first communication network, content data downloaded from the content delivery apparatus is received via the first communication network. If the communication network to which the self terminal is connected is the second communication network, downloading of the content data is limited.