Abstract: According to one embodiment, a lamp device includes a main body, a light-emitting module, a lighting device and a support member. The main body includes an opening and a heat radiating part provided at an opposite side of the opening. The support member is thermally coupled to the light-emitting module and the heat radiating part. The support member holds the light-emitting module in the main body to cause the light-emitting module to be positioned in a direction closer to the opening than the lighting device.

Abstract: According to one embodiment, a lamp device includes a light-emitting module including a semiconductor light-emitting element, a lighting circuit to light the semiconductor light-emitting element, and a housing to house the light-emitting module and the lighting circuit. The housing includes a case including a holder part to hold the light-emitting module, and a cap member fixed to the case by a fixing unit. The light-emitting module is sandwiched and fixed between the holder part and the cap member.

Abstract: A method of high precisely manufacturing, for an electron beam displaying apparatus, a support member which is equipped with an electrode on the surface thereof is provided. In this method, an electrode region is formed on the surface of a base material, the surface of the base material is ground by using a grinding stone having a convex portion, and at the same time a fringe portion of the electrode region is ground to form an electrode.

Abstract: An electron beam emitted from a field-emission electron source array passes through a plurality of through holes formed in a mesh structure and reaches a target. Each of the plurality of through holes in the mesh structure has an opening on a side of the field-emission electron source array and an electron beam passageway that continues from the opening. The mesh structure is formed of a silicon-containing material doped with a N-type or P-type material. In this way, it is possible to suppress a decrease in the amount of the electron beam reaching the target while securing a mechanical strength of an electrode provided with a large number of through holes, and suppress expansion of the electron beam on the target.

Abstract: A method of high precisely manufacturing, for an electron beam displaying apparatus, a support member which is equipped with an electrode on the surface thereof is provided. In this method, an electrode region is formed on the surface of a base material, the surface of the base material is ground by using a grinding stone having a convex portion, and at the same time a fringe portion of the electrode region is ground to form an electrode.

Abstract: An electron beam emitted from a field-emission electron source array passes through a plurality of through holes formed in a mesh structure and reaches a target. Each of the plurality of through holes in the mesh structure has an opening on a side of the field-emission electron source array and an electron beam passageway that continues from the opening. The mesh structure is formed of a silicon-containing material doped with a N-type or P-type material. In this way, it is possible to suppress a decrease in the amount of the electron beam reaching the target while securing a mechanical strength of an electrode provided with a large number of through holes, and suppress expansion of the electron beam on the target.

Abstract: An electron beam emitted from a field-emission electron source array passes through a plurality of through holes formed in a trimming electrode and reaches a target. Each of the plurality of through holes in the trimming electrode has an opening on a side of the field-emission electron source array and an electron beam passageway that continues from the opening. The length of the electron beam passageway is larger than the diameter of the opening. Part of the electron beam that has entered the through holes is absorbed and removed by a lateral wall of the electron beam passageway. In this way, it is possible to provide a high-definition field-emission electron source apparatus in which divergence of an electron beam emitted from a field-emission electron source array is suppressed.

Abstract: A field-emission electron source apparatus includes a vacuum container that receives a field-emission electron source array, a target and an auxiliary electrode, and a getter pump that is disposed in the vacuum container and absorbs and removes excess gas. An electron beam emitted from the field-emission electron source array passes through a plurality of through holes formed in the auxiliary electrode and reaches the target. A space containing the field-emission electron source array and a space containing the target and the getter pump are separated substantially by the auxiliary electrode so that gas generated from the target is absorbed by the getter pump without passing through the space containing the field-emission electron source array. This makes it possible to provide a highly-reliable field-emission electron source apparatus in which the influence of gas and ions on the field-emission electron source array is eliminated or reduced.

Abstract: An electron gun includes an electron beam generating portion for generating electron beams (cathodes K, a G1 electrode and a G2 electrode) and an electron beam focusing portion (a G3 electrode, a G4 electrode, a G5A electrode, a G5B electrode, a G5C electrode and a G6 electrode). The electron beam focusing portion includes a first focus adjusting lens portion for varying a diverging angle of the electron beams likewise in both of a horizontal direction and a vertical direction and a second focus adjusting lens portion capable of making a focus adjustment of the electron beams independently of the first focus adjusting lens portion. Accordingly, it is possible to adjust various kinds of focus states with a single kind of structure of the electron gun.

Abstract: A resistor for an electron gun assembly is configured to apply a voltage, which is divided with a predetermined resistance division ratio, to an electrode provided in the electron gun assembly. The resistor includes an insulating substrate, an electrode element provided in association with each of a plurality of terminal portions on the insulating substrate, a resistor element having a pattern for connecting the electrode elements and obtaining a predetermined resistance value, and an insulating coating layer that covers the resistor element. In at least one terminal portion B, the electrode element is disposed spaced apart from the insulating coating layer, and an intermediate resistor element is disposed between the electrode element and the insulating coating layer. The intermediate resistor element has a resistance value that is different from a resistance value of the electrode element.

Abstract: A resistor for an electron gun assembly is configured to apply a voltage, which is divided with a predetermined resistance division ratio, to an electrode provided in the electron gun assembly. The resistor includes an insulating substrate, an electrode element provided in association with each of a plurality of terminal portions on the insulating substrate, a resistor element having a pattern for connecting the electrode elements and obtaining a predetermined resistance value, and an insulating coating layer that covers the resistor element. In at least one terminal portion B, the electrode element is disposed spaced apart from the insulating coating layer, and an intermediate resistor element is disposed between the electrode element and the insulating coating layer. The intermediate resistor element has a resistance value that is different from a resistance value of the electrode element.

Abstract: A main lens section of an electron gun assembly comprises a fifth grid supplied with a focus voltage, a sixth grid supplied with a dynamic focus voltage, a first intermediate electrode, a second intermediate electrode, and a seventh grid. The main lens section includes an electric field lens acting commonly on the electron beams on a focus region side of the main lens section, which is formed by the fifth grid, sixth grid and first intermediate electrode, and a plurality of electric field lenses acting respectively on the electron beams on a divergence region side of the main lens section, which is formed by the second intermediate electrode and seventh grid.

Abstract: In an electron gun assembly, its main convergence lens is composed of a focus electrode to which a focus voltage is applied, an anode electrode to which a high anode voltage is applied, and an intermediate electrode which is provided between the focus and anode electrodes and to which a high intermediate potential higher than the focus voltage and lower than the anode voltage is applied. The anode and intermediate electrodes are each a cylindrical unit long in the in-line direction. In the direction crossing at right angles with the in-line direction of the cylindrical units, the diameter of the opening in the anode electrode is set smaller than that of the opening in the intermediate electrode, thereby forming a multiple pole lens into a main electron lens of large aperture.

Abstract: A dynamic focus electrode has a vibration-damping portion formed by a beading process at a peripheral portion of an electron beam passage hole thereof, a plate face thereof, or an embedment portion thereof. Thereby, vibration of the dynamic focus electrode is suppressed.

Abstract: A main lens of an electron gun assembly comprises a sixth grid, a seventh grid, an eighth grid, and a ninth grid. An asymmetric lens section is created between a fifth grid and the sixth grid on a cathode side of the main lens. The asymmetric lens section has such asymmetry that lens functions of the asymmetric lens section acting on the electron beams are different between the horizontal direction and the vertical direction, and has a lens power varying in synchronism with the deflection of the electron beams. In this asymmetric lens, the asymmetry for a center beam differs from that for side beams.

Abstract: A main lens is composed of a dynamic focus electrode, a first auxiliary electrode, a second auxiliary electrode and an anode, which are successively arranged in a direction of travel of electron beams. A sub-lens provided on a cathode side of the main lens is composed of a third grid, a fourth grid and a fifth grid. The first auxiliary electrode is connected to the fourth grid, and both are connected to a voltage supply terminal on a resistor near the fourth grid. A fixed focus voltage is applied to the third grid and fifth grid sandwiching the fourth grid.

Abstract: A main lens section of an electron gun assembly includes a focus electrode supplied with a focus voltage of a first level, a dynamic focus electrode supplied with a dynamic focus voltage obtained by superimposing an AC component, which varies in synchronism with deflection magnetic fields, upon a reference voltage close to the first level, and an anode supplied with an anode voltage with a second level higher than the first level. The electron gun assembly further includes at least two auxiliary electrodes disposed between the focus electrode and the dynamic focus electrode, and these at least two auxiliary electrodes are connected via a resistor disposed near the electron gun assembly.

Abstract: In a cathode ray tube apparatus, an electron beam generating section for generating electron beams is composed of a cathode and a plurality of electrodes. Two electrodes of the plurality of electrodes are connected to each other via a resistor. A constant voltage is supplied from the outside of the tube to the one electrode, and a voltage dynamically changed in synchronism with a deflection magnetic field is supplied to an electrode adjacent to the other electrode. Therefore, the shape of a beam spot can be improved, and the resolution of the entire screen can be improved without requiring extensive provision of a lead wire of a stem.

Abstract: A second grid is supplied with a low potential acceleration voltage. A fourth grid and a sixth grid are supplied with a first focus voltage. A third grid and a seventh grid are supplied with a dynamic focus voltage (Vf2+Vd). A prefocus lens having a horizontal and vertical focusing function is formed between the second grid and the third grid. An asymmetrical lens section having a horizontal diverging function and a vertical focusing function is formed between the third grid and the fourth grid. The prefocus lens and the asymmetrical lens section are electrostatically coupled.

Abstract: An electric field expansion type main lens portion is constituted by including a focus electrode to which a focus voltage on a first level is applied, an anode electrode to which an anode voltage on a second level higher than the first level is applied, and two auxiliary electrodes to which a voltage on a third level higher than the first level and lower than the second level is applied and which are arranged between the focus electrode and the anode electrode. An electrode length of each of the two auxiliary electrodes along an electron beam traveling direction is constituted so as to differ in accordance with a difference in potential between electrodes arranged at front and rear positions in the electron beam traveling direction of each auxiliary electrode.