Abstract: Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M1, M2, M3 and M4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R1 is for example hydrogen, C1-C20alkyl or phenyl or naphthyl; R2 and R?2 for example are is hydrogen or C1-C20alkyl; R3, R4, R?3, R?4, R?3 and R?4 for example are hydrogen, halogen, phenyl, or C1-C20alkyl; and R24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2? e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1? i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2? for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: A method of manufacturing a semiconductor device comprises: (a) loading a substrate into a process chamber, wherein the substrate has at least a silicon exposure surface and an exposure surface of silicon oxide film or silicon nitride film on a substrate surface; (b) simultaneously supplying at least a first process gas containing silicon and a second process gas for etching into the process chamber under conditions that the substrate inside the process chamber is heated to a predetermined temperature; and (c) supplying a third process gas having a stronger etchability than the second process gas into the process chamber, wherein the operation (b) and the operation (c) are performed at least one or more times so that an epitaxial film is selectively grown on the silicon exposure surface of the substrate surface

Abstract: In forming a narrow pattern, it is difficult to form a lift-off resist pattern with an overhang shape. Accordingly, it results in a phenomenon in which the angle at the end of the GMR layer is reduced to 45° or less. It is necessary to provide a lift-off resist pattern that forms the end of the GMR film to be at an angle of as abrupt as 45° or more and ensures lift-off.

Abstract: A substrate processing apparatus comprises a process chamber accommodating stacked substrates; a heating unit heating an inside of the process chamber to a predetermined temperature; a gas supply unit supplying predetermined process gas to the inside of the process chamber; and an exhaust unit exhausting the inside of the process chamber. The gas supply unit comprises: a gas supply nozzle having a straight pipe shape and installed in a stacked direction of the substrates; a metal pipe supporting the gas supply nozzle; and a manifold forming a lower part of the process chamber. The metal pipe comprises: a first part extending from an outside of the process chamber to the inside of the processes chamber through the manifold; and a second part connected to the first part and extending in the stacked direction of the substrates. The gas supply nozzle is fitted to and supported by the second part.

Abstract: The invention relates to a color filter composition comprising a) a photoresist binder, b) a transparent pigment, c) optionally a solvent and/or optionally a photoinitiator or a photolatent catalyst, d) a dispersant which is a polymer or copolymer obtainable by a process comprising the steps of a1) polymerizing in a first step one or more ethylenically unsaturated monomers in the presence of at least one nitroxylether having the structural element wherein X represents a group having at least one carbon atom and is such that the free radical X derived from X is capable of initiating polymerization; or a2) polymerizing in a first step one or more ethylenically unsaturated monomers in the presence of at least one stable free nitroxyl radical and a free radical initiator; wherein at least one monomer used in the steps a1) or a2) is a C1-C6 alkyl or hydroxy C1-C6 alkyl ester of acrylic or methacrylic acid; and a second step b) comprising the modification of the polymer or copolymer prepared under a1) or a2) by a t

Abstract: Disclosed are electroluminescent devices that comprise organic layers that contain dibenzofuran compounds. The compounds are suitable components of, for example, blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in, for example, mobile phones, televisions and personal computer screens.

Abstract: A method of drawing and ironing a resin film laminated metal sheet for forming a can body having a bottom portion, a can wall portion and a flange-forming portion by drawing the resin film laminated metal sheet obtained by laminating at least one surface of a metal sheet with an organic resin film, followed by ironing by using a punch and a plurality of dies neighboring each other. The can wall is effectively prevented from being broken by a decrease in the thickness of the can wall, and drawn and ironed cans are efficiently formed having a thickness which is decreased as designed.

Abstract: Compounds of the formula (I), (II), and wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?6, R?7, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: The present invention relates to electroluminescent devices that comprise organic layers that contain triazole compounds of the formula (I), or formula (II). The compounds are suitable components of, for example, blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in, for example, mobile phones, televisions and personal computer screens.

Abstract: A method of drawn and ironed processing of a resin coated metal sheet, in which in the drawn and ironed processing of resin coated metal sheet, there can be obtained a can body of satisfactorily small wall thickness and at an opening edge part of the can body, the coating resin is free from any defect; and a resin coating drawn and ironed processed can produced thereby. There is provided a method of drawn and ironed processing of a resin coated metal sheet, comprising performing drawn and ironed processing of a resin coated metal sheet composed of a metal sheet having at least one major surface thereof coated with an organic resin with the use of a punch and a die into a can body, characterized in that ironing is conducted with the use of a punch having a small-diameter portion at its rear end so that the ratio of ironing at an opening edge part of the can body after shaping falls within the range of 0 to 15%.

Abstract: The present invention relates to compounds of formula (I) a process for their production and to their use for coloring high molecular weight organic materials, as fluorescent tracers, in solid dye lasers, EL lasers, in EL devices and lighting. The compounds of formula I show unique broadband luminescence in visible region.

Abstract: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a.

Abstract: Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: Compounds of the formulae I, II and III wherein R1 is for example hydrogen, C3–C8cycloalkyl, C1–C12alkyl, phenyl unsubstituted or substituted; R2 and R2? for example are hydrogen, C1–C20alkyl, C3–C8cycloalkyl or phenyl, unsubstituted or substituted, or are Ar1 is for example phenyl, optionally substituted by e.g. Ar2 is for example phenylene, optionally substituted e.g. by —(CO)R7, (D), (E) or (F); Ar3 is for example phenyl; M1, M2 and M3 are, for example, C1–C20alkylene; M4 is for example direct bond, —O—, —S—, —Y—(C1–C10alkylene)-Y?—, optionally substituted; Y and Y? are for example a direct bond or —O—; R7 is for example hydrogen, C1–C20alkyl or phenyl, optionally substituted; R8, R9, R8? and R9? are for example hydrogen or C1–C12alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2? e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1? i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2? for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: In forming a narrow pattern, it is difficult to form a lift-off resist pattern with an overhang shape. Accordingly, it results in a phenomenon in which the angle at the end of the GMR layer is reduced to 45° or less. It is necessary to provide a lift-off resist pattern that forms the end of the GMR film to be at an angle of as abrupt as 45° or more and ensures lift-off.

Abstract: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a.

Abstract: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a.

Abstract: Compounds of the formulae I, II and III 1