Patents by Inventor Junji Ishibashi
Junji Ishibashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230077143Abstract: A plasma processing apparatus disclosed herein includes a chamber, a substrate support, an upper electrode, and at least one power supply. The chamber provides a processing space therein. The substrate support is provided in the chamber. The upper electrode configures a shower head that introduces a gas into the processing space from above the processing space. The upper electrode includes a first electrode and a second electrode. The first electrode provides a plurality of first gas holes opened toward the processing space. The second electrode is provided directly or indirectly on the first electrode and provides a plurality of second gas holes communicating with the plurality of first gas holes. The at least one power supply is configured to set a potential of the second electrode to a potential higher than a potential of the first electrode.Type: ApplicationFiled: September 8, 2022Publication date: March 9, 2023Applicant: Tokyo Electron LimitedInventors: Chishio KOSHIMIZU, Junji ISHIBASHI, Fumiaki ARIYOSHI, Sho HAKOZAKI, Fumitoshi KUMAGAI
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Patent number: 11488807Abstract: An apparatus for plasma processing includes a chamber, a lower electrode on which a substrate is placed in the chamber, an edge ring disposed around the lower electrode, an upper electrode facing the lower electrode in the chamber, a member disposed around the upper electrode, a gas supply section configured to supply a process gas to a space between the member and the lower electrode, and a power supply for applying radio frequency power to the lower electrode or the upper electrode to generate a plasma of the process gas. The member includes an inner member and an outer member positioned outside the inner member, and the outer member is disposed outside the edge ring in a radial direction. At least part of the outer member is movable in a vertical direction.Type: GrantFiled: August 28, 2020Date of Patent: November 1, 2022Assignee: Tokyo Electron LimitedInventors: Kota Shihommatsu, Junji Ishibashi, Junichi Sasaki, Hidetoshi Hanaoka
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Publication number: 20210213647Abstract: A powder particle mixture which contains a polybutylene terephthalate resin and a polycarbonate resin, and which is characterized in that: the average particle diameter thereof is more than 1 ?m but 100 ?m or less; the uniformity thereof is 4 or less; the melting point thereof is more than 220° C.; and the difference between the melting point thereof and the crystallization temperature thereof is 60° C. or more. A powder particle composition which is characterized by containing inorganic microparticles that have an average particle diameter of 20-500 nm at a ratio of 0.1-5 parts by weight relative to 100 parts by weight of the powder particle mixture. The present invention efficiently provides a polybutylene terephthalate resin powder which is suitable as a material powder for the production of a three-dimensional shaped product by means of Selective Laser Sintering 3D printer.Type: ApplicationFiled: October 8, 2019Publication date: July 15, 2021Applicant: TORAY INDUSTRIES, INC.Inventors: Kei WATANABE, Kazusada TAKEDA, Junji ISHIBASHI, Hisashi MIYAMA, Mikiya NISHIDA
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Publication number: 20210074520Abstract: An apparatus for plasma processing includes a chamber, a lower electrode on which a substrate is placed in the chamber, an edge ring disposed around the lower electrode, an upper electrode facing the lower electrode in the chamber, a member disposed around the upper electrode, a gas supply section configured to supply a process gas to a space between the member and the lower electrode, and a power supply for applying radio frequency power to the lower electrode or the upper electrode to generate a plasma of the process gas. The member includes an inner member and an outer member positioned outside the inner member, and the outer member is disposed outside the edge ring in a radial direction. At least part of the outer member is movable in a vertical direction.Type: ApplicationFiled: August 28, 2020Publication date: March 11, 2021Inventors: Kota SHIHOMMATSU, Junji ISHIBASHI, Junichi SASAKI, Hidetoshi HANAOKA
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Patent number: 10115567Abstract: A plasma processing apparatus can efficiently perform a pulse modulation method of switching a high frequency power to be used in a plasma process between a high level and a low level alternately according to a duty ratio of a modulation pulse. In this plasma processing apparatus, when performing a high/low pulse modulation on the high frequency power for plasma generation, if a weighted variable K is set to be 0.5<K<1, a constant reflection wave power PRH is generated on a high frequency transmission line of a plasma generation system even during a pulse-on period Ton. Meanwhile, during a pulse-off period Toff, a reflection wave power PRL decreases. By adjusting the value of K, a balance between the reflection wave power PRH during the pulse-on period Ton and the reflection wave power PRL during the pulse-off period Toff can be controlled.Type: GrantFiled: September 14, 2015Date of Patent: October 30, 2018Assignee: TOKYO ELECTRON LIMITEDInventors: Taichi Hirano, Ken Yoshida, Hikoichiro Sasaki, Satoshi Yamada, Yoshinobu Hayakawa, Junji Ishibashi, Fumitoshi Kumagai
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Patent number: 10056230Abstract: A power supply system includes a high frequency power supply which supplies a high frequency power; a DC power supply which supplies a first negative DC voltage or a second negative DC voltage having an absolute value larger than that of the first DC voltage; and a control unit which performs a power supply control process of repeating a supply and a stop of the supply of the high frequency power alternately; stopping supplies of the first and second DC voltages for a first period, which is a time period from a beginning of the supply of the high frequency power within a period during which the high frequency power is being supplied; supplying the first DC voltage for a second period except the first period within the period; and supplying the second DC voltage for a period during which the supply of the high frequency power is stopped.Type: GrantFiled: March 21, 2016Date of Patent: August 21, 2018Assignee: TOKYO ELECTRON LIMITEDInventors: Taichi Hirano, Junji Ishibashi, Keiki Ito, Kunihiro Sato
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Publication number: 20180182635Abstract: A focus ring that surrounds a periphery of a substrate placed on a stage in a processing chamber of a substrate processing apparatus includes a lower surface to contact a peripheral portion of the stage, the lower surface being inclined such that an outer peripheral side becomes lower than an inner peripheral side in a radial direction.Type: ApplicationFiled: December 22, 2017Publication date: June 28, 2018Inventors: Toshiya Tsukahara, Junji Ishibashi, Taketoshi Tomioka, Yasuharu Sasaki, Yohei Uchida
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Patent number: 9567437Abstract: There is provided a production method of a cyclic polyarylene sulfide by heating and reacting a raw material mixture (a) including at least a sulfidizing agent, a dihalogenated aromatic compound and an organic polar solvent. The production method continually performs each of an operation (A) of supplying the raw material mixture (a) to a reaction mixture (b) in a reaction vessel which includes a reaction product obtained from the raw material mixture (a), an operation (B) of withdrawing part of the reaction mixture (b) from the reaction vessel, and an operation (C) of heating the reaction vessel.Type: GrantFiled: December 26, 2013Date of Patent: February 14, 2017Assignee: Toray Industries, Inc.Inventors: Tomoyuki Odashima, Syunsuke Horiuchi, Junji Ishibashi, Naoto Kumagai, Koji Yamauchi
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Publication number: 20160284514Abstract: A power supply system includes a high frequency power supply which supplies a high frequency power; a DC power supply which supplies a first negative DC voltage or a second negative DC voltage having an absolute value larger than that of the first DC voltage; and a control unit which performs a power supply control process of repeating a supply and a stop of the supply of the high frequency power alternately; stopping supplies of the first and second DC voltages for a first period, which is a time period from a beginning of the supply of the high frequency power within a period during which the high frequency power is being supplied; supplying the first DC voltage for a second period except the first period within the period; and supplying the second DC voltage for a period during which the supply of the high frequency power is stopped.Type: ApplicationFiled: March 21, 2016Publication date: September 29, 2016Inventors: Taichi Hirano, Junji Ishibashi, Keiki Ito, Kunihiro Sato
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Publication number: 20160079037Abstract: A plasma processing apparatus can efficiently perform a pulse modulation method of switching a high frequency power to be used in a plasma process between a high level and a low level alternately according to a duty ratio of a modulation pulse. In this plasma processing apparatus, when performing a high/low pulse modulation on the high frequency power for plasma generation, if a weighted variable K is set to be 0.5<K<1, a constant reflection wave power PRH is generated on a high frequency transmission line of a plasma generation system even during a pulse-on period Ton. Meanwhile, during a pulse-off period Toff, a reflection wave power PRL decreases. By adjusting the value of K, a balance between the reflection wave power PRH during the pulse-on period Ton and the reflection wave power PRL during the pulse-off period Toff can be controlled.Type: ApplicationFiled: September 14, 2015Publication date: March 17, 2016Inventors: Taichi Hirano, Ken Yoshida, Hikoichiro Sasaki, Satoshi Yamada, Yoshinobu Hayakawa, Junji Ishibashi, Fumitoshi Kumagai
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Publication number: 20150329677Abstract: There is provided a production method of a cyclic polyarylene sulfide by heating and reacting a raw material mixture (a) including at least a sulfidizing agent, a dihalogenated aromatic compound and an organic polar solvent. The production method continually performs each of an operation (A) of supplying the raw material mixture (a) to a reaction mixture (b) in a reaction vessel which includes a reaction product obtained from the raw material mixture (a), an operation (B) of withdrawing part of the reaction mixture (b) from the reaction vessel, and an operation (C) of heating the reaction vessel.Type: ApplicationFiled: December 26, 2013Publication date: November 19, 2015Applicant: TORAY INDUSTRIES, INC.Inventors: Tomoyuki Odashima, Syunsuke Horiuchi, Junji Ishibashi, Naoto Kumagai, Koji Yamauchi