Abstract: A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.

Abstract: A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.

Abstract: A detection system configured to detect a state of a structure within a processing space of a substrate processing apparatus, includes: a detection substrate including a state detector that detects the state of the structure; a transfer device that loads and unloads each of a substrate to be processed and the detection substrate into and from the processing space; and a control device, wherein the detection substrate further includes at least one acceleration detector that detects an acceleration in each of two directions intersecting each other in a surface of the substrate, and wherein the control device estimates an orientation of the state detector on the detection substrate within the processing space based on a detection result obtained by the at least one acceleration detector when the detection substrate is moved in a loading/unloading direction during loading or unloading of the detection substrate into or from the processing space.

Abstract: An information acquisition system is for acquiring information about a substrate processing apparatus including a substrate holder configured to hold and rotate a substrate, a nozzle configured to supply a processing liquid to a surface of the substrate which is rotating, and a cup surrounding the substrate held by the substrate holder. The information acquisition system includes: an information acquisition body held in place of the substrate by the substrate holder and including an imaging part configured to image the cup and acquire image data; and an acquisition part configured to acquire information about a height of the cup based on the image data.

Abstract: An information acquisition system configured to acquire information upon a substrate processing apparatus configured to process a substrate held by a substrate holder includes a base body, instead of the substrate, held by the substrate holder; and multiple position sensors provided at the base body such that detection directions thereof are different from each other, and each configured to detect a position of a common detection target object located outside the base body.

Abstract: An apparatus transfers a substrate. The apparatus includes: one substrate holder adsorbing and holding the substrate via an adsorption port; a nozzle being provided on a surface of the one substrate holder and allowing gas to pass therethrough; an adsorption flow path being connected to the adsorption port and allowing gas to flow therethrough; and a nozzle flow path being connected to the nozzle and allowing the gas to flow therethrough. The adsorption flow path of at least one of the one substrate holder and another substrate holder and the nozzle flow path are connected to a common gas suction mechanism. A pressure sensor and flow rate sensor are provided for the nozzle flow path. The flow rate of the nozzle flow path is varied according to a distance between an interferer and the one substrate holder and the pressure of the nozzle flow path.

Abstract: A state determination device determines the state of a drive mechanism configured to operate while holding a substrate in a substrate processing apparatus. The state determination part includes: an acquisition part configured to acquire operation data for the drive mechanism; a model generation part configured to generate a monitoring model for the drive mechanism by executing machine learning using an auto-encoder based on normal operation data that is derived from the operation data acquired by the acquisition part when the drive mechanism is operating normally; and a first determination part configured to determine the state of the drive mechanism based on first output data obtained by inputting, to the monitoring model, evaluation data that is derived from the operation data acquired by the acquisition part when the drive mechanism is being evaluated.

Abstract: A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.

Abstract: A heat treatment apparatus of heating a substrate mounted on a mounting plate heated by a heating part includes: plural types of physical quantity detecting parts for detecting plural types of physical quantities, respectively; a state estimating part for estimating an occurrence probability occurring for each of abnormality modes by a neural network, and including an input layer to which a group of time-series detection values obtained for each of physical quantity detection values detected respectively by the physical quantity detecting parts is inputted; and a selecting part for selecting one of correspondence processes based on the occurrence probability of each of the abnormality modes estimated by the state estimating part. One of the physical quantity detection values is a temperature detection value detected by a temperature physical quantity detecting part for detecting a temperature of the mounting plate among the physical quantity detecting parts.

Abstract: A heat treatment apparatus of heating a substrate mounted on a mounting plate heated by a heating part includes: plural types of physical quantity detecting parts for detecting plural types of physical quantities, respectively; a state estimating part for estimating an occurrence probability occurring for each of abnormality modes by a neural network, and including an input layer to which a group of time-series detection values obtained for each of physical quantity detection values detected respectively by the physical quantity detecting parts is inputted; and a selecting part for selecting one of correspondence processes based on the occurrence probability of each of the abnormality modes estimated by the state estimating part. One of the physical quantity detection values is a temperature detection value detected by a temperature physical quantity detecting part for detecting a temperature of the mounting plate among the physical quantity detecting parts.

Abstract: Disclosed is an inspection device for inspecting deformation of a substrate holding member of a substrate transport apparatus. The substrate holding member is moved in the forward-and-backward direction relative to the transport base to pass across a light path of the detection light formed by an optical detection unit. The position, with respect to a direction transverse to the forward-and-backward direction, of the substrate holding member is detected based on a detection signal of the optical detection unit. Based on a correlation data expressing the relationship between a first parameter indicative of a change of a position of the substrate holding member with respect to the forward-and-backward direction and a second parameter indicative of the change of the position of the substrate holding member with respect to the direction transverse to the forward-and-backward direction, whether or not deformation occurs in the substrate holding member is judged.

Abstract: A transfer apparatus for mounting and transferring a transferred component on a driven means, the transfer apparatus includes: a driving means for rotating a driving side pulley by a rotational driving force of a motor to move a belt wound around the driving side pulley, thereby moving the driven means coupled to the belt in a predetermined direction; and a transfer monitoring means for monitoring a transfer state of the driven means, wherein the transfer monitoring means detects a torque value of the motor required to move the driven means, calculates a torque differential value of the torque value with respect to time based on the detected torque value, and detects the transfer state using the calculated torque differential value.

Abstract: Disclosed is an inspection device for inspecting deformation of a substrate holding -member of a substrate transport apparatus. The substrate holding member is moved in the forward-and-backward direction relative to the transport base to pass across a light path of the detection light formed by an optical detection unit. The position, with respect to a direction transverse to the forward-and-backward direction, of the substrate holding member is detected based on a detection signal of the optical detection unit. Based on a correlation data expressing the relationship between a first parameter indicative of a change of a position of the substrate holding member with respect to the forward-and-backward direction and a second parameter indicative of the change of the position of the substrate holding member with respect to the direction transverse to the forward-and-backward direction, whether or not deformation occurs in the substrate holding member is judged.