Patents by Inventor Junzo Ishikawa
Junzo Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8461548Abstract: To improve an efficiency of utilizing electrons and efficiently suppress an ion beam spread by a space charge effect while eliminating a need for a special magnetic pole structure by effectively using a space in the vicinity of a magnet, there are provided an ion source, a collimating magnet and a plurality of electron sources, wherein the electron sources are arranged in a magnetic field gradient region formed on an ion beam upstream side or ion beam downstream side of the collimating magnet and arranged outside a region passed by the ion beam, and an irradiation direction of the electrons is directed to supply the electrons to the magnetic field gradient region.Type: GrantFiled: April 27, 2010Date of Patent: June 11, 2013Assignees: Nissin ION Equipment Co., Ltd., Kyoto UniversityInventors: Dan Nicolaescu, Shigeki Sakai, Junzo Ishikawa, Yasuhito Gotoh
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Publication number: 20120085918Abstract: To improve an efficiency of utilizing electrons and efficiently suppress an ion beam spread by a space charge effect while eliminating a need for a special magnetic pole structure by effectively using a space in the vicinity of a magnet, there are provided an ion source, a collimating magnet and a plurality of electron sources, wherein the electron sources are arranged in a magnetic field gradient region formed on an ion beam upstream side or ion beam downstream side of the collimating magnet and arranged outside a region passed by the ion beam, and an irradiation direction of the electrons is directed to supply the electrons to the magnetic field gradient region.Type: ApplicationFiled: April 27, 2010Publication date: April 12, 2012Applicants: KYOTO UNIVERSITY, NISSIN ION EQUIPMENT CO., LTD.Inventors: Dan Nicolaescu, Shigeki Sakai, Junzo Ishikawa, Yasuhito Gotoh
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Patent number: 7935944Abstract: An ion beam irradiating apparatus has a field emission electron source 10 which is disposed in a vicinity of a path of the ion beam 2, and which emits electrons 12. The field emission electron source 10 is placed in a direction along which an incident angle formed by the electrons 12 emitted from the electron source 10 and a direction parallel to the traveling direction of the ion beam 2 is in the range from ?15 deg. to +45 deg. (an inward direction of the ion beam 2 is +, and an outward direction is ?).Type: GrantFiled: June 12, 2007Date of Patent: May 3, 2011Assignees: Kyoto University, Nissin Ion Equipment Co., Ltd.Inventors: Junzo Ishikawa, Dan Nicolaescu, Yasuhito Gotoh, Shigeki Sakai
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Publication number: 20090203199Abstract: An ion beam irradiating apparatus has a field emission electron source 10 which is disposed in a vicinity of a path of the ion beam 2, and which emits electrons 12. The field emission electron source 10 is placed in a direction along which an incident angle formed by the electrons 12 emitted from the electron source 10 and a direction parallel to the traveling direction of the ion beam 2 is in the range from ?15 deg. to +45 deg. (an inward direction of the ion beam 2 is +, and an outward direction is ?).Type: ApplicationFiled: June 12, 2007Publication date: August 13, 2009Applicants: KYOTO UNIVERSITY, NISSIN ION EQUIPMENT CO., LTD.Inventors: Junzo Ishikawa, Dan Nicolaescu, Yasuhito Gotoh, Shigeki Sakai
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Patent number: 6861790Abstract: An electric element is formed of a deposited film containing cesium (Cs) and has a plurality of conical projections on its surface. The projections are formed of cesium oxide and have an average height h in a range of 10 nm?h?500 nm. The electronic element is used as a cold cathode element, and has a high practicality, and for example, emits electrons sufficiently even with a low voltage applied thereto.Type: GrantFiled: March 30, 2000Date of Patent: March 1, 2005Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Takashi Iwasa, Junzo Ishikawa
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Patent number: 6414422Abstract: To provide a cold cathode element, which has a high practicability and is capable of emitting electrons sufficiently even at a low voltage applied. The cold cathode element emits electrons by application of an electric field to the element and is formed of an amorphous carbon film, the refractive index n of a surface of the film being equal to or larger than 2.5.Type: GrantFiled: February 28, 2001Date of Patent: July 2, 2002Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Takashi Iwasa, Junzo Ishikawa
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Publication number: 20020033674Abstract: To provide a cold cathode element, which has a high practicability and is capable of emitting electrons sufficiently even at a low voltage applied. The cold cathode element emits electrons by application of an electric field to the element and is formed of an amorphous carbon film, the refractive index n of a surface of the film being equal to or larger than 2.5.Type: ApplicationFiled: February 28, 2001Publication date: March 21, 2002Inventors: Takashi Iwasa, Junzo Ishikawa
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Patent number: 6268686Abstract: A cold cathode element for emitting an electron on application of an electric field. The element includes a diamond carbon film having a half width Hw of a photoelectron spectrum of a C1S electron using an X-ray photoelectron spectroscopy, of 1.72 eV or more. The cold cathode element has the function of sufficiently emitting electrons even by applying a low voltage, and thus the element has high practical utility.Type: GrantFiled: January 27, 1999Date of Patent: July 31, 2001Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Takashi Iwasa, Junzo Ishikawa
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Patent number: 5901398Abstract: According to a conventional continuous car washing machine in which one of the right and left side brushes is stationary, a roller conveyor which transports a vehicle to be washed is provided with wheel guides to maintain a spacing between a lateral surface of the vehicle and one side brush at a given value. Thus, there has been a problem that it is difficult to drive the vehicle to move itself onto the required position on the roller conveyor. The present invention which is intended to solve the problem provides a car washing machine comprising a stationary car washing machine body in which a pair of side brushes (8a, 8b) are disposed to be retractable in the transverse direction at a right angle with the direction of transport of a vehicle in order for washing at least the lateral surfaces of the vehicle (2), and a conveyor device (3) for transporting the vehicle (2) which is free of wheel guides and has a sufficient width to accommodate a plurality of different car widths.Type: GrantFiled: January 24, 1997Date of Patent: May 11, 1999Assignee: Daifuku Co., Ltd.Inventors: Junzo Ishikawa, Akira Ikari, Masamoto Ueda, Mitsuru Nishimura, Katsuya Kitanaka
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Patent number: 5107170Abstract: An ion source having an auxiliary plasma chamber and a main plasma chamber. The auxiliary plasma chamber receives an ionizable gas and is provided with microwaves with sufficient power to create a high frequency discharge and generate a subplasma for sustaining the creation of an ion plasma in the main chamber. Multiple auxiliary plasma chambers may be used and each may be separately regulated. Protective plates, screens, and coatings may be provided to protect the ion plasma of the main chamber from sputtering a facing wall of the auxiliary plasma chamber.Type: GrantFiled: October 17, 1989Date of Patent: April 21, 1992Assignee: Nissin Electric Co., Ltd.Inventors: Junzo Ishikawa, Yoshio Matsubara, Hideaki Takara, Shuichi Nogawa, Toshiaki Sasai
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Patent number: 4774413Abstract: An ion emmisive head for fusing a metal to emit ion beam is disclosed, wherein a fused metal is designed to infiltrate through a porous portion for flow control and to reach an extremely sharpened needle which is provided after infiltration and wherefrom the fused metal is converted to ion beam by electrical action. Thus, ionized metallic beam is rendered to have smaller width or more focused ray. Submicron technology used in the IC industry, for instance, desires far thinner, finer beam line to attain more compact circuits, which need will be responded in the present invention by disposing a tipping needle to extend out of a porous tip portion which receives the fused metal from melting zone. Appropriate combination of sharpness at the needle point and provision of a beam guiding electrode in neighborhood of an emitting needle point enable to produce about 0.1 micron beam width by prevention of plasma ball which will otherwise diffuse the emitted beam.Type: GrantFiled: October 16, 1986Date of Patent: September 27, 1988Assignees: Nihon Denshizairyo Kabushiki Kaisha, Toshinori Takagi, Junzo IshikawaInventors: Masao Okubo, Kiyoshi Sugaya, Toshinori Takagi, Junzo Ishikawa
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Patent number: 4638217Abstract: An ion source having a sintered metal head for ionizing various substances is disclosed. This ion source comprises a container made of a material which has a higher fusing point than that of the substance which is to be ionized, and a tip formed of a molded sintered metal of a higher fusing point than that of the substance which is to be ionized. The head is formed into a nearly conical shape and has a porosity capable of allowing the substance which is to be ionized to infiltrate therethrough in the molten state and the tip of the head is positioned at the opening of one end of the container for the ionizable material and arranged in such a manner that it protrudes beyond the end of the container.Type: GrantFiled: March 18, 1983Date of Patent: January 20, 1987Assignee: Nihon Denshizairyo Kabushiki KaishaInventors: Masao Okubo, Kiyoshi Sugaya, Toshinori Takagi, Junzo Ishikawa
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Patent number: 4598231Abstract: A microwave ion source comprising a discharge chamber provided with an ion source seed material inlet and an ion outlet, a means for radiating microwaves in said discharge chamber, a means for applying a magnetic filed to the inside of said discharge chamber, a means for supplying ion source seed material to said discharge chamber through said ion source seed material inlet and an ion extraction electrode, said ion extraction electrode being made of magnetic material having a resistivity of less than 10.sup.6 .OMEGA.cm and a permeability of more than 5. The present microwave ion source has an improved ion current efficiency.Type: GrantFiled: February 1, 1983Date of Patent: July 1, 1986Assignee: Nissin-High Voltage Co. Ltd.Inventors: Koji Matsuda, Toshinori Takagi, Junzo Ishikawa
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Patent number: 4563610Abstract: A negative-ion source comprising means for discharging alkaline metal for discharging neutral alkaline metal particles together with alkaline metal ion particles; an electrode for generating negative ions which can serve as an extraction electrode for extracting said alkaline metal ion particles and a target bombarded with said alkaline metal ion particles and which provides with a hold for holding negative-ion seed material in the portion bombarded with said alkaline metal ion particles and an aperture for letting out negative-ion particles; and a negative-ion extraction electrode for said negative-ion particles. The present negative-ion source has an improved ion current efficiency and is compact size.Type: GrantFiled: March 23, 1983Date of Patent: January 7, 1986Assignee: Nissin-High Voltage Co., Ltd.Inventors: Toshinori Takagi, Junzo Ishikawa, Koji Matsuda