Abstract: According to a first aspect of the invention, there is provided a method of processing a printing body, the printing body comprising a substrate and a diamond-like carbon (DLC) layer on the substrate, the method comprising engraving a printing pattern into the DLC layer. This method is advantageous, as it reduces the number of process steps required in processing the printing body, and reduces the loss of fine detail in the printing pattern.

Abstract: The invention relates inter alia to a device (10) for producing an atmospheric pressure plasma (20, 20a, 20b, 20c, 20d), especially for treating a substrate, said device comprising a unit (11, 11a, 11b, 11c) produced from a piezoelectric material. Said unit has at least one primary region (12, 12a, 12b, 12c) in which at least two electrodes (17a, 17b, 17c) for applying a low AC voltage are arranged, and a secondary region (13), along the longitudinal direction (L) of which potential differences are produced when the primary region is incited. The invention is inter alia characterized in that the secondary region (13) comprises two partial regions (14, 14a, 14b, 14c, 15, 15a, 15b, 15c) that have an opposite polarity along the longitudinal direction (L).

Abstract: The invention relates to a device (10) for treating goods (14) with the aid of an electric discharge in a receiving chamber (13) for the goods, which is defined by a wall (11, 11a, 11b, 12a, 12b, 12c, 12d, 12e) made of a dielectric material having at least two electrodes (16a, 16b) arranged on the outer side thereof (15). The invention is characterised in that at least one counter-electrode (21) is coupled in a capacitive manner to both of the outer electrodes on the inner side (20) of the wall (11).

Abstract: A low-pressure high-density plasma is excited in a plasma chamber surrounded by a cylindrical inner wall of a ring-shaped waveguide resonator to which the microwave energy is fed by a coupling from a microwave generator. The output coupling of the microwave energy from the standing wave maintained in the waveguide resonator to the plasma chamber is effected through a multiplicity of equispaced slits whose spacing is one half or one waveguide wavelength and which extend parallel to the generatrices of the cylindrical inner wall of the ring-shaped waveguide resonator.

Abstract: A grid assembly for ion beam sources includes grid structures that are etched from a semiconductor wafer using microelectronic fabrication techniques with the grid structures constrained in an aligned manner by a ceramic carrier having embedded electrically conductive pads for effecting electrical contact with the grid structures. The grid structures are fabricated by creating oxide and photoresist layers on a starting silicon wafer and exposing the photoresist through a mask carrying the aperture pattern. After the photoresist is developed, the oxide layer is etched to form openings therethrough and the silicon wafer is anisotropically etched from both sides with the etching proceeding anisotropically so that the {111} planes are etched to form the apertures in which the {111} planes face each other across the aperture with opposite {111} planes at a 90.degree. angle relative to one another to provide a plurality of apertures each defining a volume in the form of an inverted truncated 4-sided pyramid.

Abstract: The invention relates to a device for the generation of electrically charged and/or uncharged particles in which into a cavity resonator (5) filled with a gas or gas mixture electromagnetic energy is introduced and in which a first magnetic field (19, 20) permeates the gas or gas mixture. With the aid of a second magnetic field (H.sub.ext, 40, 41) permeating the gyromagnetic material the cavity resonator (5) is tuned. Usually, the tuning is carried out in such a manner that a hollow space resonator (5) which is loaded and mistuned by the plasma is again brought into resonance.

Abstract: Process for producing extraction grids for ion sources. A mounting plate (1) of a thermostable material is provided on both sides with a continuous metal coating (2, 3). An essentially congruent pattern of holes is produced in the mounting plate (1) and in the metal coatings (2, 3). In such an extraction system, the metal coatings, electrically separated on either side, form extraction grids or electrodes. By disposing a core region (1a) of a conducting or semiconducting material in the mounting plate (1), a third electrode can be produced for controlling the ion beam.