Patents by Inventor Juri Barthel

Juri Barthel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9076630
    Abstract: An electron microscope and a method for measuring the defocus spread or the limiting resolution of an electron microscope takes advantage of the fact that, in the case of tilted illumination, any aberration that may be present and the defocus spread of the electron microscope anisotropically change the intensity distribution in the diffractogram. In particular, the envelope of the diffractogram is anisotropically narrowed. If both the tilt of the electron beam and any aberration that may be present are known, and the focus distribution is assumed to be Gaussian-shaped, the defocus spread of the electron microscope is the only parameter still unknown that influences the anisotropic changes in intensity distribution. Quantitative conclusions as to the defocus spread can thus be drawn from the changes. However, the focus distribution can also be determined from the anisotropic narrowing without the use of a model, and without a priori assumptions about the shape thereof.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: July 7, 2015
    Assignee: Forschungszentrum Juelich GmbH
    Inventors: Andreas Thust, Juri Barthel
  • Patent number: 8351710
    Abstract: Disclosed is a method for measuring the similarity of two-dimensional images, at least one image exhibiting an additional signal, the location dependence or symmetry properties of which are known at least approximately. The images are partitioned into mutually identical subimages such that the extension of at least one subimage in the direction of the gradient of the additional signal is smaller than the extension of this subimage in the direction perpendicular thereto. The subimages are compared separately, and the results of all comparisons are combined to form the measurement result for similarity. As a result, the method becomes insensitive to variations in the additional signal. The method is particularly suited for the determination of defocusing and astigmatism of an electron-microscopic image. For this purpose, it is important to compare the similarity of an experimentally measured image to simulated images, which were generated using defined defocusing and astigmatism values.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: January 8, 2013
    Assignee: Forschungszentrum Juelich GmbH
    Inventors: Andreas Thust, Juri Barthel
  • Publication number: 20100032565
    Abstract: An electron microscope and a method for measuring the defocus spread or the limiting resolution of an electron microscope takes advantage of the fact that, in the case of tilted illumination, any aberration that may be present and the defocus spread of the electron microscope anisotropically change the intensity distribution in the diffractogram. In particular, the envelope of the diffractogram is anisotropically narrowed. If both the tilt of the electron beam and any aberration that may be present are known, and the focus distribution is assumed to be Gaussian-shaped, the defocus spread of the electron microscope is the only parameter still unknown that influences the anisotropic changes in intensity distribution. Quantitative conclusions as to the defocus spread can thus be drawn from the changes. However, the focus distribution can also be determined from the anisotropic narrowing without the use of a model, and without a priori assumptions about the shape thereof.
    Type: Application
    Filed: December 13, 2007
    Publication date: February 11, 2010
    Inventors: Andreas Thust, Juri Barthel
  • Publication number: 20090268969
    Abstract: Disclosed is a method for measuring the similarity of two-dimensional images, at least one image exhibiting an additional signal, the location dependence or symmetry properties of which are known at least approximately. The images are partitioned into mutually identical subimages such that the extension of at least one subimage in the direction of the gradient of the additional signal is smaller than the extension of this subimage in the direction perpendicular thereto. The subimages are compared separately, and the results of all comparisons are combined to form the measurement result for similarity. As a result, the method becomes insensitive to variations in the additional signal. The method is particularly suited for the determination of defocusing and astigmatism of an electron-microscopic image. For this purpose, it is important to compare the similarity of an experimentally measured image to simulated images, which were generated using defined defocusing and astigmatism values.
    Type: Application
    Filed: July 25, 2007
    Publication date: October 29, 2009
    Applicant: Forschungszentrum Juelich GmbH
    Inventors: Andreas Thust, Juri Barthel