Abstract: Systems and methods for encapsulation of chemically amplified resist template for low pH electroplating are disclosed. In a first method embodiment, a resist template structure is formed on a wafer. Substantially all surfaces of the resist template structure are encapsulated to form an encapsulated structure. Magnetic materials are plated onto the encapsulated structure.

Abstract: A method for forming a P3 layer with NiFe and alumina mask using resist shrink process for use in perpendicular magnetic write heads. The method includes forming a laminated layer, forming an alumina layer on top of the laminated layer, depositing a conductive layer onto the laminated layer, forming a plating frame on a gap layer. The plating frame has a trench defined by plating track, the alumina, laminated and conductive layers each including an area below the trench. The method further includes shrinking the trench, plating NiFe into a portion of the shrunk trench, stripping the plating frame, removing the conductive layer except the conductive layer formed below the trench, removing the alumina layer except the alumina layer formed below the trench, removing the laminated layer except the laminated layer formed below the trench and patterning the laminated layer formed below the trench.

Abstract: A magnetic head includes a magnetic write structure having a first magnetic layer having a first pole, a second magnetic layer having a second pole spaced apart from the first pole, and a third magnetic layer having a third pole contacting the second pole. The third pole has a third-pole width greater than a second-pole width. An inductive coil positioned adjacent to the third magnetic layer controllably magnetizes the third magnetic layer. The third magnetic layer is nonuniformly thick such that a thickness of the third pole is less than a thickness of the third magnetic layer at locations in registry with the inductive coil. The magnetic write structure is conveniently fabricated by depositing the magnetic layers and the inductive coil, masking the third magnetic layer other than the third pole, and removing a portion of the thickness of the third pole.

Abstract: A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.

Abstract: A method is disclosed for independently controlling track width and bevel angle of a write pole tip having a P3 pole tip for perpendicular recording. The method includes establishing the track width in a portion of the P3 layer material. A portion of this portion having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion having a bevel angle. The protected portion produces a rectangular portion which together with the beveled portion produce a hexagonal pole tip. Also disclosed is a magnetic head having a hexagonal pole tip, and a disk drive having a magnetic head having a hexagonal pole tip.

Abstract: One preferred method for use in making a magnetic write head with use of the resist channel shrinking solution includes the steps of forming a first pole piece layer of a first pole piece; forming a gap layer over the first pole piece layer; forming a patterned resist over the first pole piece layer and the gap layer; electroplating a first pedestal portion of a second pole piece over the gap layer within a channel of the patterned resist; forming an oxide layer over the first pedestal portion; applying the resist channel shrinking solution comprising the resist channel shrinking film and the corrosion inhibitors over the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel; removing the resist channel shrinking solution; electroplating a second pedestal portion of the second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the structure.

Abstract: In the formation of the top magnetic write pole in a thin film magnetic recording head, a CMP stop layer comprising rhodium is deposited over the Al2O3 layer that overlies the top magnetic pole. A mixture of silicon dioxide, ammonium persulfate and benzotriazole is employed as a slurry in the CMP process that removes the portion of the Al2O3 layer covering the top magnetic pole. This eliminates the need for an extra thick layer of Al2O3 to be first deposited over the top pole and then removed to expose the top pole. The magnetic layer that forms the top pole can be plated to the target thickness of the top pole. As a result, the thickness of the photoresist layer that is used to define the size and shape of the top pole can be decreased to a desirable thickness, facilitating the use of DUV radiation to expose the photoresist layer.

Abstract: Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.

Abstract: A method for forming a read transducer by ion milling and chemical mechanical polishing to eliminate nonuniformity near the MR sensor is disclosed. The resist mask is eliminated in the read transducer formation process so that the thickness of the layers near the read transducer has a uniform thickness.

Abstract: A method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes.

Abstract: A magnetic head having an improved fringing field and overwrite capability, and a method of making the same, are described.

Abstract: Two trim/notch milling steps are used to refine the track width that is defined by the second pole piece tip of a write head. The second milling step uses feedback gained after the first milling step to refine the P2B (pole P2 bottom width) dimension. A final milling step may be conducted after receiving feedback from the result of the second trim/notch milling step.

Abstract: A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.

Abstract: A method for forming a read transducer by ion milling and chemical mechanical polishing to eliminate nonuniformity near the MR sensor is disclosed. The resist mask is eliminated in the read transducer formation process so that the thickness of the layers near the read transducer has a uniform thickness.

Abstract: A method for fabrication of magnetic write heads for disk drives in which a P1 layer is formed having a P1 Protrusion, the P1 Protrusion having a longitudinal reference axis. A gap layer is deposited on the P1 Protrusion and a layer of fill material is deposited on the gap layer. The fill material layer is shaped to form a mold which surrounds a hollow which is aligned with the longitudinal axis of the P1 Protrusion. This hollow in the fill material layer is filled with P2 pole material to form a P2 pole which is then automatically substantially aligned with the longitudinal axis of the P1 Protrusion.

Abstract: A magnetic head includes a magnetic write structure having a first magnetic layer having a first pole, a second magnetic layer having a second pole spaced apart from the first pole, and a third magnetic layer having a third pole contacting the second pole. The third pole has a third-pole width greater than a second-pole width. An inductive coil positioned adjacent to the third magnetic layer controllably magnetizes the third magnetic layer. The third magnetic layer is nonuniformly thick such that a thickness of the third pole is less than a thickness of the third magnetic layer at locations in registry with the inductive coil. The magnetic write structure is conveniently fabricated by depositing the magnetic layers and the inductive coil, masking the third magnetic layer other than the third pole, and removing a portion of the thickness of the third pole.