Patents by Inventor Jyoti Malhotra

Jyoti Malhotra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Routing system and method using a routing tree rip-up
    Patent number: 8291366
    Abstract: A routing system is improved by performing three steps sequentially to complete an execution process. The first step estimates a normalized criticality score for each design net. The second step arranges the scores for each design net in descending order. Third step rips up and reroutes the design so as to make it more feasible.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: October 16, 2012
    Assignee: STMicroelectronics PVT Ltd
    Inventors: Himanshu Srivastava, Jyoti Malhotra
  • Routing system
    Patent number: 8239808
    Abstract: A process for shortest path routing in computer-aided designs (CAD) is performed using an incremental graph traversal technique. This technique searches the shortest path routing trees in a graph by path exploration limited only to an incremented search region thereby reducing run time complexity. Graph traversal begins in the incremented search region, and propagates successive changes thereafter.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: August 7, 2012
    Assignee: STMicroelectronics International N.V.
    Inventors: Himanshu Srivastava, Jyoti Malhotra
  • ROUTING SYSTEM
    Publication number: 20100146473
    Abstract: A process for shortest path routing in computer-aided designs (CAD) is performed using an incremental graph traversal technique. This technique searches the shortest path routing trees in a graph by path exploration limited only to an incremented search region thereby reducing run time complexity. Graph traversal begins in the incremented search region, and propagates successive changes thereafter.
    Type: Application
    Filed: December 3, 2009
    Publication date: June 10, 2010
    Applicant: STMicroelectronics Pvt. Ltd.
    Inventors: Himanshu Srivastava, Jyoti Malhotra
  • ROUTING SYSTEM
    Publication number: 20100146472
    Abstract: A routing system is improved by performing three steps sequentially to complete an execution process. The first step estimates a normalized criticality score for each design net. The second step arranges the scores for each design net in descending order. Third step rips up and reroutes the design so as to make it more feasible.
    Type: Application
    Filed: December 3, 2009
    Publication date: June 10, 2010
    Applicant: STMicroelectronics Pvt. Ltd.
    Inventors: Himanshu Srivastava, Jyoti Malhotra
  • Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride
    Patent number: 7709178
    Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and preferably phenolic-containing monomers). The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
    Type: Grant
    Filed: April 17, 2007
    Date of Patent: May 4, 2010
    Assignee: Brewer Science Inc.
    Inventors: Xing-Fu Zhong, Tony D. Flaim, Jyoti Malhotra
  • ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE
    Publication number: 20080261145
    Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and preferably phenolic-containing monomers). The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
    Type: Application
    Filed: April 17, 2007
    Publication date: October 23, 2008
    Inventors: Xing-Fu Zhong, Tony D. Flaim, Jyoti Malhotra
  • NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE
    Publication number: 20070075309
    Abstract: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes copolymers prepared from styrene, acrylonitrile, and epoxy-containing monomers. The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
    Type: Application
    Filed: September 6, 2006
    Publication date: April 5, 2007
    Inventors: Xing-Fu Zhong, Jyoti Malhotra, Chenghong Li