Patents by Inventor Kahp-Yang Suh

Kahp-Yang Suh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9927311
    Abstract: A high-sensitivity sensor containing cracks is provided. The high-sensitivity sensor is obtained by forming microcracks on a conductive thin film, which is formed on top of a support, wherein the microcracks form a micro joining structure in which the microcracks are electrically changed, short-circuited or open, thereby converting external stimuli into electric signals by generating a change in a resistance value. The high-sensitivity sensor can be useful in a displacement sensor, a pressure sensor, a vibration sensor, artificial skin, a voice recognition system, and the like.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: March 27, 2018
    Assignees: Global Frontier Center-Multiscale Energy Systems, SNU R&DB Foundation, Research & Business Foundation Sungkyunkwan Univ.
    Inventors: Daeshik Kang, Yong Whan Choi, Chanseok Lee, Kahp-Yang Suh, Tae-il Kim, Man Soo Choi
  • Publication number: 20160123820
    Abstract: A high-sensitivity sensor containing cracks is provided. The high-sensitivity sensor is obtained by forming microcracks on a conductive thin film, which is formed on top of a support, wherein the microcracks form a micro joining structure in which the microcracks are electrically changed, short-circuited or open, thereby converting external stimuli into electric signals by generating a change in a resistance value. The high-sensitivity sensor can be useful in a displacement sensor, a pressure sensor, a vibration sensor, artificial skin, a voice recognition system, and the like.
    Type: Application
    Filed: December 3, 2014
    Publication date: May 5, 2016
    Inventors: Daeshik KANG, Yong Whan CHOI, Chanseok LEE, Kahp-Yang SUH, Tae-il KIM, Man Soo CHOI
  • Publication number: 20150162619
    Abstract: The present invention relates to an electrode catalyst, a method for preparing the electrode catalyst, and a membrane electrode assembly and a fuel cell including the electrode catalyst. The electrode catalyst includes a carbon support and a platinum catalyst supported on the carbon support. A thermally responsive polymer is selectively bound to the carbon support. The electrode catalyst can ensure smooth discharge of water produced as a result of an electrochemical reaction, achieving improved electrical performance of the fuel cell.
    Type: Application
    Filed: October 24, 2013
    Publication date: June 11, 2015
    Inventors: Sang Moon Kim, Namgee Jung, Kahp-Yang Suh, Yung-Eun Sung, Man Soo Choi
  • Patent number: 8721905
    Abstract: A method for forming a minute pattern mask includes forming an etching target layer on a substrate. A convex pattern including a plurality of convex parts is formed on the etching target layer. A resin composition is coated on the convex pattern to form a resin layer including a first region neighboring the convex part and a second region positioned between the neighboring convex parts. The resin layer is ashed or etched to form the plurality of first resin patterns. The plurality of first resin patterns is processed to form a minute pattern mask including a plurality of second resin patterns. The etching target layer is etched using the plurality of second resin patterns as an etch mask to form a minute pattern.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: May 13, 2014
    Assignees: Samsung Display Co., Ltd., SNU R & DB Fountdation
    Inventors: Se-Hwan Yu, Ji Seon Lee, Yoon Ho Khang, Kahp Yang Suh, Hyoung Sick Um, Jae Jun Chae, Sung Hun Lee
  • Publication number: 20130098869
    Abstract: A method for forming a minute pattern mask includes forming an etching target layer on a substrate. A convex pattern including a plurality of convex parts is formed on the etching target layer. A resin composition is coated on the convex pattern to form a resin layer including a first region neighboring the convex part and a second region positioned between the neighboring convex parts. The resin layer is ashed or etched to form the plurality of first resin patterns. The plurality of first resin patterns is processed to form a minute pattern mask including a plurality of second resin patterns. The etching target layer is etched using the plurality of second resin patterns as an etch mask to form a minute pattern.
    Type: Application
    Filed: March 27, 2012
    Publication date: April 25, 2013
    Inventors: Se-Hwan Yu, Ji Seon Lee, Yoon Ho Khang, Kahp Yang Suh, Hyoung Sick Um, Jae Jun Chae, Sung Hun Lee
  • Publication number: 20120034390
    Abstract: Disclosed is a method of forming a hierarchical microstructure using partial curing, which is simple in the manufacturing process and capable of forming a hierarchical structure without heterogeneous interfaces. To this end, there is provided a method of forming a hierarchical microstructure using partial curing, including forming a first polymer pattern having partial curing layers and forming a second polymer pattern on the first polymer pattern by using the partial curing layers. According to the present invention, a microstructure having various hierarchical structures can be formed by using a simple process. Accordingly, efficiency in various processes in which a microstructure having various hierarchical structures needs to be formed and economic efficiency can be improved. Furthermore, new functional materials, having not only super hydrophobicity, but also a high adhesive property even in a rough surface, can be developed.
    Type: Application
    Filed: April 20, 2009
    Publication date: February 9, 2012
    Inventors: Kahp Yang Suh, Hoon Eui Jeong, No Kyun Kwak
  • Publication number: 20110271497
    Abstract: Provided are a dry adhesive fastening system which has a relatively superior adhesion, does not almost generate noises during the attaching or detaching operation, has a simplified structure adapted to mass production requirements, and a method of using the same. For this, the dry adhesive fastening system includes a first adhesion member having a first microvillus disposed on a first board and a second adhesion member having a second microvillus disposed on a second board to contact the first adhesion, thereby providing adhesion. Also, unlike the existing velcro fastening system, the hook and loop may not be classified to improve production yield and effectiveness. Also, during the attachment/detachment, the noises may do not occur. In addition, since the microvillus having the micro or nano size is used, the adhesion may be realized even though a very small area is provided.
    Type: Application
    Filed: February 12, 2010
    Publication date: November 10, 2011
    Inventors: Kahp Yang Suh, Tae Il Kim, Chang Hyun Pang, Weon Gyu Bae
  • Publication number: 20100207301
    Abstract: A method of forming micro/nano channels and a method of forming micro/nano structures are provided which can easily form micro- and nano-sized channels and structures through simple processes. UV curable polymer patterns are formed on a first substrate, and the UV curable polymer patterns and a second substrate are sealed together by an electrostatic attraction. Then, a channel is formed by irradiating UV light. Also, after reversibly sealing the polymer patterns and a third substrate, prepolymer patterns are formed on the third substrate by flowing prepolymer. Then, the third is removed to form a fine structure. The nano-sized channels as well as the micro-sized channels can be formed through the substantially equal processes. Also, the reversible sealing or the irreversible sealing can be freely selected according to the coating of the curable polymer and UV irradiation time.
    Type: Application
    Filed: February 17, 2009
    Publication date: August 19, 2010
    Inventors: Kahp Yang SUH, Pil Nam KIM
  • Patent number: 7632417
    Abstract: Provided is a method of forming a nanostructure having a nano-sized diameter and a high aspect ratio through a simple and economical process. To form the nanostructure, a polymer thin film is formed on a substrate and a mold is brought to contact the polymer thin film. Then, a polymer patterning is formed to contact the background surface of an engraved part of the mold, and then the polymer pattern is extended out by removing the mold out of the polymer thin film. The nanostructure forming method of the present research can reproduce diverse cilia optimized in the natural world. Also, it can be used to develop new materials with an ultra-hydrophobic property or a high adhesiveness. Further, it can be applied to a nanopattern forming process for miniaturizing electronic devices and to various ultra-precise industrial technologies together with carbon nanotube, which stands in the highlight recently.
    Type: Grant
    Filed: November 7, 2005
    Date of Patent: December 15, 2009
    Assignee: Seoul National University Industry Foundation
    Inventors: Kahp-Yang Suh, Hoon-Eui Jeong
  • Publication number: 20090145317
    Abstract: A method of fabricating an image forming element includes preparing an image drum, transferring conductive ink as a pre-form of a plurality of ring electrodes on an outer circumference of the image drum using an imprinting process, solidifying the conductive ink on the outer circumference of the image drum to form the plurality of ring electrodes, and forming an outer insulating layer on the outer circumference of the image drum having the plurality of ring electrodes.
    Type: Application
    Filed: May 20, 2008
    Publication date: June 11, 2009
    Applicant: Samsung Electronics Co., Ltd
    Inventors: Kyu-ho SHIN, Eung-yeoul Yoon, Jin-seung Choi, Kahp-yang Suh, Moon-kyu Kwak
  • Publication number: 20090093374
    Abstract: Provided are a method of arraying cells at a single-cell level effectively, simply and economically, a method of analyzing cells using the same, and a cell analysis chip used for carrying out the same. To this end, a microfluidic channel having well structures is formed, and a cell solution containing cells is then introduced into the fluidic channel. Thereafter, the cell solution recedes in the microfluidic channel, thus providing a method of arraying cells in the well structures at a single-cell level, a method of analyzing cells using the same, and a cell analysis chip used for carrying out the same. With only very small amount of samples, it is possible to arraying the cells at a single-cell level very simply and economically without an additional apparatus or power. Accordingly, responsiveness such as response intensity of each cell upon an analysis reagent can be observed and the analysis can be made at a single-cell level.
    Type: Application
    Filed: January 25, 2007
    Publication date: April 9, 2009
    Inventors: Kahp-Yang Suh, Min-Cheol Park
  • Publication number: 20080000871
    Abstract: Provided is a method of forming a nanostructure having a nano-sized diameter and a high aspect ratio through a simple and economical process. To form the nanostructure, a polymer thin film is formed on a substrate and a mold is brought to contact the polymer thin film. Then, a polymer patterning is formed to contact the background surface of an engraved part of the mold, and then the polymer pattern is extended out by removing the mold out of the polymer thin film. The nanostructure forming method of the present research can reproduce diverse cilia optimized in the natural world. Also, it can be used to develop new materials with an ultra-hydrophobic property or a high adhesiveness. Further, it can be applied to a nanopattern forming process for miniaturizing electronic devices and to various ultra-precise industrial technologies together with carbon nanotube, which stands in the highlight recently.
    Type: Application
    Filed: November 7, 2005
    Publication date: January 3, 2008
    Inventors: Kahp-Yang Suh, Hoon-Eui Jeong