Abstract: According to one embodiment, a manufacturing method of a display device includes forming a first conductive oxide layer, forming a first metal layer at a first pressure, forming a second metal layer at a second pressure, forming a second conductive oxide layer, forming a resist having a predetermined shape, etching the second conductive oxide layer using the resist as a mask, retracting an end portion of the second metal layer relative to an end portion of the second conductive oxide layer and an edge of a lower surface of the first metal layer by etching the second metal layer and the first metal layer using the resist as a mask, etching the first conductive oxide layer using the resist as a mask, and removing the resist.

Abstract: According to one embodiment, a display device includes a first base electrode, a rib, a partition including a lower portion and an upper portion, a first lower electrode electrically connected to the first base electrode, a first organic layer, and a first upper electrode. The rib includes a first rib layer covering a peripheral portion of the first base electrode, and a second rib layer. A peripheral portion of the first lower electrode is located on the first rib layer. The lower portion and the first rib layer protrude from a side surface of the second rib layer. A width of the lower portion is less than a width of the first rib layer.

Abstract: According to one embodiment, a display device includes a first base electrode, a rib, a partition including a conductive lower portion and an upper portion, a first lower electrode electrically connected to the first base electrode, a first organic layer, and a first upper electrode. The rib includes a first rib layer which is formed of a first inorganic insulating material and covers a peripheral portion of the first base electrode, and a second rib layer which is formed of a second inorganic insulating material different from the first inorganic insulating material and is provided between the lower portion and the first rib layer. The second rib layer protrudes from a side surface of the first rib layer and a side surface of the lower portion.

Abstract: According to one embodiment, a display device includes a base electrode, a rib including an aperture overlapping the base electrode, a lower electrode disposed at the aperture and electrically connected to the base electrode, a partition including a lower part disposed on the rib and an upper part projecting from a side surface of the lower part, a organic layer covering the lower electrode, and a upper electrode disposed on the organic layer. A periphery of the base electrode is covered by the rib. The base electrode is formed of a first metal material. A periphery of the lower electrode is located on the rib. The lower electrode is formed of a second metal material different from the first metal material.

Abstract: According to one embodiment, a display device comprises an insulating layer, a lower electrode on the insulating layer, a rib on the insulating layer, a partition including a lower portion and upper portion, an organic layer, an organic layer covering the lower electrode, and an upper electrode covering the organic layer. The rib comprises a first rib layer formed of an inorganic insulating material and arranged on the insulating layer, and a second rib layer formed of an inorganic insulating material and arranged on the first rib layer. The second rib layer protrudes from a side surface of the first rib layer and a side surface of the lower portion.

Abstract: According to one embodiment, a display device comprises an insulating layer, a lower electrode on the insulating layer, a rib on the insulating layer, a partition on the rib, an organic layer covering the lower electrode, and an upper electrode covering the organic layer. The partition includes a conductive lower portion protruding from a side surface of the rib, and an upper portion protruding from a side surface of the lower portion. The lower electrode is separated from the lower portion. The upper electrode is in contact with the side surface of the lower portion.

Abstract: According to one embodiment, a display device includes first and second base electrodes, a rib, first and second lower electrodes, first and second organic layers, and an upper electrode. A peripheral portion of each of the first base electrode and the second base electrode is covered with the rib. Each of the first base electrode and the second base electrode is formed of a first metal material. A peripheral portion of each of the first lower electrode and the second lower electrode is located on the rib. Each of the first lower electrode and the second lower electrode is formed of a second metal material different from the first metal material. A thickness of the first lower electrode is different from a thickness of the second lower electrode.

Abstract: According to one embodiment, a manufacturing method of a display device includes preparing a processing substrate by forming a lower electrode, a rib and a partition, forming an organic layer on the lower electrode, forming an upper electrode on the organic layer, forming a first transparent layer on the upper electrode by depositing a first organic material, forming a second transparent layer on the first transparent layer by depositing a second organic material, and depositing the second organic material on each of a plurality of crystal oscillators included in a film thickness measurement device by emitting the second organic material from first and second nozzles of an evaporation source before forming the second transparent layer.

Abstract: According to one embodiment, a display device includes an insulating layer formed of an inorganic material, a lower electrode provided on the insulating layer, a partition which surrounds the lower electrode and includes a conductive lower portion provided on the insulating layer and an upper portion protruding from a side surface of the lower portion, an organic layer which covers the lower electrode and emits light based on application of voltage, and an upper electrode which covers the organic layer and is in contact with the lower portion. The lower electrode includes an end portion located under the upper portion and having a thickness which decreases toward the lower portion.

Abstract: According to one embodiment, in a manufacturing method of a display device, a first lower electrode, a second lower electrode and a third lower electrode are formed. A rib having first aperture overlapping the first lower electrode, a second aperture overlapping the second lower electrode, and a third aperture overlapping the third lower electrode is formed. A first thin film including a first light emitting layer is formed on the first lower electrode. A second thin film including a second light emitting layer is formed on the second lower electrode. An area of the first aperture is larger than an area of the second aperture.

Abstract: According to one embodiment, a manufacturing method of a display device includes preparing a processing substrate, forming an organic layer, and forming an etching stopper layer on the organic layer. The forming the etching stopper layer includes carrying the processing substrate into a chamber, inside the chamber, emitting a material for forming the etching stopper layer from an evaporation source which inclines with respect to a normal of the processing substrate, and conveying the processing substrate while rotating the processing substrate in a plane orthogonal to the normal, and depositing the material emitted from the evaporation source on the processing substrate.

Abstract: According to one embodiment, a manufacturing method of a display device includes forming processing substrate, forming an organic layer, forming an upper electrode, forming a transparent layer, and forming an inorganic layer. The forming the upper electrode includes inclining a first evaporation source with respect to a normal of the processing substrate and depositing a material emitted from the first evaporation source while conveying the processing substrate. The forming the inorganic layer includes inclining a second evaporation source to a side opposite to a side to which the first evaporation source is inclined and depositing a material emitted from the second evaporation source while conveying the processing substrate.

Abstract: According to one embodiment, a display device includes a lower electrode, a rib including a pixel aperture, a partition on the rib, an upper electrode, and an organic layer between the lower electrode and the upper electrode. The partition includes an insulating first portion, a conductive second portion which is provided on the first portion and is in contact with the upper electrode, and a third portion provided on the second portion. A lower end of the second portion protrudes in a width direction of the partition relative to the first portion. The third portion protrudes in the width direction relative to an upper end of the second portion.

Abstract: According to one embodiment, a processing substrate is prepared. An organic layer is formed. An etching stopper layer is formed. The forming the etching stopper layer includes, in a first mode, inclining an evaporation source, and depositing a material emitted from the evaporation source while relative positions of the evaporation source and the processing substrate are changed, and in a second mode, inclining the evaporation source in a manner different from the first mode, and depositing the material emitted from the evaporation source while the relative positions of the evaporation source and the processing substrate are changed in an opposite manner of the first mode.

Abstract: According to one embodiment, in a manufacturing method of a display device, a first etching stopper layer and a first sealing layer is formed. A second etching stopper layer and a second sealing layer is formed. A third etching stopper layer and a third sealing layer is formed. An etching rate of the first etching stopper layer is less than an etching rate of the first sealing layer. An etching rate of the second etching stopper layer is less than an etching rate of the second sealing layer. An etching rate of the third etching stopper layer is less than an etching rate of the third sealing layer. A thickness of each of the first etching stopper layer and the second etching stopper layer is greater than a thickness of the third etching stopper layer.

Abstract: According to one embodiment, a display device includes a lower electrode, a rib including a pixel aperture, a partition on the rib, an upper electrode, and an organic layer between the lower electrode and the upper electrode. The partition includes a conductive first portion, a conductive second portion which is provided on the first portion and is in contact with the upper electrode, and a third portion provided on the second portion. A lower end of the second portion protrudes in a width direction of the partition relative to the first portion. The third portion protrudes in the width direction relative to an upper end of the second portion.

Abstract: According to one embodiment, in a manufacturing method of a display device, a first lower electrode, a second lower electrode and a third lower electrode are formed. A rib having first aperture overlapping the first lower electrode, a second aperture overlapping the second lower electrode, and a third aperture overlapping the third lower electrode is formed. A first thin film including a first light emitting layer is formed on the first lower electrode. A second thin film including a second light emitting layer is formed on the second lower electrode. An area of the first aperture is larger than an area of the second aperture.

Abstract: According to one embodiment, a display device comprises a first display element including a first lower electrode, a first upper electrode, and a first organic layer, a second display element including a second lower electrode, a second upper electrode, and a second organic layer, and a partition between the first and second display elements. The partition comprises a lower portion including first and second side surfaces, and an upper portion including a first end portion protruding from the first side surface and a second end portion protruding from the second side surface. The first end portion has a light-shielding property, and the second end portion has translucency.

Abstract: According to one embodiment, a method of manufacturing a display device includes forming a lower electrode, forming an insulating layer covering the lower electrode, forming a partition including a lower portion on the insulating layer and an upper portion protruding from a side surface of the lower portion, forming, after the forming of the partition, a pixel aperture in the insulating layer, forming an organic layer in contact with the lower electrode via the aperture, forming an upper electrode which covering the organic layer and patterning the organic layer and the upper electrode to form a display element.

Abstract: According to one embodiment, a display device includes a lower electrode, a rib covering a part of the lower electrode and including an aperture that overlaps with the lower electrode, a partition including a lower portion on the rib and an upper portion protruding from a side surface of the lower portion, an upper electrode opposed to the lower electrode, and an organic layer located between the lower and upper electrodes. The upper electrode includes a first layer covering the organic layer and a second layer covering the first layer. The second layer is in contact with the side surface of the lower portion.