Patents by Inventor Kaiyou Wang

Kaiyou Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972786
    Abstract: Provided are a function switchable random access memory, including: two electromagnetic portions configured to connect a current; a magnetic recording portion between the two electromagnetic portions and including a spin-orbit coupling layer and a magnetic tunnel junction; a pinning region between each of the electromagnetic portions and the magnetic recording portion; a cut-off region on a side of each of the electromagnetic portions opposite to the pinning region, the spin-orbit coupling layer is configured to generate a spin current under an action of the current; the two electromagnetic portions is configured to generate two magnetic domains with magnetization pointing in opposite directions under an action of the spin current; the magnetic tunnel junction is configured to generate a magnetic domain wall based on the two opposite magnetic domains and is configured to drive the magnetic domain wall to reciprocate under the action of the spin current.
    Type: Grant
    Filed: July 6, 2022
    Date of Patent: April 30, 2024
    Assignee: INSTITUTE OF SEMICONDUCTORS, CHINESE ACADEMY OF SCIENCES
    Inventors: Kaiyou Wang, Yu Sheng
  • Publication number: 20240066556
    Abstract: A device for separating and recovering flat-plate catalyst powder and a method for determining a wear ratio are provided. The device includes a powder separation unit and a powder recovery unit, a powder accumulation bin is respectively connected with a shell and a catalyst powder outlet, a cyclone outlet is configured on an inner side of a recovery shell, and a primary filter and a secondary filter are configured on an inner side wall of the recovery shell.
    Type: Application
    Filed: June 29, 2023
    Publication date: February 29, 2024
    Inventors: Yingjie Bao, Jieyong Hao, Changkai Yu, Xun Wu, Xianchun Zhou, Yanxuan Liang, Rongfu Tang, Feiyun Chen, Bin Luo, Kaiyou Liao, Danping Zhang, Chao Li, Fanhai Kong, Lele Wang, Qiang Bao, Chuan He
  • Publication number: 20230024744
    Abstract: A method and a system for optimizing problem-solving based on probabilistic bit circuits are provided. The method includes: performing a modeling transformation on an objective problem to obtain a corresponding Hamiltonian relationship; obtaining a column Hamiltonian of said probabilistic bit circuit based on said Hamiltonian relationship; and performing parallel annealing iterations on multicolumn Hamiltonian based on row-flipping operations on said probabilistic bit circuits to obtain an updated probabilistic bit configuration, so as to achieve optimization of said problem.
    Type: Application
    Filed: July 14, 2022
    Publication date: January 26, 2023
    Applicant: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Kaiyou Wang, Xiukai Lan, Yucai Li, Yi Cao
  • Publication number: 20230011349
    Abstract: Provided are a function switchable random access memory, including: two electromagnetic portions configured to connect a current; a magnetic recording portion between the two electromagnetic portions and including a spin-orbit coupling layer and a magnetic tunnel junction; a pinning region between each of the electromagnetic portions and the magnetic recording portion; a cut-off region on a side of each of the electromagnetic portions opposite to the pinning region, the spin-orbit coupling layer is configured to generate a spin current under an action of the current; the two electromagnetic portions is configured to generate two magnetic domains with magnetization pointing in opposite directions under an action of the spin current; the magnetic tunnel junction is configured to generate a magnetic domain wall based on the two opposite magnetic domains and is configured to drive the magnetic domain wall to reciprocate under the action of the spin current.
    Type: Application
    Filed: July 6, 2022
    Publication date: January 12, 2023
    Inventors: Kaiyou WANG, Yu SHENG
  • Patent number: 11307270
    Abstract: Exemplary embodiments of the present disclosure provide a spin valve and a spintronic device comprising the same. The spin valve may comprise two or more magnetic layers stacked in sequence, wherein the spin valve further comprises at least one pair of nonmagnetic semiconductor layers arranged between any two adjacent magnetic layers among the two or more magnetic layers, wherein a built-in electric field is formed between the at least one pair of nonmagnetic semiconductor layers.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: April 19, 2022
    Assignee: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Kaiyou Wang, Wenkai Zhu, Ce Hu
  • Publication number: 20220088579
    Abstract: Provided are a semiconductor material based on metal nanowires and a porous nitride, and a preparation method thereof. The semiconductor material includes: a substrate; a buffer layer formed on the substrate; and a composite material layer formed on the buffer layer the composite material layer includes: a transverse porous nitride template layer; and a plurality of metal nanowires filled in pores of the transverse porous nitride template layer.
    Type: Application
    Filed: October 18, 2018
    Publication date: March 24, 2022
    Inventors: Lixia ZHAO, Jing LI, Chao YANG, Zhiguo YU, Xin XI, Kaiyou WANG
  • Patent number: 11258231
    Abstract: A GaN-based VCSEL chip based on porous DBR and a manufacturing method of the same, wherein the chip includes: a substrate; a buffer layer formed on the substrate; a bottom porous DBR layer formed on the buffer layer; an n-type doped GaN layer formed on the bottom porous DBR layer, which is etched downward on its periphery to form a mesa; an active layer formed on the n-type doped GaN layer; an electron blocking layer formed on the active layer; a p-type doped GaN layer formed on the electron blocking layer; a current limiting layer formed on the p-type doped GaN layer with a current window formed at a center thereof, wherein the current limiting layer covers sidewalls of the active layer, the electron blocking layer and the convex portion of the n-type doped GaN layer; a transparent electrode formed on the p-type doped GaN layer; an n-electrode formed on the mesa of the n-type doped GaN layer; a p-electrode formed on the transparent electrode with a recess formed therein; and a dielectric DBR layer formed on
    Type: Grant
    Filed: June 1, 2017
    Date of Patent: February 22, 2022
    Assignee: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Lixia Zhao, Chao Yang, Lei Liu, Jing Li, Kaiyou Wang, Hongda Chen
  • Patent number: 11249150
    Abstract: Exemplary embodiments of the present disclosure provide a spin valve and a spintronic device comprising the same. The spin valves may comprise two or more magnetic layers stacked in sequence, wherein any two adjacent magnetic layers among the two or more magnetic layers have different coercive forces, and at least one of the any two adjacent magnetic layers is a van der Waals magnetic layer, wherein the van der Waals magnetic layer refers to a magnetic layer made of a van der Waals magnetic material.
    Type: Grant
    Filed: February 5, 2020
    Date of Patent: February 15, 2022
    Assignee: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Kaiyou Wang, Ce Hu
  • Publication number: 20210148998
    Abstract: Exemplary embodiments of the present disclosure provide a spin valve and a spintronic device comprising the same. The spin valves may comprise two or more magnetic layers stacked in sequence, wherein any two adjacent magnetic layers among the two or more magnetic layers have different coercive forces, and at least one of the any two adjacent magnetic layers is a van der Waals magnetic layer, wherein the van der Waals magnetic layer refers to a magnetic layer made of a van der Waals magnetic material.
    Type: Application
    Filed: February 5, 2020
    Publication date: May 20, 2021
    Inventors: Kaiyou Wang, Ce Hu
  • Publication number: 20210148999
    Abstract: Exemplary embodiments of the present disclosure provide a spin valve and a spintronic device comprising the same. The spin valve may comprise two or more magnetic layers stacked in sequence, wherein the spin valve further comprises at least one pair of nonmagnetic semiconductor layers arranged between any two adjacent magnetic layers among the two or more magnetic layers, wherein a built-in electric field is formed between the at least one pair of nonmagnetic semiconductor layers.
    Type: Application
    Filed: March 19, 2020
    Publication date: May 20, 2021
    Inventors: Kaiyou Wang, Wenkai Zhu, Ce Hu
  • Patent number: 10978121
    Abstract: A voltage controlled magnetic random memory unit, a memory, and a logic device thereof. The memory unit includes: a ferroelectric layer applied with a first positive or negative voltage to control a directional switching of magnetization; a spin-orbit coupling layer located above the ferroelectric layer and applied with a second voltage to produce a spin current in a direction perpendicular to the spin-orbit coupling layer; a first magnetic layer located above the spin-orbit coupling layer, wherein, the spin current induces a random up and down magnetic switching of the first magnetic layer. The spin current may induce a directional switching of the first magnetic layer in conjunction with the first voltage applied to the ferroelectric layer.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: April 13, 2021
    Assignee: INSTITUTE OF SEMICONDUCTORS, CHINESE ACADEMY OF SCIENCES
    Inventors: Kaiyou Wang, Meiyin Yang, Kaiming Cai
  • Patent number: 10964829
    Abstract: An InGaN-based resonant cavity enhanced detector chip based on porous DBR, including: a substrate (10); a buffer layer (11) formed on the substrate (10); a bottom porous DBR layer (12) formed on the buffer layer (11); an n-type GaN layer (13) formed on the bottom porous DBR layer (12), wherein one side of the n-type GaN layer (13) is recessed downward to form a mesa (13?), and the other side of the n-type GaN layer (13) is protruded; an active region (14) formed on the n-type GaN layer (13); a p-type GaN layer (15) formed on the active region (14); a sidewall passivation layer (20) formed on an upper surface of the p-type GaN layer (15) and sidewalls of the protruded n-type GaN layer (13), the active region (14), and the p-type GaN layer (15), wherein the sidewall passivation layer (20) on the upper surface of the p-type GaN layer (15) has a window in a middle; a transparent conductive layer (16) formed on the sidewall passivation layer (20) and the p-type GaN layer (15) at the window; an n-type electrode (18
    Type: Grant
    Filed: June 1, 2017
    Date of Patent: March 30, 2021
    Assignee: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Lixia Zhao, Lei Liu, Chao Yang, Jing Li, Kaiyou Wang
  • Publication number: 20200211609
    Abstract: A voltage controlled magnetic random memory unit, a memory, and a logic device thereof. The memory unit includes: a ferroelectric layer applied with a first positive or negative voltage to control a directional switching of magnetization; a spin-orbit coupling layer located above the ferroelectric layer and applied with a second voltage to produce a spin current in a direction perpendicular to the spin-orbit coupling layer; a first magnetic layer located above the spin-orbit coupling layer, wherein, the spin current induces a random up and down magnetic switching of the first magnetic layer. The spin current may induce a directional switching of the first magnetic layer in conjunction with the first voltage applied to the ferroelectric layer.
    Type: Application
    Filed: December 23, 2016
    Publication date: July 2, 2020
    Inventors: Kaiyou WANG, Meiyin YANG, Kaiming CAI
  • Publication number: 20200185882
    Abstract: A GaN-based VCSEL chip based on porous DBR and a manufacturing method of the same, wherein the chip includes: a substrate; a buffer layer formed on the substrate; a bottom porous DBR layer formed on the buffer layer; an n-type doped GaN layer formed on the bottom porous DBR layer, which is etched downward on its periphery to form a mesa; an active layer formed on the n-type doped GaN layer; an electron blocking layer formed on the active layer; a p-type doped GaN layer formed on the electron blocking layer; a current limiting layer formed on the p-type doped GaN layer with a current window formed at a center thereof, wherein the current limiting layer covers sidewalls of the active layer, the electron blocking layer and the convex portion of the n-type doped GaN layer; a transparent electrode formed on the p-type doped GaN layer; an n-electrode formed on the mesa of the n-type doped GaN layer; a p-electrode formed on the transparent electrode with a recess formed therein; and a dielectric DBR layer formed on
    Type: Application
    Filed: June 1, 2017
    Publication date: June 11, 2020
    Applicant: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Lixia Zhao, Chao YANG, Lei Liu, Jing Li, Kaiyou Wang, Hongda Chen
  • Publication number: 20200035843
    Abstract: An InGaN-based resonant cavity enhanced detector chip based on porous DBR, including: a substrate (10); a buffer layer (11) formed on the substrate (10); a bottom porous DBR layer (12) formed on the buffer layer (11); an n-type GaN layer (13) formed on the bottom porous DBR layer (12), wherein one side of the n-type GaN layer (13) is recessed downward to form a mesa (13?), and the other side of the n-type GaN layer (13) is protruded; an active region (14) formed on the n-type GaN layer (13); a p-type GaN layer (15) formed on the active region (14); a sidewall passivation layer (20) formed on an upper surface of the p-type GaN layer (15) and sidewalls of the protruded n-type GaN layer (13), the active region (14), and the p-type GaN layer (15), wherein the sidewall passivation layer (20) on the upper surface of the p-type GaN layer (15) has a window in a middle; a transparent conductive layer (16) formed on the sidewall passivation layer (20) and the p-type GaN layer (15) at the window; an n-type electrode (18
    Type: Application
    Filed: June 1, 2017
    Publication date: January 30, 2020
    Applicant: Institute of Semiconductors, Chinese Academy of Sciences
    Inventors: Lixia Zhao, Lei Liu, Chao Yang, Jing Li, Kaiyou Wang