Patents by Inventor Kamen Hristov Chilov

Kamen Hristov Chilov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optimal rasterization for maskless lithography
    Patent number: 8009269
    Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: August 30, 2011
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T Westeinde
  • Optimal Rasterization for Maskless Lithography
    Publication number: 20080224251
    Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 18, 2008
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T. Westeinde
  • Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion
    Patent number: 7321416
    Abstract: The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.
    Type: Grant
    Filed: June 15, 2005
    Date of Patent: January 22, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Reijnen, Andrej Makarovic, Lambertus Gerardus Maria Kessels, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper, Kamen Hristov Chilov