Patents by Inventor Kanako UEDA

Kanako UEDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER
    Publication number: 20230416451
    Abstract: A composition includes: a polymer including a repeating unit represented by formula (1); and a solvent. In the formula (1), Ar1 is a divalent group including an aromatic ring having 5 to 40 ring atoms; and R0 is a group represented by formula (1-1) or (1-2). In the formulas (1-1) and (1-2), X1 and X2 are each independently a group represented by formula (i), (ii), (iii) or (iv); * is a bond with the carbon atom in the formula (1); and Ar2, Ar3 and Ar4 are each independently a substituted or unsubstituted aromatic ring having 6 to 20 ring atoms that forms a fused ring structure together with the two adjacent carbon atoms in the formulas (1-1) and (1-2).
    Type: Application
    Filed: August 29, 2023
    Publication date: December 28, 2023
    Applicant: JSR CORPORATION
    Inventors: Shuhei YAMADA, Shinya ABE, Takashi TSUJI, Kanako UEDA, Hiroki NAKATSU, Hiroyuki MIYAUCHI
  • COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER
    Publication number: 20230416422
    Abstract: A composition includes: a polymer including a repeating unit represented by formula (1); and a solvent. In the formula (1), Ar1 is a divalent group including an aromatic ring having 10 to 40 ring atoms; and R0 is a monovalent group including a heteroaromatic ring which includes a sulfur atom as a ring-forming atom.
    Type: Application
    Filed: September 11, 2023
    Publication date: December 28, 2023
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKATSU, Shuhei Yamada, Shinya Abe, Takashi Tsuji, Kanako Ueda, Hiroyuki Miyauchi
  • Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer
    Patent number: 11340528
    Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.
    Type: Grant
    Filed: December 11, 2019
    Date of Patent: May 24, 2022
    Assignee: JSR CORPORATION
    Inventors: Sosuke Osawa, Kosuke Terayama, Hajime Inami, Kanako Ueda, Atsuto Nishii
  • PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD OF FORMING RESIST PATTERN, PRODUCTION METHOD OF FLUORINE-CONTAINING RESIN, AND METHOD OF IMPROVING WATER REPELLENCY OF RESIST TOP COAT LAYER
    Publication number: 20210181630
    Abstract: Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.
    Type: Application
    Filed: December 11, 2019
    Publication date: June 17, 2021
    Applicant: JSR CORPORATION
    Inventors: Sosuke OSAWA, Kosuke TERAYAMA, Hajime INAMI, Kanako UEDA, Atsuto NISHII