Abstract: A stereolithography apparatus includes a supporting frame assembly, a tank supported on the supporting frame assembly, a vertically moving module, and a build platform. The tank has an anchored portion anchored to the supporting frame assembly. The build platform is vertically moved relative to the tank by the vertically moving module. After a resin layer is solidified and adhered to the bottom of the tank and the build platform, the tank is peeled away from the resin layer starting from a portion of the resin layer adjacent to the anchored portion and partially moves upward relative to the supporting frame assembly around the anchored portion when the build platform leaves the supporting frame assembly. To further reduce the separation force between the cured resin layer and the tank, the bottom of the tank is covered with materials that are transparent, chemically resistant, impact resistant or/and elastic.

Abstract: A stereolithography apparatus includes a supporting frame assembly, a tank supported on the supporting frame assembly, a vertically moving module, and a build platform. The tank has an anchored portion anchored to the supporting frame assembly. The build platform is vertically moved relative to the tank by the vertically moving module. After a resin layer is solidified and adhered to the bottom of the tank and the build platform, the tank is peeled away from the resin layer starting from a portion of the resin layer adjacent to the anchored portion and partially moves upward relative to the supporting frame assembly around the anchored portion when the build platform leaves the supporting frame assembly. To further reduce the separation force between the cured resin layer and the tank, the bottom of the tank is covered with materials that are transparent, chemically resistant, impact resistant or/and elastic.