Patents by Inventor Kaoru Ohba

Kaoru Ohba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150272
    Abstract: A processes for purifying glycol ethers, comprises (a) providing a glycol ether to a first vessel, the glycol ether, the glycol ether having the following formula: R1—O— (CHR2CHR3) O)nR4; wherein R1 is an alkyl group having 1 to 9 carbon atoms or a phenyl group; wherein R2 and R3 each individually is hydrogen, a methyl group or an ethyl group, provided that when R3 is a methyl group or an ethyl group, R2 is hydrogen and provided that when R2 is a methyl group or an ethyl group, R3 is hydrogen; wherein R4 is hydrogen, an alkyl group having 1 to 4 carbon atoms, an acetyl group, or a propionyl group; and wherein n is an integer of 1 to 3; (b) filling the first vessel with inert gas; (c) heating the glycol ether in the first vessel to a sub-boiling temperature, wherein the sub-boiling temperature is at least 15° C.
    Type: Application
    Filed: May 19, 2021
    Publication date: May 9, 2024
    Inventors: Qi Jiang, Kaoru Ohba, Yujun Liu
  • Publication number: 20240083837
    Abstract: It is related to a process for purifying organic amines. The process comprises (a) providing an organic amine to a first vessel (5), the organic amine having a normal boiling point at one bar; (b) filling the first vessel (5) with inert gas; (c) heating the organic amine in the first vessel (5) to a sub-boiling temperature, wherein the sub-boiling temperature is at least 15° C. less than the normal boiling point; (d) cooling the vapor from the first vessel (5) in a second vessel (20) to provide a liquid; and (e) contacting the organic amine with a resin polymer matrix, wherein the resin polymer matrix is embedded with an amino compound selected from the group consisting of iminodiacetic acid, aminomethylphosphonic acid or a combination thereof.
    Type: Application
    Filed: May 19, 2021
    Publication date: March 14, 2024
    Inventors: Qi Jiang, Kaoru Ohba, Yujun Liu, Jongcheol Kim, Xue Chen, Li Mu
  • Patent number: 11759774
    Abstract: Methods for the removal of ionic contaminants from a hydrophilic organic solvent by a mixed bed of ion exchange resins are described. A mixed bed of ion exchange resins with gel-type strong-acid cationic ion exchange resin with a specific moisture holding capacity and gel-type anionic ion exchange resin is used in some embodiments of such methods.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: September 19, 2023
    Assignee: Dow Global Technologies LLC
    Inventors: Kaoru Ohba, Kenji Takano, Masonori Iida, Shinnosuke Abe, Takashi Masudo, Osamu Kishizaki, Ryo Ishibashi, Yusuke Yamashita
  • Publication number: 20230117989
    Abstract: A method for purification of organic amines, comprising introducing a resin polymer matrix to a liquid containing at least an organic amine bonded to at least one metallic element, wherein the resin polymer matrix is embedded with an amino compound selected from the group consisting of iminodiacetic acid, aminomethylphosphonic acid or a combination thereof, and wherein the embedded resin polymer matrix binds the at least one metallic element, and the at least one metallic element is removed from the organic amine.
    Type: Application
    Filed: April 8, 2020
    Publication date: April 20, 2023
    Inventors: Qi Jiang, Yujun Liu, Kaoru Ohba, Jongcheol Kim, Xue Chen, Li Mu, Jianhai Mu, Stephen W. King
  • Patent number: 11581527
    Abstract: The process of making a lithium ion battery cathode comprises the step of forming a slurry of an active material, a nano-size conductive agent, a binder polymer, a solvent and a dispersant. The solvent consists essentially of one or more of a compound of Formula 1, 2, or 3, and the dispersant comprises an ethyl cellulose.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: February 14, 2023
    Assignees: Dow Global Technologies LLC, Dow Chemical Korea Limited
    Inventors: Xin Jiang, Qi Jiang, Hua Ren, Jianhai Mu, Eungkyu Kim, Kaoru Ohba, Jong-Cheol Kim, Zhuo Wang
  • Patent number: 11349115
    Abstract: In the process of producing a lithium ion battery, one or more compounds of Formula 1, 2, 3 or 4 (e.g., N,N-dimethylpropionamide), is used as the solvent in the step of forming a slurry from an active material (e.g., lithium cobalt oxide), a conductive agent (e.g., carbon black), and a binder polymer (e.g., polyvinylidene fluoride).
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: May 31, 2022
    Assignee: Dow Global Technologies LLC
    Inventors: Xin Jiang, Qi Jiang, Hua Ren, Jianhai Mu, Eungkyu Kim, Kaoru Ohba, Jong-Cheol Kim
  • Publication number: 20210242447
    Abstract: The process of making a lithium ion battery cathode comprises the step of forming a slurry of an active material, a nano-size conductive agent, a binder polymer, a solvent and a dispersant. The solvent consists essentially of one or more of a compound of Formula 1, 2, or 3, and the dispersant comprises an ethyl cellulose.
    Type: Application
    Filed: April 27, 2018
    Publication date: August 5, 2021
    Inventors: Xin Jiang, Qi Jiang, Hua Ren, Jianhai Mu, Eungkyu Kim, Kaoru Ohba, Jong-Cheol Kim, Zhuo Wang
  • Patent number: 11016392
    Abstract: A solvent consisting essentially of: (A) a first component consisting of N,N-diethylacetamide (DEAC); (B) a second component consisting of 3-methoxy-N, N-dimethyl propionamide (M3DMPA); and (C) an optional third component consisting of one or more glycol ethers or glycol ether acetates; or a solvent consisting essentially of: (1) a first component consisting of one or more acyclic amides of Formula (I): and (2) an optional second component consisting of one or more of DEAC, M3DMPA, N,N-dimethylpropionamide, one or more glycol ethers or glycol ether acetates, and one or more cyclic amides of Formulae (II-IV).
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: May 25, 2021
    Assignee: Dow Global Technologies LLC
    Inventors: Qi Jiang, Xin Jiang, Hua Ren, Eungkyu Kim, Jianhai Mu, Kaoru Ohba, William J. Harris
  • Patent number: 10982047
    Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of at least one of a sulfoxide, e.g., DMSO, and an alkyl phosphate, e.g., triethyl phosphate, and (B) optionally, a second component consisting essentially of at least one aprotic glycol ether, e.g., dipropylene glycol dimethyl ether.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: April 20, 2021
    Assignee: Dow Global Technologies LLC
    Inventors: Eungkyu Kim, William J. Harris, Qi Jiang, Xin Jiang, Kaoru Ohba
  • Publication number: 20210083266
    Abstract: In the process of producing a lithium ion battery, one or more compounds of Formula 1, 2, 3 or 4 (e.g., N,N-dimethylpropionamide), is used as the solvent in the step of forming a slurry from an active material (e.g., lithium cobalt oxide), a conductive agent (e.g., carbon black), and a binder polymer (e.g., polyvinylidene fluoride).
    Type: Application
    Filed: April 27, 2018
    Publication date: March 18, 2021
    Inventors: Xin Jiang, Qi Jiang, Hua Ren, Jianhai Mu, Eungkyu Kim, Kaoru Ohba, Jong-Cheol Kim, Zhuo Wang
  • Patent number: 10913058
    Abstract: Methods for the removal of ionic contaminants from hydrolysable organic solvent by ion exchange resins are described. A mixed bed of ion exchange resin with cationic ion exchange resin and weak-base anionic ion exchange resin is used in such methods.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: February 9, 2021
    Assignee: Dow Global Technologies LLC
    Inventors: Kaoru Ohba, Kenji Takano, Masonori Iida, Shinnosuke Abe, Takashi Masudo, Osamu Kishizaki, Ryo Ishibashi, Yusuke Yamashita
  • Patent number: 10731114
    Abstract: Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: August 4, 2020
    Assignee: Dow Global Technologies LLC
    Inventors: Qi Jiang, Xin Jiang, Hua Ren, Eungkyu Kim, Jianhai Mu, Kaoru Ohba
  • Publication number: 20200150542
    Abstract: A solvent consisting essentially of: (A) a first component consisting of N,N-diethylacetamide (DEAC); (B) a second component consisting of 3-methoxy-N, N-dimethyl propionamide (M3DMPA); and (C) an optional third component consisting of one or more glycol ethers or glycol ether acetates; or a solvent consisting essentially of: (1) a first component consisting of one or more acyclic amides of Formula (I): and (2) an optional second component consisting of one or more of DEAC, M3DMPA, N,N-dimethylpropionamide, one or more glycol ethers or glycol ether acetates, and one or more cyclic amides of Formulae (II-IV).
    Type: Application
    Filed: July 6, 2017
    Publication date: May 14, 2020
    Inventors: Qi Jiang, Xin Jiang, Hua Ren, Eungkyu Kim, Jianhai Mu, Kaoru Ohba, William J. Harris
  • Patent number: 10487178
    Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of N,N-dimethyl propionamide (DMPA), and (B) optionally, a second component consisting essentially of at least one of a sulfoxide, e.g., DMSO, an alkyl phosphate, e.g., triethyl phosphate, and an aprotic glycol ether, e.g., propylene glycol methyl ether acetate.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: November 26, 2019
    Assignee: Dow Global Technologies LLC
    Inventors: Eung Kyu Kim, William J. Harris, Qi Jiang, Xin Jiang, Kaoru Ohba
  • Publication number: 20190218344
    Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of at least one of a sulfoxide, e.g., DMSO, and an alkyl phosphate, e.g., triethyl phosphate, and (B) optionally, a second component consisting essentially of at least one aprotic glycol ether, e.g., dipropylene glycol dimethyl ether.
    Type: Application
    Filed: September 28, 2016
    Publication date: July 18, 2019
    Inventors: Eungkyu Kim, William J. Harris, Qi Jiang, Xin Jiang, Kaoru Ohba
  • Publication number: 20190211286
    Abstract: Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.
    Type: Application
    Filed: January 20, 2017
    Publication date: July 11, 2019
    Applicant: Dow Global Technologies LLC
    Inventors: Qi JIANG, Xin JIANG, Hua REN, Eung Kyu KIM, Jianhai MU, Kaoru OHBA
  • Publication number: 20190202989
    Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of N,N-dimethyl propionamide (DMPA), and (B) optionally, a second component consisting essentially of at least one of a sulfoxide, e.g., DMSO, an alkyl phosphate, e.g., triethyl phosphate, and an aprotic glycol ether, e.g., propylene glycol methyl ether acetate.
    Type: Application
    Filed: September 28, 2016
    Publication date: July 4, 2019
    Inventors: Eung Kyu Kim, William J. Harris, Qi Jiang, Xin Jiang, Kaoru Ohba
  • Publication number: 20190009266
    Abstract: Methods for the removal of ionic contaminants from a hydrophilic organic solvent by a mixed bed of ion exchange resins are described. A mixed bed of ion exchange resins with gel-type strong-acid cationic ion exchange resin with a specific moisture holding capacity and gel-type anionic ion exchange resin is used in some embodiments of such methods.
    Type: Application
    Filed: December 16, 2016
    Publication date: January 10, 2019
    Applicants: Dow Global Technologies LLC, Dow Global Technologies LLC
    Inventors: Kaoru Ohba, Kenji Takano, Masonori Iida, Shinnosuke Abe, Takashi Masudo, Osamu Kishizaki, Ryo Ishibashi, Yusuke Yamashita
  • Publication number: 20190009267
    Abstract: Methods for the removal of ionic contaminants from hydrolysable organic solvent by ion exchange resins are described. A mixed bed of ion exchange resin with cationic ion exchange resin and weak-base anionic ion exchange resin is used in such methods.
    Type: Application
    Filed: December 16, 2016
    Publication date: January 10, 2019
    Inventors: Kaoru Ohba, Kenji Takano, Masonori Iida, Shinnosuke Abe, Takashi Masudo, Osamu Kishizaki, Ryo Ishibashi, Yusuke Yamashita
  • Patent number: 6670101
    Abstract: The invention is a process for building-up printed wiring boards using metal foil coated with toughened benzocyclobutene-based dielectric polymers. The invention is also a toughened dielectric polymer comprising benzocyclobutene-based monomers or oligomers, ethylenically unsaturated polymer additive, and, optionally, a photoactive compound.
    Type: Grant
    Filed: January 10, 2002
    Date of Patent: December 30, 2003
    Assignee: Dow Global Technologies Inc.
    Inventors: Kaoru Ohba, Hideki Akimoto, Philip E. Garrou, Ying-Hung So, Britton Lee Kaliszewski