Abstract: RNA molecules for RNA interference to target a mutant allele with a point mutation, wherein the molecule has a nucleotide sequence complementary to a nucleotide sequence of a coding region of the mutant allele; and when counted from the base at the 5?-end in the nucleotide sequence complementary to the sequence of the mutant allele: a base at position 5 or 6 is mismatched with a base in the mutant allele; a base at position 10 or 11 is at the position of the point mutation and is identical to the base at the position of the point mutation in the mutant allele; the group at the 2?-position of the pentose in the ribonucleotide at position 8 is modified with OCH3, halogen, or LNA; and the group at the 2?-position of the pentose in the ribonucleotide at position 7 is not modified with any of OCH3, halogen, and LNA.

Abstract: A cartridge attachment structure includes: a cover whose one end is attached to a pivot shaft for opening and closing a storage space; a support member attached to the pivot shaft and supporting a cartridge; and a pair of lifting-up members attached to the cover such that the cartridge can be sandwiched along the side surface of the cartridge. A groove is formed on each of the opposing inner surfaces of the lifting-up members to receive a projection 16 formed on the side surface of the cartridge. The groove is curved such that the bottom surface of the cartridge moves away from the support member when the protrusion slides along the groove as the cover rotates about the pivot shaft.

Abstract: A substrate processing apparatus includes a loading and unloading unit having a first side surface through which a container accommodating a substrate is loaded and unloaded, and a second side surface opposite to the first side surface, a substrate transport unit extending along a first horizontal direction perpendicular to the second side surface, and a plurality of batch processing units adjacent to one another along a longitudinal direction of the substrate transport unit. Each of the plurality of batch processing units includes a processing container configured to accommodate and process a plurality of substrates, a gas supply unit configured to supply a gas into the processing container, and an exhaust unit configured to exhaust the gas inside the processing container. A first maintenance area, used for attending to a maintenance of the plurality of batch processing units, is provided above the exhaust unit.

Abstract: A substrate processing apparatus includes a loading and unloading unit having a first side surface through which a container accommodating a substrate is loaded and unloaded, and a second side surface opposite to the first side surface, a substrate transport unit extending along a first direction perpendicular to the second side surface, and a plurality of batch processing units adjacent to one another along a longitudinal direction of the substrate transport unit. Each of the plurality of batch processing units includes a processing container configured to accommodate and process a plurality of substrates, a gas supply unit configured to supply a gas into the processing container, and an exhaust unit configured to exhaust the gas inside the processing container. The gas supply unit and the exhaust unit are provided on one side of the processing container.

Abstract: An objective of the present invention is to provide a composition containing various kinds of citrus juice including yuzu juice and having improved citrus flavor such that the composition can be easily and variedly prepared. The above objective can be achieved by a container-packed composition comprising citrus juice and 1 ppb to 2,000 ppb of phenethyl acetate; a processed food or beverage comprising, as raw materials, the composition and an ingredient, or a method of producing the processed food or beverage; a container-packed processed food or beverage comprising citrus juice and 1 ppb to 2,000 ppb of phenethyl acetate; and so on.

Abstract: Disclosed is a brain blood vessel model composed of a three-dimensional tissue containing defibrated extracellular matrix components and cells including brain microvascular endothelial cells, pericytes, and astrocytes, wherein at least a portion of the above-described cells adheres to the above-described defibrated extracellular matrix.

Abstract: A substrate processing apparatus is provided to deposit a film including a reaction product on a substrate by repeating a supply cycle of sequentially supplying at least two kinds of reaction gases reactable with each other to a surface of the substrate in a chamber. The substrate processing apparatus includes a turntable provided in the chamber and having a concave portion for receiving the substrate formed in its surface and through-holes formed in the concave portion, a lifting mechanism including lift pins used when transferring the substrate placed on the concave portion, and a control unit configured to control the lifting mechanism. The control unit controls the lifting mechanism to carry the substrate out of the concave portion by moving the lifting pins upward in a vertical direction and inward in a radial direction of the turntable after the lifting pins contact the substrate through the through-holes.

Abstract: A cooling device for cooling a rack-type server of which a housing includes a plurality of electronic devices includes an interior cooling unit and an exterior cooling unit. The interior cooling unit includes a heat-receiving unit, a heat dissipation unit, an outward path pipe, and a return path pipe. The interior cooling unit allows working fluid to be circulated through the heat-receiving unit, the outward path pipe, the heat dissipation unit, the return path pipe, and the heat-receiving unit to thereby move the heat from the heat-receiving unit to the heat dissipation unit. The exterior cooling unit has a heat exchange unit abutted on the heat dissipation unit and allows, by a circulated cooling medium, the heat of the working fluid discharged from the heat dissipation unit to be dissipated to external air.

Abstract: A cooling device has a circulation passage that annularly connects heat receiving part, heat radiation passage, heat radiation part, and feedback passage in order, and working fluid housed in the circulation passage, and check valve provided on an upstream side of heat receiving part. Heat radiation part has a liquefying chamber and a cooling water chamber separated by a partition plate. The liquefying chamber has a first connection part connected to heat radiation passage at an upper part of liquefying chamber, and a second connection part connected to feedback passage at a lower part of liquefying chamber, and has a plurality of first heat radiation fins fixed to the partition plate, and having a plurality of openings or cutouts. The cooling water chamber has a cooling water inlet, a cooling water outlet, and a plurality of second heat radiation fins that separate a passage from the cooling water inlet to the cooling water outlet into a plurality of parallel passages.

Abstract: In cooling device, refrigerant is circulated through heat receiving unit, heat radiation passage, heat radiation unit, return passage, and heat receiving unit, and cooling is performed by making use of a phase change between a liquid phase and a gaseous phase of refrigerant. Heat receiving unit is configured by placing in series a plurality of heat receivers each of which has inflow port and an outflow port. Check valve is provided on an inflow port side of heat receiver which is closest to return passage among the plurality of heat receivers.

Abstract: A method to inexpensively and efficiently produce conductive materials on the surface of which a nano-level fine structure is formed includes surface modification including immersing a stable anode electrode and a workpiece as a cathode electrode, the workpiece including a conductive material with a work surface, in an electrolytic solution, then applying a voltage not less than a first voltage and less than a second voltage between the stable anode electrode and the workpiece as the cathode electrode immersed in the electrolytic solution, thereby modifying the work surface, the first voltage being a voltage corresponding to a current value that is ½ of the sum of a first maximum current value appearing first in a positive voltage region and a first minimum current value appearing first in the positive voltage region with respect to voltage-current characteristics of a surface modification treatment system, the second voltage exhibiting a complete-state plasma.

Abstract: A substrate processing apparatus is provided to deposit a film including a reaction product on a substrate by repeating a supply cycle of sequentially supplying at least two kinds of reaction gases reactable with each other to a surface of the substrate in a chamber. The substrate processing apparatus includes a turntable provided in the chamber and having a concave portion for receiving the substrate formed in its surface and through-holes formed in the concave portion, a lifting mechanism including lift pins used when transferring the substrate placed on the concave portion, and a control unit configured to control the lifting mechanism. The control unit controls the lifting mechanism to carry the substrate out of the concave portion by moving the lifting pins upward in a vertical direction and inward in a radial direction of the turntable after the lifting pins contact the substrate through the through-holes.

Abstract: There is provided a method for producing a surface-treated metallic material, by use of which a metallic material having a stable and excellent sliding characteristic can be produced with a low environmental load without covering the metallic material surface with an oxide film. The method for producing a surface-treated metallic material includes immersing an anode and a cathode in an electrolyte solution, placing a metallic material used as a material to be treated above the surface of the electrolyte solution, and applying a voltage between the anode and the cathode to treat the metallic material surface, the voltage being equal to or higher than a voltage for causing a complete plasma state.

Abstract: It is an object to provide a surface-treated steel sheet which contains no Cr, which is excellent in wet resin adhesion, and which can be used as an alternative to a conventional tin-free steel sheet and to provide a resin-coated steel sheet produced by coating the surface-treated steel sheet with resin. A surface-treated steel sheet including an adhesive layer which is disposed on at least one surface of the steel sheet and which contains Ti and at least one selected from the group consisting of Co, Fe, Ni, V, Cu, Mn, and Zn, the ratio of the total amount of Co, Fe, Ni, V, Cu, Mn, and Zn to the amount of Ti contained therein being 0.01 to ten on a mass basis, and a method for producing the surface-treated steel sheet.

Abstract: A cooling device for cooling a rack-type server of which a housing includes a plurality of electronic devices includes an interior cooling unit and an exterior cooling unit. The interior cooling unit includes a heat-receiving unit, a heat dissipation unit, an outward path pipe, and a return path pipe. The interior cooling unit allows working fluid to be circulated through the heat-receiving unit, the outward path pipe, the heat dissipation unit, the return path pipe, and the heat-receiving unit to thereby move the heat from the heat-receiving unit to the heat dissipation unit. The exterior cooling unit has a heat exchange unit abutted on the heat dissipation unit and allows, by a circulated cooling medium, the heat of the working fluid discharged from the heat dissipation unit to be dissipated to external air.

Abstract: A film deposition apparatus includes a turntable; a first process gas supply portion; a gas nozzle that supplies a second process gas; a nozzle cover that is provided to cover the gas nozzle; a separation gas supply portion, wherein the nozzle cover includes an upper plate portion, and an upstream sidewall portion and a downstream sidewall portion that extend downward from upstream and downstream edge portions of the upper plate portion in a rotational direction of the turntable, respectively, wherein an inner surface of the upstream sidewall portion is formed as an inclined surface that is inclined with respect to a surface of the turntable, and wherein an angle ?1 between the inner surface of the upstream sidewall portion and the surface of the turntable is smaller than an angle ?2 between an inner surface of the downstream sidewall portion and the surface of the turntable.

Abstract: A method to inexpensively and efficiently produce conductive materials on the surface of which a nano-level fine structure is formed includes surface modification including immersing a stable anode electrode and a workpiece as a cathode electrode, the workpiece including a conductive material with a work surface, in an electrolytic solution, then applying a voltage not less than a first voltage and less than a second voltage between the stable anode electrode and the workpiece as the cathode electrode immersed in the electrolytic solution, thereby modifying the work surface, the first voltage being a voltage corresponding to a current value that is ½ of the sum of a first maximum current value appearing first in a positive voltage region and a first minimum current value appearing first in the positive voltage region with respect to voltage-current characteristics of a surface modification treatment system, the second voltage exhibiting a complete-state plasma.

Abstract: A cooling apparatus includes: a heat receiving portion including a heat receiving plate which transfers heat from a heat source to a working fluid; a heat radiating portion which discharges the heat of the working fluid; and a heat radiating path and a return path which connect the heat receiving portion and the heat radiating portion to each other. In the cooling apparatus, the working fluid is circulated through the heat receiving portion, the heat radiating path, the heat radiating portion, the return path and the heat receiving portion to dissipate the heat of the heat source. A check valve which controls a flow of the working fluid is provided in the return path at a location near the heat receiving portion or provided in the heat receiving portion.

Abstract: An image forming system including an image forming apparatus and a sheet feeding apparatus. The system includes: a first conveying unit conveying to the image forming apparatus a recording material; a second conveying unit conveying to an image forming unit of the image forming apparatus the recording material; a detector detecting a recording material type while the second conveying unit halts conveying the recording material; a first controller, based on detection by the detector, determining a speed for conveying the recording material to the image forming unit, and conveying the recording material at the conveying speed; and a second controller controlling recording material conveying speeds of the first conveying unit. Before the recording material reaches the second conveying unit, the second controller maintains a first conveying speed, and after the recording material reaches the second convey unit, maintains a second conveying speed determined by the first control unit.

Abstract: There is provided a method for producing a surface-treated metallic material, by use of which a metallic material having a stable and excellent sliding characteristic can be produced with a low environmental load without covering the metallic material surface with an oxide film. The method for producing a surface-treated metallic material includes immersing an anode and a cathode in an electrolyte solution, placing a metallic material used as a material to be treated above the surface of the electrolyte solution, and applying a voltage between the anode and the cathode to treat the metallic material surface, the voltage being equal to or higher than a voltage for causing a complete plasma state.