Patents by Inventor Karen D. Badger
Karen D. Badger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8538129Abstract: A method for characterizing the resolution of mask inspection tool using a test mask and a database containing defect data. A variety of defect types and sizes is programmed into the database, and the database is then used to inspect the defect-free mask. All defects programmed into the database are not captured in performing the method, so the resolution capability of an inspection tool can be determined.Type: GrantFiled: October 9, 2009Date of Patent: September 17, 2013Assignee: International Business Machines CorporationInventors: Karen D. Badger, Emily E Gallagher, Christoper Magg
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Patent number: 8437967Abstract: A method of and system for inspecting multi-layer reticles. The method includes: selecting a multi-layer reticle having an array of cells arranged in R rows and C columns; defining a full inspection region that includes all cells of the array of cells; and when R is equal to one (or is greater than two) and C is greater than two (or is equal to one) and a cell of the array of cells is a dummy cell in a first or last position of a row (or of a column) of the array of cells, then reducing the full inspection region to generate a shrunken inspection region that does not include the dummy cell, and then inspecting the shrunken inspection region for defects. If the dummy cell is between two non-dummy cells, then the dummy cell is a copy of one of the non-dummy cells, but is not inspected.Type: GrantFiled: January 27, 2010Date of Patent: May 7, 2013Assignee: International Business Machines CorporationInventors: Karen D. Badger, Karen Strube Edwards, Patricia Mae Hynek, John M. Leonard, Maureen Fitzpatrick McFadden, David A. Merchant
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Publication number: 20110184662Abstract: A method of and system for inspecting multi-layer reticles. The method includes: selecting a multi-layer reticle having an array of cells arranged in R rows and C columns; defining a full inspection region that includes all cells of the array of cells; and when R is equal to one (or is greater than two) and C is greater than two (or is equal to one) and a cell of the array of cells is a dummy cell in a first or last position of a row (or of a column) of the array of cells, then reducing the full inspection region to generate a shrunken inspection region that does not include the dummy cell, and then inspecting the shrunken inspection region for defects. If the dummy cell is between two non-dummy cells, then the dummy cell is a copy of one of the non-dummy cells, but is not inspected.Type: ApplicationFiled: January 27, 2010Publication date: July 28, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Karen D. Badger, Karen Strube Edwards, Patricia Mae Hynek, John M. Leonard, Maureen Fitzpatrick McFadden, David A. Merchant
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Patent number: 7974802Abstract: A method optimizes photomask inspection. After masks are manufactured, the method predicts the likelihood that the masks will be defect free based on defect criteria, etch area, etch mode, and etch tool type associated with the masks. The method skips an initial mask inspection for masks that have a predictability value above a predetermined value and performs the initial mask inspection for masks that have a predictability value below the predetermined value. After initial inspection is preformed (or skipped), a pellicle is mounted on the mask and then all masks are inspected or reinspected for defects and foreign matter.Type: GrantFiled: March 7, 2008Date of Patent: July 5, 2011Assignee: International Business Machines CorporationInventors: Karen D. Badger, Jim B. Densmore, Christopher R. Gillman, Kathleen G. Purdy, Cynthia Whiteside
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Publication number: 20110085723Abstract: A method and programmed defect test database for designing and building programmed defect test masks. The method uses a defect free mask that is compared to a ‘defective’ database. A variety of defect types and sizes is programmed into the database and used to inspect the defect-free mask. All defects programmed into the database are not affected by performing the method, regardless of size, so the resolution capability of an inspection tool can be determined.Type: ApplicationFiled: October 9, 2009Publication date: April 14, 2011Applicant: International Business Machines CorporationInventors: Karen D. Badger, Emily E. Gallagher, Christopher Magg
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Patent number: 7742632Abstract: An inspection system uses inspection data biased to compensate for mismatches that occur as a result of using an optical lithography system to print an alternating phase shift mask that operates at a wavelength of light that is different from the wavelength of light that an inspection system uses to inspect the mask for defects.Type: GrantFiled: October 13, 2006Date of Patent: June 22, 2010Assignee: International Business Machines CorporationInventors: Karen D. Badger, Michael S. Hibbs, Christopher K. Magg
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Patent number: 7619730Abstract: Methods, systems, program storage devices and computer program products for mask inspection that automate the detection and placement of do not inspect regions (“DNIR”) for intentionally induced defects on masks. A location of an intentional defect is identified on a mask, and then logic relating to this location is translated into a shape that represents a DNIR for the intentional defect. A second shape representing another DNIR of the mask is provided. It is then determined if the first and second shapes for DNIRs violate a processing rule of the inspection tool, and if so, the violated rule is corrected for by generating a single contiguous DNIR by overlapping the first and second shapes. The inspection tool then utilizes the first and second shapes representing DNIRs, along with any single contiguous DNIRs, to inspect the mask for unintentional defects while avoiding intentional defects.Type: GrantFiled: June 26, 2008Date of Patent: November 17, 2009Assignee: International Business Machines CorporationInventors: Karen D. Badger, David L. Katcoff, Jeffrey P. Lissor, Christopher K. Magg
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Publication number: 20090228228Abstract: A method optimizes photomask inspection. After masks are manufactured, the method predicts the likelihood that the masks will be defect free based on defect criteria, etch area, etch mode, and etch tool type associated with the masks. The method skips an initial mask inspection for masks that have a predictability value above a predetermined value and performs the initial mask inspection for masks that have a predictability value below the predetermined value. After initial inspection is preformed (or skipped), a pellicle is mounted on the mask and then all masks are inspected or reinspected for defects and foreign matter.Type: ApplicationFiled: March 7, 2008Publication date: September 10, 2009Applicant: International Business Machines CorporationInventors: Karen D. Badger, Jim B. Densmore, Christopher R. Gillman, Kathleen G. Purdy, Cynthia Whiteside
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Publication number: 20080279443Abstract: A mask inspection method and system. Provided is a mask fabrication database describing geometrical shapes S to be printed as part of a mask pattern on a reticle to fabricate a mask through use of a mask fabrication tooling. The shapes S appear on the mask as shapes S? upon being printed. At least one of the shapes S? may be geometrically distorted relative to a corresponding at least one of the shapes S due to a lack of precision in the mask fabrication tooling. Also provided is a mask inspection database to be used for inspecting the mask after the mask has been fabricated by the mask fabrication tooling. The mask inspection database describes shapes S? approximating the shapes S?. A geometric distortion between the shapes S? and S? is less than a corresponding geometric distortion between the shapes S? and S.Type: ApplicationFiled: July 30, 2008Publication date: November 13, 2008Inventors: Karen D. Badger, James A. Culp, Azalia A. Krasnoperova
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Patent number: 7450748Abstract: A mask inspection method and system. Provided is a mask fabrication database describing geometrical shapes S to be printed as part of a mask pattern on a reticle to fabricate a mask through use of a mask fabrication tooling. The shapes S appear on the mask as shapes S? upon being printed. At least one of the shapes S? may be geometrically distorted relative to a corresponding at least one of the shapes S due to a lack of precision in the mask fabrication tooling. Also provided is a mask inspection database to be used for inspecting the mask after the mask has been fabricated by the mask fabrication tooling. The mask inspection database describes shapes S? approximating the shapes S?. A geometric distortion between the shapes S? and S? is less than a corresponding geometric distortion between the shapes S? and S.Type: GrantFiled: December 2, 2003Date of Patent: November 11, 2008Assignee: International Business Machines CorporationInventors: Karen D. Badger, James A. Culp, Azalia A. Krasnoperova
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Publication number: 20080270059Abstract: Methods, systems, program storage devices and computer program products for mask inspection that automate the detection and placement of do not inspect regions (“DNIR”) for intentionally induced defects on masks. A location of an intentional defect is identified on a mask, and then logic relating to this location is translated into a shape that represents a DNIR for the intentional defect. A second shape representing another DNIR of the mask is provided. It is then determined if the first and second shapes for DNIRs violate a processing rule of the inspection tool, and if so, the violated rule is corrected for by generating a single contiguous DNIR by overlapping the first and second shapes. The inspection tool then utilizes the first and second shapes representing DNIRs, along with any single contiguous DNIRs, to inspect the mask for unintentional defects while avoiding intentional defects.Type: ApplicationFiled: June 26, 2008Publication date: October 30, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Karen D. Badger, David L. Katcoff, Jeffrey P. Lissor, Christopher K. Magg
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Patent number: 7443497Abstract: Methods, systems, program storage devices and computer program products for mask inspection that automate the detection and placement of do not inspect regions (“DNIR”) for intentionally induced defects on masks. A location of an intentional defect is identified on a mask, and then logic relating to this location is translated into a shape that represents a DNIR for the intentional defect. A second shape representing another DNIR of the mask is provided. It is then determined if the first and second shapes for DNIRs violate a processing rule of the inspection tool, and if so, the violated rule is corrected for by generating a single contiguous DNIR by overlapping the first and second shapes. The inspection tool then utilizes the first and second shapes representing DNIRs, along with any single contiguous DNIRs, to inspect the mask for unintentional defects while avoiding intentional defects.Type: GrantFiled: August 31, 2005Date of Patent: October 28, 2008Assignee: International Business Machines CorporationInventors: Karen D. Badger, David L. Katcoff, Jeffrey P. Lissor, Christopher K. Magg
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Publication number: 20080089575Abstract: An inspection system uses inspection data biased to compensate for mismatches that occur as a result of using an optical lithography system to print an alternating phase shift mask that operates at a wavelength of light that is different from the wavelength of light that an inspection system uses to inspect the mask for defects.Type: ApplicationFiled: October 13, 2006Publication date: April 17, 2008Inventors: Karen D. Badger, Michael S. Hibbs, Christopher K. Magg
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Patent number: 6635390Abstract: A method and system for reducing particulate contamination of a photomask used in lithographic printing. A reticle assembly comprises a pellicle frame and membrane which is adhered to a reticle and encloses an air space over a photomask of the reticle. Particulate matter which can adversely affect a lithographic printing result can be present within the enclosed air space. According to the invention, an interior wall of the pellicle frame is provided with an adhesive surface, and the reticle assembly is subjected to a dislodging motion to dislodge the particulate matter on the photomask surface and cause it to be directed toward the adhesive surface of the interior wall and adhere thereto, removing this particular matter from the focal plane of the lithographic optics.Type: GrantFiled: November 9, 2000Date of Patent: October 21, 2003Assignee: International Business Machines CorporationInventors: Karen D. Badger, James J. Colelli, Dean C. Humphrey