Patents by Inventor Karl-Hein Schuster

Karl-Hein Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system particularly for microlithography
    Patent number: 6859328
    Abstract: A projection exposure apparatus for microlithography using a wavelength?193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: February 22, 2005
    Assignee: Carl Zeiss Semiconductor
    Inventors: Jörg Schultz, Johannes Wangler, Karl-Hein Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni, Hans-Juergen Mann, Wilhelm Ulrich
  • Illumination system particularly for microlithography
    Publication number: 20030095622
    Abstract: A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
    Type: Application
    Filed: July 22, 2002
    Publication date: May 22, 2003
    Applicant: Carl Zeiss Semiconductor Manufacturing Technologies AG
    Inventors: Jorg Schultz, Johannes Wangler, Karl-Hein Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni, Hans-Juergen Mann, Wilhelm Ulrich