Abstract: An interface system and a method therefor are disclosed for cooperating with a microprocessor based control system that presents at least one of a plurality of options for selection on a display. The system provides a first and a second rotatable dial each of which provide at least one of a plurality of inputs to the microprocessor controlled display. The combination of inputs from the first dial and the second dial define one or more menu-like options that a user can select from the display via a selection push button. A second push button is provided to enable the user to reject or step out of a menu option. This interface system, unlike keyboards and mouses, is particularly compact and rugged. Consequently, this interface system is exceptionally well suited for interacting with a microprocessor based control system in an industrial environment or any other type of harsh operating environment.

Abstract: A probe assembly and method is disclosed which includes a plurality of sensors for respectively mreasuring predetermined attributes of a fluid. The probe assembly comprises a first sensor for measuring the quantity of the fluid. The first sensor includes a capacitive reference cell and a capacitive product measurement cell, each of the cells being characterized by respective associated capacitances. In particular, the capacitance associated with the capacitive product measurement cell varies in accordance with the quantity of the fluid so that the quantity of the fluid is indicated by the quantitative relationship between the magnitude of the capacitance associated with the capacitive reference cell and the magnitude of the capacitance associated with the capacitive product measurement cell.

Abstract: The calibration scheme disclosed herein is applicable to microlithographic systems of the type in which alignment between successive exposures is provided by means of a microscope mounted to one side of the optical projection column, there being a laser metered stage for transporting a semiconductor wafer between the microscope and an optical projection column. In accordance with the practice of the invention, a wafer with a light sensitive coating is placed on the stage and transported to the column using an approximate base line value. After exposure from a reticle which includes fiducial markings, the wafer is transported by the stage to the microscope. By observing the latent image on the coating, the precise stage movement required to align the latent image of the fiducial markings on the wafer with the microscope system reference reticle may be measured with the laser metered stage. The base line value is then corrected based on the actual measurement.