Abstract: An injector, for injecting a fuel fluid into an intake manifold or into a combustion chamber of a cylinder of an internal combustion engine, includes an electromagnetic actuator that includes a magnetic circuit. The magnetic circuit includes a solenoid, an internal pole, and a magnet armature that cooperates with the solenoid and the internal pole, and is configured to generate a controlled force action between the internal pole and the magnet armature when the electromagnetic actuator is activated with the aid of an activating current and/or an activating voltage. The injector includes a gap in the area between the internal pole and the magnet armature, and includes a valve sleeve that has either paramagnetic material properties in and outside the area of the gap or paramagnetic material properties in the area of the gap and ferromagnetic material properties outside of this area.

Abstract: Methods for etching a dielectric barrier layer with high selectivity to a dielectric bulk insulating layer are provided. In one embodiment, the method includes providing a substrate having a portion of a dielectric barrier layer exposed through a dielectric bulk insulating layer in a reactor, flowing a gas mixture containing H2 gas, fluorine containing gas, at least an insert gas into the reactor, and etching the exposed portion of the dielectric barrier layer selectively to the dielectric bulk insulating layer.

Abstract: In some implementations, a method is provided in a plasma reactor for etching a trench in an organic planarization layer of a resist structure comprising a photoresist mask structure over a hardmask masking the organic planarization layer. This may include introducing into the plasma reactor an etchant gas chemistry including N2, H2, and O2 and etching a masked organic planarization layer using a plasma formed from the etchant gas chemistry. This may include etching through the planarization layer to form a trench with a single etch step.

Abstract: An automation system includes at least one automation object, with a directory for storing object names of the at least one automation object. An object name is assigned a directory entry which includes first information data as a reference to the automation object; second information data as a description of technological functionality; and third information data as a description of interfaces of the automation object. This results in immediate and permanent access to currently created (partial) solutions, so that parallel and/or distributed working on automation objects is possible.

Abstract: An automation system with at least one automation object having a first component for generating a system functionality, a second component for generating a base functionality, and a third component for managing at least one module. Each module has a first module component for generating a system functionality, a second module component for generating a base functionality and a third module component for generating a technological functionality.

Abstract: The invention relates to a method for the automatic retrieval of engineering data from installations. The engineering and runtime objects are described by a uniform object model. This allows the correspondence between engineering objects and runtime objects to be determined at object level and no information is lost as a result of the mapping. In addition, a direct communication between engineering and runtime objects can take place, which can be utilized when the method is carried out.

Abstract: Methods for etching a dielectric barrier layer with high selectivity to a dielectric bulk insulating layer are provided. In one embodiment, the method includes providing a substrate having a portion of a dielectric barrier layer exposed through a dielectric bulk insulating layer in a reactor, flowing a gas mixture containing H2 gas, fluorine containing gas, at least an insert gas into the reactor, and etching the exposed portion of the dielectric barrier layer selectively to the dielectric bulk insulating layer.

Abstract: Methods for two step etching a BARC layer in a dual damascene structure are provided. In one embodiment, the method includes providing a substrate having vias filled with a BARC layer disposed on the substrate in an etch reactor, supplying a first gas mixture into the reactor to etch a first portion of the BARC layer filling in the vias, and supplying a second gas mixture comprising NH3 gas into the reactor to etch a second portion of the BARC layer disposed in the vias.

Abstract: Methods for two step etching a BARC layer in a dual damascene structure are provided. In one embodiment, the method includes providing a substrate having vias filled with a BARC layer disposed on the substrate in an etch reactor, supplying a first gas mixture into the reactor to etch a first portion of the BARC layer filling in the vias, and supplying a second gas mixture comprising NH3 gas into the reactor to etch a second portion of the BARC layer disposed in the vias.

Abstract: In some implementations, a method is provided in a plasma reactor for etching a trench in an organic planarization layer of a resist structure comprising a photoresist mask structure over a hardmask masking the organic planarization layer. This may include introducing into the plasma reactor an etchant gas chemistry including N2, H2, and O2 and etching a masked organic planarization layer using a plasma formed from the etchant gas chemistry. This may include etching through the planarization layer to form a trench with a single etch step.

Abstract: The invention relates to scrap shears (1) comprising several jaw arms (2a, 2b, 3), which can execute a pivoting motion in relation to one another in a closing or opening direction of the scrap shears. At least one jaw arm is equipped with a counter-bearing element (12) on the end section lying opposite the mounting (4), said element being displaced, (at least temporarily), in relation to the jaw arm carrying said element between a working position and a reduced friction position. The counter-bearing (12) is configured in such a way that the distance between its external surface (12b), which faces away from the carrying jaw arm and the mating surface (3b) of the neighbouring jaw arm (3), which faces towards said external surface, increases with the relative displacement of the counter-bearing element towards the reduced friction position.

Abstract: The present invention relates to an automation system with at least one automation module (1), which has at least one automation object (A1-An), and with function modules (F1-F6), which contain means for central management and maintenance of the automation objects (A1-An). As a result, a manufacturer-independent definition of new automation objects, possibly using already existing automation objects, becomes possible, costly separate programming of new automation solutions is no longer necessary at all or is at least significantly simplified.

Abstract: A system of case-based reasoning for sensor prediction in a technical process, especially in a cement kiln, method and apparatus therefore, and wherein the system provides accurate predictions of the cement kiln behavior for a limited period into the future. The invention utilizes a method of case-base-reasoning (CBR) for the task of sensor value prediction. An apparatus for implementing the method is characterized by a database (100) in which the relevant time interval data are stored, a test generator (101) and an optimisation unit (102-104) for the selection and optimisation of the time interval data.

Abstract: The present invention relates to an automation system with at least one automation module (1), which has at least one automation object (A1-An), and with function modules (F1-F6), which contain means for central management and maintenance of the automation objects (A1-An). As a result, a manufacturer-independent definition of new automation objects, possibly using already existing automation objects, becomes possible, costly separate programming of new automation solutions is no longer necessary at all or is at least significantly simplified.

Abstract: An automation system with at least one automation object (A1 . . . An) having a first component (K1) for generating a system functionality, a second component (K2) for generating a base functionality, and a third component (K3) for managing at least one module (M1 . . . Mn). Each module has a first module component (MK1) for generating a system functionality, a second module component (MK2) for generating a base functionality and a third module component (MK3) for generating a technological functionality.

Abstract: A system of case-based reasoning for sensor prediction in a technical process, especially in a cement kiln, method and apparatus therefore, and wherein the system provides accurate predictions of the cement kiln behavior for a limited period into the future. The invention utilizes a method of case-base-reasoning (CBR) for the task of sensor value prediction. An apparatus for implementing the method is characterized by a database (100) in which the relevant time interval data are stored, a test generator (101) and an optimisation unit (102- 104) for the selection and optimisation of the time interval data.

Abstract: A plasma etching process for etching a carbon-based low-k dielectric layer in a multi-layer inter-level dielectric. The low-k dielectric may be divinyl siloxane-benzocyclobutene (BCB), which contains about 4% silicon, the remainder being carbon, hydrogen, and a little oxygen. The BCB etch uses an etching gas of oxygen, a fluorocarbon, and nitrogen and no argon. An N2/O2 ratio of between 1:1 and 3:1 produces vertical walls in the BCB. In a dual-damascene structure, the inter-level dielectric includes two BCB layers, each underlaid by a respective stop layer. Photolithography with an organic photoresist needs a hard mask of silicon oxide or nitride over the upper BCB layer. After the BCB etch has cleared all the photoresist, the bias power applied to the cathode supporting the wafer needs to be set to a low value while the separately controlled plasma source power is set reasonably high, thereby reducing faceting of the exposed hard mask.