Patents by Inventor Karyn Visscher

Karyn Visscher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8808815
    Abstract: An inkjet-receptive article comprising a substrate having a coating thereon comprising a vinyl lactam polymer or copolymer and a polymer resin diluent coated from a solvent. A preferred vinyl lactam copolymer is polyvinylcaprolactam (PVCap)—vinyl acetate (VA). Also disclosed are solvent-based compositions for forming an inkjet-receptive coating on a substrate comprising: (i) a vinyl lactam polymer or copolymer; (ii) a solvent; (iii) optionally, a pigment; and (iv) polymer resin diluent.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: August 19, 2014
    Assignee: ISP Investments Inc.
    Inventors: David K. Hood, Surya Kamin, Karyn Visscher
  • Publication number: 20120027964
    Abstract: An inkjet-receptive article comprising a substrate having a coating thereon comprising a vinyl lactam polymer or copolymer and a polymer resin diluent coated from a solvent. A preferred vinyl lactam copolymer is polyvinylcaprolactam (PVCap)—vinyl acetate (VA). Also disclosed are solvent-based compositions for forming an inkjet-receptive coating on a substrate comprising: (i) a vinyl lactam polymer or copolymer; (ii) a solvent; (iii) optionally, a pigment; and (iv) polymer resin diluent.
    Type: Application
    Filed: August 26, 2011
    Publication date: February 2, 2012
    Inventors: David K. Hood, Surya Kamin, Karyn Visscher
  • Publication number: 20080096135
    Abstract: Methods of forming a pattern of filled dielectric material on a substrate by thermal transfer processes are disclosed comprising exposing to heat a thermally imageable donor element comprising a substrate and a transfer layer of dielectric material. The exposure pattern is the image of the desired pattern to be formed on the substrate, such that portions of the layer of dielectric material are transferred onto the substrate where the electronic device is being formed. The filled dielectric material can be patterned onto a gate electrode of a thin film transistor. The pattern dielectric material may also form an insulating layer for interconnects. Donor elements for use in the process are also disclosed. Methods for forming thin film transistors and donor elements for use in the thermal transfer processes are also disclosed.
    Type: Application
    Filed: July 5, 2007
    Publication date: April 24, 2008
    Inventors: GRACIELA BLANCHET-FINCHER, Karyn Visscher
  • Publication number: 20070142546
    Abstract: A pigment dispersion useful for forming coating compositions containing dispersed pigment, a carrier solvent and an aminated macromonomer dispersant (binder) is disclosed. The aminated macromonomer dispersant is preferably prepared by the reaction of terminally unsaturated macromonomers synthesized by cobalt-catalyzed chain transfer free radical polymerizations of methacrylic monomers with monomeric or oligomeric amines.
    Type: Application
    Filed: December 12, 2006
    Publication date: June 21, 2007
    Inventors: Steven Ittel, Karyn Visscher, Alexei Gridnev
  • Publication number: 20050082523
    Abstract: Methods of forming a pattern of filled dielectric material on a substrate by thermal transfer processes are disclosed comprising exposing to heat a thermally imageable donor element comprising a substrate and a transfer layer of dielectric material. The exposure pattern is the image of the desired pattern to be formed on the substrate, such that portions of the layer of dielectric material are transferred onto the substrate where the electronic device is being formed. The filled dielectric material can be patterned onto a gate electrode of a thin film transistor. The pattern dielectric material may also form an insulating layer for interconnects. Donor elements for use in the process are also disclosed. Methods for forming thin film transistors and donor elements for use in the thermal transfer processes are also disclosed.
    Type: Application
    Filed: June 25, 2004
    Publication date: April 21, 2005
    Inventors: Graciela Blanchet-Fincher, Karyn Visscher
  • Patent number: 5747604
    Abstract: A number of new poly(organophosphazenes) have been synthesized which bear 2-butenoxy or 4-allyloxyphenylphenoxy side groups. Co-substituent groups included trifluoroethoxy, phenoxy, or benzyloxyphenoxy groups. Species with 4-allyloxyphenylphenoxy units underwent Si--H coupling to linear silanes or siloxanes to extend the side groups and form hybrid phosphazene/organosilicon polymers. A number of these polymers are rubbery elastomers which are readily cross-linked by heat or light. Seven of the mixed-substituent, cross-linked polymers were incorporated into interpenetrating polymer networks (IPN's) with polystyrene, poly(methyl methacrylate), polyacrylonitrile, poly(acrylic acid) and poly(dimethylsiloxane). The phase compatibility characteristics of the IPN's were assessed by DSC, TEM, FT-IR spectroscopy, and 1H and 31P NMR spectroscopy data.
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: May 5, 1998
    Assignee: The Penn State Research Foundation
    Inventors: Harry R. Allcock, Karyn Visscher, Young Baek Kim