Patents by Inventor Katie Nardi

Katie Nardi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11921427
    Abstract: Imaging layers on the surface of a substrate may be patterned using next generation lithographic techniques, and the resulting patterned film may be used as a lithographic mask, for example, for production of a semiconductor device.
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: March 5, 2024
    Assignee: Lam Research Corporation
    Inventors: Timothy William Weidman, Katie Nardi, Chenghao Wu
  • Publication number: 20220122848
    Abstract: A method for selectively etching a silicon oxide region with respect to a lower oxygen silicon containing region is provided. A sacrificial mask selectively deposited on the lower oxygen silicon containing region with respect to the silicon oxide region. An atomic layer etch selectively etches the silicon oxide region with respect to the sacrificial mask on the lower oxygen silicon containing region.
    Type: Application
    Filed: February 11, 2020
    Publication date: April 21, 2022
    Inventors: Daniel PETER, Da LI, Jengyi YU, Alexander KABANSKY, Katie NARDI, Samantha SiamHwa TAN, Younghee LEE
  • Publication number: 20210397085
    Abstract: Imaging layers on the surface of a substrate may be patterned using next generation lithographic techniques, and the resulting patterned film may be used as a lithographic mask, for example, for production of a semiconductor device.
    Type: Application
    Filed: November 11, 2019
    Publication date: December 23, 2021
    Applicant: Lam Research Corporation
    Inventors: Timothy William Weidman, Katie Nardi, Chenghao Wu