Patents by Inventor Katsuaki Oba

Katsuaki Oba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4935408
    Abstract: A compound of the formula: ##STR1## in which R.sup.1 represents alkyl, cycloalkyl or aralkyl, R* represents fluorophenyl or trifluoromethylphenyl when R.sup.1 is alkyl; R* represents dichlorophenyl, neopentyl, trimethylsilylmethyl, dimethylphenylsilylmethyl or a group of the formula: ##STR2## wherein R.sup.2 represents halogen, trifluoromethyl, lower alkyl or lower alkoxy when R.sup.1 is cycloalkyl; or R* represents 2-thienyl, 3-thienyl, neopentyl, trimethylsilylmethyl, dimethylphenylsilylmethyl or a group of the formula: ##STR3## wherein R.sup.3, R.sup.4 and R.sup.5 independently represent halogen, trifluoromethyl, lower alkyl or lower alkoxy when R.sup.1 is aralkyl, m represents 1 or 2, and X represents halogen, imidazolyl, triazolyl, phenylthio or a radical selected from the group consisting of: ##STR4## wherein R.sup.6 represents alkyl, R.sup.7 and R.sup.8 independently represent lower alkyl and R.sup.9 and R.sup.
    Type: Grant
    Filed: May 6, 1988
    Date of Patent: June 19, 1990
    Assignees: Shionogi & Co., Ltd., Nitto Kasei Co., Ltd.
    Inventors: Hideyuki Imazaki, Masazumi Fujikawa, Katsuaki Oba, Fusaharu Kumayama, Toshio Takahashi
  • Patent number: 4774235
    Abstract: A compound of the formula: ##STR1## in which R.sup.1 represents alkyl, cycloalkyl or aralkyl, R* represents fluorophenyl or trifluoromethylphenyl when R.sup.1 is alkyl; R* represents dichlorophenyl, neopentyl, trimethylsilylmethyl, dimethylphenylsilylmethyl or a group of the formula: ##STR2## wherein R.sup.2 represents halogen, trifluoromethyl, lower alkyl or lower alkoxy when R.sup.1 is cycloalkyl; or R* represents 2-thienyl, 3-thienyl, neopentyl, trimethylsilylmethyl, imethylphenylsilylmethyl or a group of the formula: ##STR3## wherein R.sup.3, R.sup.4 and R.sup.5 independently represent hydrogen, halogen, trifluoromethyl, lower alkyl or lower alkoxy when R.sup.1 is aralkyl, m represents 1 or 2, and X represents halogen, imidazolyl, triazolyl, phenylthio or a radical selected from the group consisting of: ##STR4## wherein R.sup.6 represents alkyl, R.sup.7 and R.sup.8 independently represent lower alkyl and R.sup.9 and R.sup.
    Type: Grant
    Filed: August 21, 1986
    Date of Patent: September 27, 1988
    Assignees: Shionogi & Co., Ltd., Nitto Kasei Co., Ltd.
    Inventors: Hideyuki Imazaki, Masazumi Fujikawa, Katsuaki Oba, Fusaharu Kumayama, Toshio Takahashi
  • Patent number: 4720488
    Abstract: A compound of the formula: ##STR1## wherein R.sup.1 and R.sup.2 each represent C.sub.1 -C.sub.5 alkoxy or C.sub.1 -C.sub.5 alkylthio, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 each represent hydrogen or C.sub.1 -C.sub.5 alkyl, R.sup.7, R.sup.8 and R.sup.9 each represent hydrogen, C.sub.1 -C.sub.5 alkyl or halogen, and X represents oxygen or sulfur. A process for preparing the compound (I) and a pesticidal composition containing the compound (I) are also provided.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: January 19, 1988
    Assignee: Shionogi & Co., Ltd.
    Inventors: Yoshio Hayase, Mitsuhiro Ichinari, Kazuo Kamei, Junji Taguchi, Katsuaki Oba, Toshio Takahashi