Patents by Inventor Katsuhiko Kanamori

Katsuhiko Kanamori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8703517
    Abstract: In a manufacturing method of a semiconductor device, a substrate including single crystalline silicon is prepared, a reformed layer that continuously extends is formed in the substrate, and the reformed layer is removed by etching. The forming the reformed layer includes polycrystallizing a portion of the single crystalline silicon by irradiating the substrate with a pulsed laser beam while moving a focal point of the laser beam in the substrate.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: April 22, 2014
    Assignee: DENSO CORPORATION
    Inventors: Atsushi Taya, Katsuhiko Kanamori, Masashi Totokawa
  • Patent number: 8603920
    Abstract: A manufacturing method of a semiconductor device includes: irradiating a laser beam on a single crystal silicon substrate, and scanning the laser beam on the substrate so that a portion of the substrate is poly crystallized, wherein at least a part of a poly crystallized portion of the substrate is exposed on a surface of the substrate; and etching the poly crystallized portion of the substrate with an etchant. In this case, a process time is improved.
    Type: Grant
    Filed: August 5, 2010
    Date of Patent: December 10, 2013
    Assignee: DENSO CORPORATION
    Inventors: Katsuhiko Kanamori, Masashi Totokawa, Hiroshi Tanaka
  • Publication number: 20120107994
    Abstract: In a manufacturing method of a semiconductor device, a substrate including single crystalline silicon is prepared, a reformed layer that continuously extends is formed in the substrate, and the reformed layer is removed by etching. The forming the reformed layer includes polycrystallizing a portion of the single crystalline silicon by irradiating the substrate with a pulsed laser beam while moving a focal point of the laser beam in the substrate.
    Type: Application
    Filed: October 24, 2011
    Publication date: May 3, 2012
    Applicant: DENSO CORPORATION
    Inventors: Atsushi TAYA, Katsuhiko Kanamori, Masashi Totokawa
  • Publication number: 20110034031
    Abstract: A manufacturing method of a semiconductor device includes: irradiating a laser beam on a single crystal silicon substrate, and scanning the laser beam on the substrate so that a portion of the substrate is poly crystallized, wherein at least a part of a poly crystallized portion of the substrate is exposed on a surface of the substrate; and etching the poly crystallized portion of the substrate with an etchant. In this case, a process time is improved.
    Type: Application
    Filed: August 5, 2010
    Publication date: February 10, 2011
    Applicant: DENSO CORPORATION
    Inventors: Katsuhiko Kanamori, Masashi Totokawa, Hiroshi Tanaka
  • Patent number: 5010774
    Abstract: A distribution type tactile sensor, which comprises a plurality of electrodes provided in pairs at respective pressure sensing points on a pressure sensitive conductive rubber sheet capable of changing the electrical resistance responsive to compressive forces, and a rectifier element provided to respective electrodes for rectifying the current flowing across each pair of electrodes through the rubber sheet, the electrodes being divided into groups each comprising electrodes arranged in a line for respective polarities of the electrodes, electrodes in respective electrode groups being parallel connected to one another through electrode leads, and directions of the division of electrode groups divided for respective polarities being crossed with one another at respective pressure sensing points.
    Type: Grant
    Filed: June 3, 1989
    Date of Patent: April 30, 1991
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Kanaya Kikuo, Katsuhiko Kanamori, Ryosuke Masuda
  • Patent number: 4273682
    Abstract: Disclosed is a pressure-sensitive, electrically conductive elastomeric composition comprising a substrate composed of an organic flexible material and electrically conductive particles consisting of angle-chipped, roundish pebble-like particles of artificial graphite incorporated and dispersed therein. An elastomeric material comprising this composition has such a characteristic property that the electric resistivity is conspicuously and gradiently reduced under application of a pressure from the level maintained when no pressure is applied. This characteristic property is very durable and therefore, the material can be used advantageously for switch elements and the like.
    Type: Grant
    Filed: October 10, 1979
    Date of Patent: June 16, 1981
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventor: Katsuhiko Kanamori