Patents by Inventor Katsuhiro Itayama

Katsuhiro Itayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same
    Patent number: 6027792
    Abstract: The present invention relates to a coating film excellent in resistance to corrosive halogen-containing gas and halogen-containing plasma, a method for producing the same, and technology utilizing the same.More specifically, the coating film includes an aluminum oxide as an essential material and silicon-containing material, and the coating film has such a tightness that the content of the silicon-containing material is 5 wt % or less when reduced to silicon. In other word, the coating film has no peak of a half-value width of 5.degree. or less in X-ray diffraction. In still other word, the coating film is a little short of oxygen having an oxygen-to aluminum atomic ration of 1.3 or more to below 1.5. The present invention provides a laminated structure coated with such a coating film such as a window material for use in a vacuum apparatus, and a method for producing the window material.
    Type: Grant
    Filed: June 3, 1997
    Date of Patent: February 22, 2000
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Seigo Yamamoto, Katsuhiro Itayama, Kouki Ikeda, Jun Hisamoto, Takashi Onishi