Patents by Inventor Katsuhisa Ike

Katsuhisa Ike has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8151159
    Abstract: A data communications system having a plurality of processing devices connected to a serial via a serial bus interface. The processing device provides a communication control line which connects each processing device in order and performs the transfer of transmission right of the serial bus, a transmission right management unit which is connected to the communication control line, performs the transfer of the transmission right and manages the state of the transmission right within its own processing device, a data transmission unit which starts data transmission when the transmission right is valid and holds the data transmission when the transmission right is invalid, and a state initialization unit which sets the initial state of the transmission right so that the transmission right of only one processing device is made to be valid at the initialization.
    Type: Grant
    Filed: February 1, 2008
    Date of Patent: April 3, 2012
    Assignee: Hitachi, Ltd.
    Inventor: Katsuhisa Ike
  • Patent number: 7439528
    Abstract: A particle therapy system capable of confirming energy of an accelerated charged particle beam before the charged particle beam is irradiated to an irradiation target. A beam position monitor is disposed in a synchrotron, and a cavity voltage monitor is associated with an RF cavity for acceleration. An ion beam orbiting within the synchrotron is accelerated with application of an RF voltage applied to the RF cavity and is extracted from the synchrotron with application of an RF voltage applied to an RF knockout electrode. Based on a cavity voltage signal detected by the cavity voltage monitor, a frequency counter measures the frequency of the RF voltage applied to the RF cavity. Based on a voltage detected by the beam position monitor, a beam signal processing unit measures the position of a beam orbit.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: October 21, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Nishiuchi, Katsuhisa Ike, Masumi Umezawa, Koji Matsuda
  • Publication number: 20080189586
    Abstract: A data communications system comprising a plurality of processing devices 100 connected to a serial bus 101 via a serial bus interface 103. The processing device 100 provides a communication control line 102 which connects each processing device in order and performs the transfer of transmission right of the serial bus is provided, a transmission right management unit 105 which is connected to the communication control line 102, performs the transfer of the transmission right and manages the state of the transmission right within its own processing device, a data transmission unit 104 which starts data transmission when the transmission right is valid and holds the data transmission when the transmission right is invalid, and a state initialization unit 106 which sets the initial state of the transmission right so that the transmission right of only one processing device is made to be valid at the initialization are included.
    Type: Application
    Filed: February 1, 2008
    Publication date: August 7, 2008
    Inventor: Katsuhisa Ike
  • Publication number: 20050099145
    Abstract: A particle therapy system capable of confirming energy of an accelerated charged particle beam before the charged particle beam is irradiated to an irradiation target. A beam position monitor is disposed in a synchrotron, and a cavity voltage monitor is associated with an RF cavity for acceleration. An ion beam orbiting within the synchrotron is accelerated with application of an RF voltage applied to the RF cavity and is extracted from the synchrotron with application of an RF voltage applied to an RF knockout electrode. Based on a cavity voltage signal detected by the cavity voltage monitor, a frequency counter measures the frequency of the RF voltage applied to the RF cavity. Based on a voltage detected by the beam position monitor, a beam signal processing unit measures the position of a beam orbit.
    Type: Application
    Filed: November 5, 2004
    Publication date: May 12, 2005
    Inventors: Hideaki Nishiuchi, Katsuhisa Ike, Masumi Umezawa, Koji Matsuda
  • Patent number: 6580075
    Abstract: A charged particle beam scanning inspecting apparatus for irradiating a charged particle beam, fetching information of a subject to be inspected at a predetermined beam scanning position and performing an inspection by processing the information. The apparatus is a measurer which measures a scanning position of the beam and an inspection position on said inspection subject to calculate beam target coordinates corrected for an apparatus error, an error correction constant and a deflected distortion correction constant, and a deflection controller for scanning the beam. The deflection controller includes a deflection position operating circuit for performing an operation of the inspection position in a deflection coordinate system, a deflected distortion operating circuit. The deflection position operating circuit and deflected distortion operating circuit are constructed in a pipe line fashion.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: June 17, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Masatsugu Kametani, Kenjiro Yamamoto, Taku Ninomiya, Osamu Yamada, Katsuhisa Ike
  • Publication number: 20030062479
    Abstract: In order that the deflection scanning position can be corrected at a time point within a period for fetching information from a subject to be inspected and improvements in accuracy of chip comparison inspection and an inspection near the wafer outer periphery where distortion is large can be assured by correcting the inspection position and biased distortion at a high speed with high accuracy, a digital deflection control scheme is employed in which the deflection scanning signal and correction are all calculated digitally in a deflection controller for deflecting and controlling a charged particle beam irradiated onto a subject to be inspected and the digital value is sequentially converted into an analog value by a time-series train of digital control signal to form a deflection scanning waveform.
    Type: Application
    Filed: September 23, 2002
    Publication date: April 3, 2003
    Inventors: Masatsugu Kametani, Kenjiro Yamamoto, Taku Ninomiya, Osamu Yamada, Katsuhisa Ike
  • Patent number: 6538248
    Abstract: In order that the deflection scanning position can be corrected at a time point within a period for fetching information from a subject to be inspected and improvements in accuracy of chip comparison inspection and an inspection near the wafer outer periphery where distortion is large can be assured by correcting the inspection position and biased distortion at a high speed with high accuracy, a digital deflection control scheme is employed in which the deflection scanning signal and correction are all calculated digitally in a deflection controller for deflecting and controlling a charged particle beam irradiated onto a subject to be inspected and the digital value is sequentially converted into an analog value by a time-series train of digital control signal to form a deflection scanning waveform.
    Type: Grant
    Filed: September 17, 1999
    Date of Patent: March 25, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Masatsugu Kametani, Kenjiro Yamamoto, Taku Ninomiya, Osamu Yamada, Katsuhisa Ike