Patents by Inventor Katsuhisa Kashiwazaki

Katsuhisa Kashiwazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITE PLATED FILM AND LAMINATED FILM
    Publication number: 20140199539
    Abstract: It is provided a steel with composite plating film providing rust prevention over a long time period and a method of manufacturing thereof. A composite plating film 24 is formed on a metal material 21. The film 24 has a plating film 23 made of a sacrificial anode metal and photocatalyst particles 22 dispersed and fixed in the plating film 23. The photocatalyst particle has a main body composed of a photocatalyst and a semiconductor material supported thereon. The composite plating film 24 is formed on the surface of the metal material 21 by electroplating, hot-dipping, chemical plating or the like.
    Type: Application
    Filed: January 27, 2014
    Publication date: July 17, 2014
    Applicants: KOYO ENGINEERING CO., LTD., MEISEI INDUSTRIAL COMPANY LIMITED
    Inventors: Hirotaka YAMASHIRO, Yasuhisa MAEDA, Shuichi SAITOH, Katsuhisa KASHIWAZAKI
  • Composite plated film and laminated film
    Patent number: 8673456
    Abstract: It is provided a steel with composite plating film providing rust prevention over a long time period and a method of manufacturing thereof. A composite plating film 24 is formed on a metal material 21. The film 24 has a plating film 23 made of a sacrificial anode metal and photocatalyst particles 22 dispersed and fixed in the plating film 23. The photocatalyst particle has a main body composed of a photocatalyst and a semiconductor material supported thereon. The composite plating film 24 is formed on the surface of the metal material 21 by electroplating, hot-dipping, chemical plating or the like.
    Type: Grant
    Filed: November 14, 2006
    Date of Patent: March 18, 2014
    Assignees: Meisei Industrial Company Limited, Koyo Engineering Co., Ltd.
    Inventors: Hirotaka Yamashiro, Yasuhisa Maeda, Shuichi Saitoh, Katsuhisa Kashiwazaki
  • Composite plated film, a manufacturing method thereof, laminated films, films for metals used in the dark, a method of preventing corrosion of metal in the dark and composite films
    Publication number: 20070237957
    Abstract: It is provided a steel with composite plating film providing rust prevention over a long time period and a method of manufacturing thereof. A composite plating film 24 is formed on a metal material 21. The film 24 has a plating film 23 made of a sacrificial anode metal and photocatalyst particles 22 dispersed and fixed in the plating film 23. The photocatalyst particle has a main body composed of a photocatalyst and a semiconductor material supported thereon. The composite plating film 24 is formed on the surface of the metal material 21 by electroplating, hot-dipping, chemical plating or the like.
    Type: Application
    Filed: November 14, 2006
    Publication date: October 11, 2007
    Applicants: MEISEI INDUSTRIAL COMPANY LIMITED, KOYO ENGINEERING CO., LTD
    Inventors: Hirotaka Yamashiro, Yasuhisa Maeda, Shuichi Saitoh, Katsuhisa Kashiwazaki
  • Photoreactive devices, translucent members, ornaments, anticorrosive devices, devices for reducing oxygen and devices for controlling growth of microorganisms
    Patent number: 6882459
    Abstract: The inventive photoreactive device has a semiconductor and an oxidation-reduction material. The semiconductor has a conduction band with a potential and being capable of producing electrons under the irradiation of light on the semiconductor. The oxidation-reduction material has a redox potential being positive compared with the potential of the conduction band. The semiconductor supplies electrons into the oxidation-reduction material to reduce it under the irradiation of light for storing the electrons. The stored electrons are discharged from the oxidation-reduction material into a metal material to prevent the corrosion of the metal material.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: April 19, 2005
    Assignees: Koyo Engineering
    Inventors: Akira Fujishima, Tetsu Tatsuma, Yoshihisa Ohko, Shuichi Saitoh, Katsuhisa Kashiwazaki
  • Photoreactive devices, translucent members, ornaments, anticorrosive devices, devices for reducing oxygen and devices for controlling growth of microorganisms
    Publication number: 20020047134
    Abstract: The inventive photoreactive device has a semiconductor and an oxidation-reduction material. The semiconductor has a conduction band with a potential and being capable of producing electrons under the irradiation of light on the semiconductor. The oxidation-reduction material has a redox potential being positive compared with the potential of the conduction band. The semiconductor supplies electrons into the oxidation-reduction material to reduce it under the irradiation of light for storing the electrons. The stored electrons are discharged from the oxidation-reduction material into a metal material to prevent the corrosion of the metal material.
    Type: Application
    Filed: August 28, 2001
    Publication date: April 25, 2002
    Inventors: Akira Fujishima, Tetsu Tatsuma, Yoshihisa Ohko, Shuichi Saitoh, Katsuhisa Kashiwazaki